DE3429084A1 - Roentgenstrahlen-belichtungsgeraet - Google Patents

Roentgenstrahlen-belichtungsgeraet

Info

Publication number
DE3429084A1
DE3429084A1 DE19843429084 DE3429084A DE3429084A1 DE 3429084 A1 DE3429084 A1 DE 3429084A1 DE 19843429084 DE19843429084 DE 19843429084 DE 3429084 A DE3429084 A DE 3429084A DE 3429084 A1 DE3429084 A1 DE 3429084A1
Authority
DE
Germany
Prior art keywords
mask
rays
chamber
wafer
sensitive element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19843429084
Other languages
German (de)
English (en)
Other versions
DE3429084C2 (enExample
Inventor
Susumu Hachiohji Tokio/Tokyo Gotoh
Takao Akigawa Tokio/Tokyo Kariya
Yasuo Shizuoka Kawai
Masahiko Tokio/Tokyo Okunuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP59033611A external-priority patent/JPS60178627A/ja
Priority claimed from JP59061335A external-priority patent/JPS60178632A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3429084A1 publication Critical patent/DE3429084A1/de
Application granted granted Critical
Publication of DE3429084C2 publication Critical patent/DE3429084C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19843429084 1984-02-24 1984-08-07 Roentgenstrahlen-belichtungsgeraet Granted DE3429084A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59033611A JPS60178627A (ja) 1984-02-24 1984-02-24 Ｘ線転写装置
JP59061335A JPS60178632A (ja) 1984-03-28 1984-03-28 排気室

Publications (2)

Publication Number Publication Date
DE3429084A1 true DE3429084A1 (de) 1985-08-29
DE3429084C2 DE3429084C2 (enExample) 1993-06-09

Family

ID=26372336

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843429084 Granted DE3429084A1 (de) 1984-02-24 1984-08-07 Roentgenstrahlen-belichtungsgeraet

Country Status (3)

Country Link
US (1) US5164974A (enExample)
DE (1) DE3429084A1 (enExample)
GB (1) GB2155201B (enExample)

Families Citing this family (30)

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Publication number Priority date Publication date Assignee Title
GB2155201B (en) * 1984-02-24 1988-07-13 Canon Kk An x-ray exposure apparatus
EP0353980B1 (en) * 1988-08-02 1995-05-24 Canon Kabushiki Kaisha A mounting method
JP2623127B2 (ja) * 1988-10-05 1997-06-25 キヤノン株式会社 Ｘ線露光装置
US5267292A (en) * 1988-10-05 1993-11-30 Canon Kabushiki Kaisha X-ray exposure apparatus
JP2770960B2 (ja) * 1988-10-06 1998-07-02 キヤノン株式会社 Ｓｏｒ−ｘ線露光装置
JP3173928B2 (ja) * 1992-09-25 2001-06-04 キヤノン株式会社 基板保持装置、基板保持方法および露光装置
US5541856A (en) * 1993-11-08 1996-07-30 Imaging Systems International X-ray inspection system
US5715064A (en) * 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
JP3247554B2 (ja) * 1994-07-19 2002-01-15 キヤノン株式会社 基板搬送装置およびこれを用いた露光装置
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
JPH09247967A (ja) * 1996-03-06 1997-09-19 Minolta Co Ltd 電気機械変換素子を使用した駆動装置
US20030179354A1 (en) * 1996-03-22 2003-09-25 Nikon Corporation Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
CN1244018C (zh) 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
JPH10209039A (ja) 1997-01-27 1998-08-07 Nikon Corp 投影露光方法及び投影露光装置
US6262796B1 (en) 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
EP1450208A1 (en) * 1997-03-10 2004-08-25 ASML Netherlands B.V. Lithographic apparatus having two object holders
JP2001274054A (ja) * 2000-03-24 2001-10-05 Canon Inc 露光装置、半導体デバイス製造方法および半導体デバイス製造工場
US6515736B1 (en) * 2000-05-04 2003-02-04 International Business Machines Corporation Reticle capturing and handling system
US6630988B2 (en) * 2001-06-28 2003-10-07 Intel Corporation Reticle stop block apparatus and method
US7127037B2 (en) * 2002-07-26 2006-10-24 Bede Scientific Instruments Ltd. Soller slit using low density materials
GB2413645A (en) * 2004-04-29 2005-11-02 Boc Group Plc Vacuum treatment for lithography wafer
JP5422416B2 (ja) * 2010-01-28 2014-02-19 株式会社日立製作所 試料搬送装置
JP6243898B2 (ja) 2012-04-19 2017-12-06 インテヴァック インコーポレイテッド 太陽電池製造のための２重マスク装置
US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
SG11201406893XA (en) 2012-04-26 2014-11-27 Intevac Inc System architecture for vacuum processing
CN106688088B (zh) * 2014-08-05 2020-01-10 因特瓦克公司 注入掩膜及对齐
CN204406005U (zh) * 2015-02-28 2015-06-17 成都京东方光电科技有限公司 光取向设备
JP6785171B2 (ja) * 2017-03-08 2020-11-18 株式会社日本製鋼所 成膜方法および電子装置の製造方法並びにプラズマ原子層成長装置
JP6857522B2 (ja) * 2017-03-17 2021-04-14 株式会社日本製鋼所 成膜方法および電子装置の製造方法並びにマスク保持体

