DE3572082D1 - X-ray application system - Google Patents

X-ray application system

Info

Publication number
DE3572082D1
DE3572082D1 DE8585307889T DE3572082T DE3572082D1 DE 3572082 D1 DE3572082 D1 DE 3572082D1 DE 8585307889 T DE8585307889 T DE 8585307889T DE 3572082 T DE3572082 T DE 3572082T DE 3572082 D1 DE3572082 D1 DE 3572082D1
Authority
DE
Germany
Prior art keywords
mask
curtain
gas
ray
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585307889T
Other languages
English (en)
Inventor
James Morton Forsyth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hampshire Instruments Inc
Original Assignee
Hampshire Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hampshire Instruments Inc filed Critical Hampshire Instruments Inc
Application granted granted Critical
Publication of DE3572082D1 publication Critical patent/DE3572082D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/18—Windows permeable to X-rays, gamma-rays, or particles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Radiation-Therapy Devices (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE8585307889T 1984-11-08 1985-10-31 X-ray application system Expired DE3572082D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/669,442 US4692934A (en) 1984-11-08 1984-11-08 X-ray lithography system

Publications (1)

Publication Number Publication Date
DE3572082D1 true DE3572082D1 (en) 1989-09-07

Family

ID=24686339

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585307889T Expired DE3572082D1 (en) 1984-11-08 1985-10-31 X-ray application system

Country Status (6)

Country Link
US (1) US4692934A (de)
EP (1) EP0174877B1 (de)
JP (1) JPH065611B2 (de)
AT (1) ATE45246T1 (de)
CA (1) CA1246759A (de)
DE (1) DE3572082D1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63292553A (ja) * 1987-05-25 1988-11-29 Agency Of Ind Science & Technol Ｘ線発生装置におけるプラズマ飛散防止機構
US4860328A (en) * 1987-08-25 1989-08-22 Hampshire Instruments, Inc. Target positioning for minimum debris
US4837793A (en) * 1987-08-25 1989-06-06 Hampshire Instruments, Inc. Mass limited target
JPH0276212A (ja) * 1988-09-13 1990-03-15 Canon Inc 多重露光方法
US5101422A (en) * 1990-10-31 1992-03-31 Cornell Research Foundation, Inc. Mounting for X-ray capillary
US5264328A (en) * 1992-04-24 1993-11-23 International Business Machines Corporation Resist development endpoint detection for X-ray lithography
US5329569A (en) * 1993-02-18 1994-07-12 Sandia Corporation X-ray transmissive debris shield
US5491331A (en) * 1994-04-25 1996-02-13 Pilot Industries, Inc. Soft x-ray imaging device
JP3480048B2 (ja) * 1994-07-26 2003-12-15 株式会社ニコン Ｘ線発生装置
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
US6194733B1 (en) 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
US6065203A (en) * 1998-04-03 2000-05-23 Advanced Energy Systems, Inc. Method of manufacturing very small diameter deep passages
US6180952B1 (en) 1998-04-03 2001-01-30 Advanced Energy Systems, Inc. Holder assembly system and method in an emitted energy system for photolithography
US6105885A (en) 1998-04-03 2000-08-22 Advanced Energy Systems, Inc. Fluid nozzle system and method in an emitted energy system for photolithography
US6459472B1 (en) 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
US6198792B1 (en) * 1998-11-06 2001-03-06 Euv Llc Wafer chamber having a gas curtain for extreme-UV lithography
JP2000349009A (ja) * 1999-06-04 2000-12-15 Nikon Corp 露光方法及び装置
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
IT1316249B1 (it) * 2000-12-01 2003-04-03 Enea Ente Nuove Tec Procedimento di abbattimento del flusso di ioni e di piccoli detritiin sorgenti di raggi-x molli da plasma, tramite l'uso di kripton.
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
CN1256628C (zh) * 2001-04-17 2006-05-17 皇家菲利浦电子有限公司 远紫外线可透过的界面结构
FR2823949A1 (fr) * 2001-04-18 2002-10-25 Commissariat Energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
DE10337667B4 (de) * 2003-08-12 2012-03-22 Xtreme Technologies Gmbh Plasma-Strahlungsquelle und Anordnung zur Erzeugung eines Gasvorhangs für Plasma-Strahlungsquellen
US7167232B2 (en) * 2003-12-30 2007-01-23 Asml Netherlands B.V. Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus
JPWO2005083759A1 (ja) * 2004-02-27 2007-08-09 株式会社ニコン 露光装置、及び微細パターンを有するデバイスの製造方法
US8173975B2 (en) * 2004-03-31 2012-05-08 Koninklijke Philips Electronics N.V. Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
US7502095B2 (en) * 2005-03-29 2009-03-10 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US20070085984A1 (en) * 2005-10-18 2007-04-19 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
JP4922638B2 (ja) * 2005-03-29 2012-04-25 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、シール、デバイス製造方法、コンピュータプログラム、およびデータ記録媒体
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006287003A (ja) * 2005-04-01 2006-10-19 Tohoku Univ 露光装置
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
DE102005048670B3 (de) 2005-10-07 2007-05-24 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von unerwünschten Spektralanteilen bei einer plasmabasierten EUV-Strahlungsquelle
DE102012213927A1 (de) 2012-08-07 2013-06-06 Carl Zeiss Smt Gmbh Vorrichtung zur Erzeugung eines Gasvorhangs, Gasdüse und EUV-Lithographiesystem damit
DE102013226678A1 (de) 2013-12-19 2015-06-25 Carl Zeiss Smt Gmbh EUV-Lithographiesystem und Transporteinrichtung zum Transport eines reflektiven optischen Elements

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1166053A (en) * 1966-08-08 1969-10-01 Atomic Energy Authority Uk Improvements in or relating to Particle Accelerators
US4121128A (en) * 1976-03-22 1978-10-17 The United States Of America As Represented By The Secretary Of The Army Collective ion accelerator with foil-less beam extraction window
US4185202A (en) * 1977-12-05 1980-01-22 Bell Telephone Laboratories, Incorporated X-ray lithography
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
US4304627A (en) * 1978-09-28 1981-12-08 Texas Gas Transmission Corporation Expandable chamber fusion reactor system
EP0058137A3 (de) * 1981-02-09 1983-03-16 Battelle Development Corporation Röntgengerät
JPS5840757A (ja) * 1981-09-03 1983-03-09 Seiko Epson Corp Ｘ線装置
EP0105261B1 (de) * 1982-04-14 1988-07-06 Battelle Development Corporation Röntgenstrahlenerreger
JPS58191433A (ja) * 1982-05-04 1983-11-08 Fujitsu Ltd Ｘ線転写方法および装置
JPS58225636A (ja) * 1982-06-25 1983-12-27 バッテル・ディベロプメント・コーポレーション Ｘ線を対象物に照射する装置

Also Published As

Publication number Publication date
EP0174877B1 (de) 1989-08-02
JPH065611B2 (ja) 1994-01-19
US4692934A (en) 1987-09-08
EP0174877A2 (de) 1986-03-19
EP0174877A3 (en) 1986-04-16
CA1246759A (en) 1988-12-13
JPS61179046A (ja) 1986-08-11
ATE45246T1 (de) 1989-08-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee