JPS56111223A - X-ray exposuring device - Google Patents

X-ray exposuring device

Info

Publication number
JPS56111223A
JPS56111223A JP1122480A JP1122480A JPS56111223A JP S56111223 A JPS56111223 A JP S56111223A JP 1122480 A JP1122480 A JP 1122480A JP 1122480 A JP1122480 A JP 1122480A JP S56111223 A JPS56111223 A JP S56111223A
Authority
JP
Japan
Prior art keywords
laser
pulse
joules
tens
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1122480A
Other languages
Japanese (ja)
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1122480A priority Critical patent/JPS56111223A/en
Publication of JPS56111223A publication Critical patent/JPS56111223A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

Abstract

PURPOSE:To make it possible to copy a fine pattern below 1mu, by irradiating repeatedly at more than 10 pulses per second the pulse output of laser beam of several or tens of joules. CONSTITUTION:Plasma 39 and X-rays 40 are generated by concentrated 37 beams on a metal target 38 in a vacuum bulb 36. A mask 43 and a substrate 44 in an exposure room 42 filled with He of one atmospheric pressure are irradiated through a window 49. The intensity of the X-ray is detected 45 on the identical position with the substrate. As the laser pulse outputs increasic, pressure cooling effect of oscillation decreases and the repetition speed of the pulses decreases. If the speed is accelerated forcibly, the radiation deteriorates. A combined use of the YAG laser and glass laser results in repeated irradiation of high output laser beams of several or tens of joules at about 10 pulse per second. Thus exposure of very fine resist pattern can be performed in a short time.
JP1122480A 1980-02-01 1980-02-01 X-ray exposuring device Pending JPS56111223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1122480A JPS56111223A (en) 1980-02-01 1980-02-01 X-ray exposuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1122480A JPS56111223A (en) 1980-02-01 1980-02-01 X-ray exposuring device

Publications (1)

Publication Number Publication Date
JPS56111223A true JPS56111223A (en) 1981-09-02

Family

ID=11771981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1122480A Pending JPS56111223A (en) 1980-02-01 1980-02-01 X-ray exposuring device

Country Status (1)

Country Link
JP (1) JPS56111223A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0127861A2 (en) * 1983-06-06 1984-12-12 The University Of Rochester X-ray lithography
JPS60198726A (en) * 1984-03-23 1985-10-08 Hitachi Ltd Method and apparatus for adjusting quantity of exposure of x-ray exposure device
JPS63100728A (en) * 1986-10-17 1988-05-02 Hitachi Ltd X-ray stepper
JPH021904A (en) * 1988-06-10 1990-01-08 Mitsubishi Electric Corp Exposure of mask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0127861A2 (en) * 1983-06-06 1984-12-12 The University Of Rochester X-ray lithography
JPS60198726A (en) * 1984-03-23 1985-10-08 Hitachi Ltd Method and apparatus for adjusting quantity of exposure of x-ray exposure device
JPS63100728A (en) * 1986-10-17 1988-05-02 Hitachi Ltd X-ray stepper
JPH021904A (en) * 1988-06-10 1990-01-08 Mitsubishi Electric Corp Exposure of mask

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