Citations (2)

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Publication number Priority date Publication date Assignee Title
US4096389A (en) * 1976-05-10 1978-06-20 G. D. Searle & Co. Apparatus for minimizing radiation exposure and improving resolution in radiation imaging devices
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography

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US3887811A (en) * 1971-10-08 1975-06-03 Radiant Energy Systems Electro mechanical alignment apparatus for electron image projection systems
US3982133A (en) * 1972-11-15 1976-09-21 G. D. Searle & Co. Collimator changer for scintillation camera
US3947687A (en) * 1974-10-23 1976-03-30 The United States Of America As Represented By The Secretary Of The Air Force Collimated x-ray source for x-ray lithographic system
US4181839A (en) * 1977-08-26 1980-01-01 Cardiac Medical Sciences Corp. Multi-view collimator
US4185202A (en) * 1977-12-05 1980-01-22 Bell Telephone Laboratories, Incorporated X-ray lithography
US4215192A (en) * 1978-01-16 1980-07-29 The Perkin-Elmer Corporation X-ray lithography apparatus and method of use
JPS54102184A (en) * 1978-01-27 1979-08-11 Toshiba Corp Collimator device
FR2417179A1 (fr) * 1978-02-08 1979-09-07 Hitachi Ltd Canon electronique a emission de champ
JPS601576B2 (ja) * 1978-03-16 1985-01-16 株式会社日立製作所 白色ｘ線応力測定装置
DE2841124C2 (de) * 1978-09-21 1984-09-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von elektronischen Halbleiterbauelementen durch Röntgen-Lithographie
US4301237A (en) * 1979-07-12 1981-11-17 Western Electric Co., Inc. Method for exposing substrates to X-rays
US4242588A (en) * 1979-08-13 1980-12-30 American Science And Engineering, Inc. X-ray lithography system having collimating optics
DE2939044A1 (de) * 1979-09-27 1981-04-09 Ibm Deutschland Gmbh, 7000 Stuttgart Einrichtung fuer elektronenstrahllithographie
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
US4419585A (en) * 1981-02-26 1983-12-06 Massachusetts General Hospital Variable angle slant hole collimator
JPS57183034A (en) * 1981-05-07 1982-11-11 Toshiba Corp Electron bean transfer device
JPS57194531A (en) * 1981-05-26 1982-11-30 Toshiba Corp Electron beam transfer device
US4419763A (en) * 1981-06-01 1983-12-06 Siemens Gammasonics, Inc. Variable slanted channel collimator
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
FR2519156A1 (fr) * 1981-12-28 1983-07-01 Thomson Csf Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre
EP0083394B1 (en) * 1981-12-31 1986-04-09 International Business Machines Corporation A method and apparatus for providing a uniform illumination of an area
US4453086A (en) * 1981-12-31 1984-06-05 International Business Machines Corporation Electron beam system with reduced charge buildup
JPS5969927A (ja) * 1982-10-15 1984-04-20 Hitachi Ltd Ｘ線露光装置
US4525852A (en) * 1983-03-15 1985-06-25 Micronix Partners Alignment apparatus
US4516253A (en) * 1983-03-15 1985-05-07 Micronix Partners Lithography system
GB2142158A (en) * 1983-05-25 1985-01-09 Philips Electronic Associated Electron lithography masks
US4539695A (en) * 1984-01-06 1985-09-03 The Perkin-Elmer Corporation X-Ray lithography system
US4613981A (en) * 1984-01-24 1986-09-23 Varian Associates, Inc. Method and apparatus for lithographic rotate and repeat processing
GB2155201B (en) * 1984-02-24 1988-07-13 Canon Kk An x-ray exposure apparatus
US4979195A (en) * 1988-09-22 1990-12-18 Fujitsu Limited Vertical stepper
JP2569862B2 (ja) * 1990-02-13 1997-01-08 三菱電機株式会社 Ｘ線露光装置およびｘ線露光方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096389A (en) * 1976-05-10 1978-06-20 G. D. Searle & Co. Apparatus for minimizing radiation exposure and improving resolution in radiation imaging devices
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
J. Vac. Science Tech., Nov./Dez. 1981, S. 1194-1199 *
SST, AUG. 81, S. 57-59 *

Also Published As

Publication number Publication date
GB2155201A (en) 1985-09-18
GB8418145D0 (en) 1984-08-22
GB2155201B (en) 1988-07-13
US5164974A (en) 1992-11-17
DE3429084C2 (enExample) 1993-06-09

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee