DE3330092A1 - Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen - Google Patents
Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessenInfo
- Publication number
- DE3330092A1 DE3330092A1 DE19833330092 DE3330092A DE3330092A1 DE 3330092 A1 DE3330092 A1 DE 3330092A1 DE 19833330092 DE19833330092 DE 19833330092 DE 3330092 A DE3330092 A DE 3330092A DE 3330092 A1 DE3330092 A1 DE 3330092A1
- Authority
- DE
- Germany
- Prior art keywords
- bar
- steam
- layer thickness
- arrangement
- steam sources
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001704 evaporation Methods 0.000 title claims description 23
- 230000008020 evaporation Effects 0.000 title claims description 23
- 238000000034 method Methods 0.000 title claims description 16
- 230000008569 process Effects 0.000 title claims description 4
- 238000007738 vacuum evaporation Methods 0.000 title claims description 4
- 239000000758 substrate Substances 0.000 claims description 16
- 238000009826 distribution Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 8
- 230000015654 memory Effects 0.000 claims description 8
- 238000010586 diagram Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 description 15
- 238000005259 measurement Methods 0.000 description 12
- 230000005540 biological transmission Effects 0.000 description 6
- 238000000691 measurement method Methods 0.000 description 4
- 230000006399 behavior Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000006378 damage Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000001364 causal effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833330092 DE3330092A1 (de) | 1983-08-20 | 1983-08-20 | Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen |
| CH2210/84A CH663801A5 (de) | 1983-08-20 | 1984-05-07 | Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen. |
| US06/639,363 US4627989A (en) | 1983-08-20 | 1984-08-08 | Method and system for a vacuum evaporative deposition process |
| GB08420821A GB2145543B (en) | 1983-08-20 | 1984-08-16 | Film thickness in a vacuum deposition processes |
| JP59171683A JPS6059064A (ja) | 1983-08-20 | 1984-08-20 | 基材上に真空蒸着法で薄層を製造する際に蒸発装置の局部的蒸発パワーを制御するための方法及び装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833330092 DE3330092A1 (de) | 1983-08-20 | 1983-08-20 | Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3330092A1 true DE3330092A1 (de) | 1985-03-07 |
| DE3330092C2 DE3330092C2 (enExample) | 1990-10-18 |
Family
ID=6207021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19833330092 Granted DE3330092A1 (de) | 1983-08-20 | 1983-08-20 | Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4627989A (enExample) |
| JP (1) | JPS6059064A (enExample) |
| CH (1) | CH663801A5 (enExample) |
| DE (1) | DE3330092A1 (enExample) |
| GB (1) | GB2145543B (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6270576A (ja) * | 1985-09-21 | 1987-04-01 | Kawasaki Steel Corp | 大量蒸気流発生用蒸発源装置 |
| US4682105A (en) * | 1983-10-01 | 1987-07-21 | Leybold-Heraeus Gmbh | Apparatus for electrically contactlessly measuring the thickness of electrically conducting thin films on non-conducting travelling webs in vacuum deposition apparatus |
| JPS62207860A (ja) * | 1986-03-07 | 1987-09-12 | Jeol Ltd | 真空蒸着装置 |
| EP0236310A4 (en) * | 1985-09-12 | 1988-01-25 | Dennison Mfg Co | METALLIZATION OF SUBSTRATES. |
| EP0222219A3 (en) * | 1985-11-02 | 1989-01-11 | Leybold Aktiengesellschaft | Device for the bombardment of a medium with an electron beam |
| FR2666593A1 (fr) * | 1990-09-11 | 1992-03-13 | Balzers Hochvakuum | Procede et dispositif pour piloter la densite d'un flux de vaporisation et/ou sa distribution. |
| EP1591750A1 (de) * | 2004-04-26 | 2005-11-02 | Applied Films GmbH & Co. KG | Verfahren und Vorrichtung zur Regelung der Dicke einer Beschichtung auf einem in seiner Längsrichtung bewegten Band |
| DE102016003108A1 (de) * | 2016-03-15 | 2017-09-21 | Forschungszentrum Jülich GmbH Fachbereich Patente | Verfahren zur in-situ Charakterisierung einer auf einem Substrat abzuscheidenden Schicht und Sensoranordnung |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4632057A (en) * | 1985-08-05 | 1986-12-30 | Spectrum Cvd, Inc. | CVD plasma reactor |
| US4640224A (en) * | 1985-08-05 | 1987-02-03 | Spectrum Cvd, Inc. | CVD heat source |
| US4632056A (en) * | 1985-08-05 | 1986-12-30 | Stitz Robert W | CVD temperature control |
| CH665999A5 (fr) * | 1986-03-17 | 1988-06-30 | Bobst Sa | Procede et dispositif pour commander le reglage des organes d'une machine pour les arts graphiques et le cartonnage. |
| JPS6320454A (ja) * | 1986-07-14 | 1988-01-28 | Nippon Kokan Kk <Nkk> | 蒸着装置 |
| DE3624844A1 (de) * | 1986-07-23 | 1988-01-28 | Josef Schucker | Temperiergeraet fuer fluessige klebstoffe |
| GB2224370B (en) * | 1988-11-01 | 1993-08-04 | Toshiba Machine Co Ltd | Input display apparatus |
| DE4113364C1 (enExample) * | 1991-04-24 | 1992-04-02 | Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De | |
| US5815396A (en) * | 1991-08-12 | 1998-09-29 | Hitachi, Ltd. | Vacuum processing device and film forming device and method using same |
| EP0570733B1 (de) * | 1992-05-19 | 1997-08-27 | J.M. Voith GmbH | Auftragswerk zum Auftragen von Streichfarbe auf eine Papierbahn |
| DE4427581A1 (de) * | 1994-08-04 | 1996-02-08 | Leybold Ag | Verfahren zum Aufbringen einer transparenten Metalloxidschicht auf eine Folie |
| FR2724923B1 (fr) * | 1994-09-27 | 1996-12-20 | Saint Gobain Vitrage | Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s) |
| KR100201386B1 (ko) * | 1995-10-28 | 1999-06-15 | 구본준 | 화학기상증착장비의 반응가스 분사장치 |
| US5871805A (en) * | 1996-04-08 | 1999-02-16 | Lemelson; Jerome | Computer controlled vapor deposition processes |
| DE19745771B4 (de) * | 1997-10-16 | 2005-12-22 | Unaxis Deutschland Holding Gmbh | Verfahren für den Betrieb eines Hochleistungs-Elektronenstrahls |
| US6830626B1 (en) | 1999-10-22 | 2004-12-14 | Kurt J. Lesker Company | Method and apparatus for coating a substrate in a vacuum |
| US20050147753A1 (en) * | 1999-10-22 | 2005-07-07 | Kurt J. Lesker Company | Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum |
| CA2388178A1 (en) * | 1999-10-22 | 2001-05-03 | Kurt J. Lesker Company | Method and apparatus for coating a substrate in a vacuum |
| US6524449B1 (en) * | 1999-12-03 | 2003-02-25 | James A. Folta | Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients |
| AU1940101A (en) * | 1999-12-03 | 2001-06-12 | Regents Of The University Of California, The | Method and system relating to thickness control of film vapor deposition |
| TW490714B (en) * | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| KR100332802B1 (ko) * | 2000-02-07 | 2002-04-18 | 구자홍 | Uv 스펙트로미터를 이용한 플라즈마로 중합된 고분자막성능 평가 장치 |
| US20020011205A1 (en) * | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| US7517551B2 (en) * | 2000-05-12 | 2009-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a light-emitting device |
| EP1209252A3 (en) * | 2000-09-15 | 2002-11-27 | Shipley Co. L.L.C. | Continuous coating apparatus |
| FR2836601A1 (fr) * | 2002-02-22 | 2003-08-29 | Thales Sa | Antenne monopolaire ou dipolaire a large bande |
| SG113448A1 (en) | 2002-02-25 | 2005-08-29 | Semiconductor Energy Lab | Fabrication system and a fabrication method of a light emitting device |
| EP1369499A3 (en) | 2002-04-15 | 2004-10-20 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device |
| TWI336905B (en) * | 2002-05-17 | 2011-02-01 | Semiconductor Energy Lab | Evaporation method, evaporation device and method of fabricating light emitting device |
| US20040035360A1 (en) * | 2002-05-17 | 2004-02-26 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| US20030221620A1 (en) * | 2002-06-03 | 2003-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Vapor deposition device |
| US20040040504A1 (en) * | 2002-08-01 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| TWI277363B (en) * | 2002-08-30 | 2007-03-21 | Semiconductor Energy Lab | Fabrication system, light-emitting device and fabricating method of organic compound-containing layer |
| US20040123804A1 (en) | 2002-09-20 | 2004-07-01 | Semiconductor Energy Laboratory Co., Ltd. | Fabrication system and manufacturing method of light emitting device |
| US7211461B2 (en) * | 2003-02-14 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| JP4463492B2 (ja) * | 2003-04-10 | 2010-05-19 | 株式会社半導体エネルギー研究所 | 製造装置 |
| JP4493926B2 (ja) * | 2003-04-25 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 製造装置 |
| US7211454B2 (en) * | 2003-07-25 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate |
| US8123862B2 (en) * | 2003-08-15 | 2012-02-28 | Semiconductor Energy Laboratory Co., Ltd. | Deposition apparatus and manufacturing apparatus |
| SE0400582D0 (sv) * | 2004-03-05 | 2004-03-05 | Forskarpatent I Uppsala Ab | Method for in-line process control of the CIGS process |
| JP4545504B2 (ja) * | 2004-07-15 | 2010-09-15 | 株式会社半導体エネルギー研究所 | 膜形成方法、発光装置の作製方法 |
| US20060124853A1 (en) * | 2004-12-10 | 2006-06-15 | Andrew Corporation | Non-contact surface coating monitor and method of use |
| JP2006225757A (ja) * | 2005-01-21 | 2006-08-31 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| JP5179739B2 (ja) * | 2006-09-27 | 2013-04-10 | 東京エレクトロン株式会社 | 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法 |
| EP2090674B1 (en) * | 2008-01-25 | 2013-03-13 | Applied Materials, Inc. | Vacuum coating installation and method of producing a coating layer on a substrate. |
| KR101094307B1 (ko) * | 2010-02-02 | 2011-12-19 | 삼성모바일디스플레이주식회사 | 표시 장치를 제조하기 위한 장치 및 방법 |
| TW201200614A (en) * | 2010-06-29 | 2012-01-01 | Hon Hai Prec Ind Co Ltd | Coating device |
| WO2012108363A1 (ja) * | 2011-02-10 | 2012-08-16 | シャープ株式会社 | 坩堝、蒸着装置、蒸着方法、有機エレクトロルミネッセンス表示装置の製造方法 |
| KR20140080816A (ko) * | 2012-12-18 | 2014-07-01 | 삼성디스플레이 주식회사 | 증착 장치 및 증착 방법 |
| DE102013100942A1 (de) * | 2013-01-30 | 2014-07-31 | Von Ardenne Anlagentechnik Gmbh | Verfahren zur Reglung der Verdampfungsrate bei Elektronenstrahlverdampfungsprozessen |
| WO2014144189A1 (en) | 2013-03-15 | 2014-09-18 | United Technologies Corporation | Deposition apparatus and methods |
| MX378928B (es) * | 2014-10-30 | 2025-03-11 | Centro De Investigacion En Mat Avanzados S C | Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. |
| DE102018101173B4 (de) * | 2018-01-19 | 2022-09-01 | VON ARDENNE Asset GmbH & Co. KG | Verfahren |
| CN113235053B (zh) * | 2021-05-21 | 2023-03-28 | 辽宁分子流科技有限公司 | 一种蒸发速率智能可调的蒸发镀膜方法 |
| CN116200718B (zh) * | 2022-12-30 | 2025-06-27 | 重庆金美新材料科技有限公司 | 一种薄膜镀层均匀性的评价方法、改善方法和评价系统 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3432335A (en) * | 1966-03-15 | 1969-03-11 | Lokomotivbau Elektrotech | Cyclically moving electron beam for uniform vapor deposited coating |
| DE2402111A1 (de) * | 1974-01-17 | 1975-07-31 | Leybold Heraeus Gmbh & Co Kg | Reihenverdampfer fuer vakuumbedampfungsanlagen |
| DE2812285A1 (de) * | 1978-03-21 | 1979-10-04 | Leybold Heraeus Gmbh & Co Kg | Verfahren zum verdampfen von legierungsschmelzen aus metallen mit voneinander abweichenden dampfdruecken |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2734478A (en) * | 1956-02-14 | Copper | ||
| US3281265A (en) * | 1963-09-17 | 1966-10-25 | United States Steel Corp | Method and apparatus for controlling coating thickness by electron beam evaporation |
| US3397672A (en) * | 1965-11-10 | 1968-08-20 | United States Steel Corp | Control system for vapor-deposition coating apparatus |
| US3602190A (en) * | 1968-10-30 | 1971-08-31 | Western Electric Co | Multiple vaporizing system |
| US3853093A (en) * | 1970-01-14 | 1974-12-10 | Optical Coating Laboratory Inc | Optical thickness rate monitor |
| US3752973A (en) * | 1971-06-30 | 1973-08-14 | Leybold Heraeus Verwaltung | Apparatus for producing voltage functions |
| CH634424A5 (fr) * | 1978-08-18 | 1983-01-31 | Nat Res Dev | Procede et appareil de detection et de commande de depot d'une pellicule fine. |
| JPS57169082A (en) * | 1981-04-08 | 1982-10-18 | Mitsubishi Heavy Ind Ltd | Continuous vacuum vapor-depositing method |
| US4358473A (en) * | 1981-05-22 | 1982-11-09 | Avco Corporation | Process control system |
| JPS57101666A (en) * | 1981-09-22 | 1982-06-24 | Matsushita Electric Ind Co Ltd | Apparatus for preparing vapor deposition film |
| JPS5871370A (ja) * | 1981-10-24 | 1983-04-28 | Nippon Electric Ind Co Ltd | ロ−ルフイルムの金属蒸着自動制御装置 |
-
1983
- 1983-08-20 DE DE19833330092 patent/DE3330092A1/de active Granted
-
1984
- 1984-05-07 CH CH2210/84A patent/CH663801A5/de not_active IP Right Cessation
- 1984-08-08 US US06/639,363 patent/US4627989A/en not_active Expired - Fee Related
- 1984-08-16 GB GB08420821A patent/GB2145543B/en not_active Expired
- 1984-08-20 JP JP59171683A patent/JPS6059064A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3432335A (en) * | 1966-03-15 | 1969-03-11 | Lokomotivbau Elektrotech | Cyclically moving electron beam for uniform vapor deposited coating |
| DE2402111A1 (de) * | 1974-01-17 | 1975-07-31 | Leybold Heraeus Gmbh & Co Kg | Reihenverdampfer fuer vakuumbedampfungsanlagen |
| DE2812285A1 (de) * | 1978-03-21 | 1979-10-04 | Leybold Heraeus Gmbh & Co Kg | Verfahren zum verdampfen von legierungsschmelzen aus metallen mit voneinander abweichenden dampfdruecken |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4682105A (en) * | 1983-10-01 | 1987-07-21 | Leybold-Heraeus Gmbh | Apparatus for electrically contactlessly measuring the thickness of electrically conducting thin films on non-conducting travelling webs in vacuum deposition apparatus |
| EP0236310A4 (en) * | 1985-09-12 | 1988-01-25 | Dennison Mfg Co | METALLIZATION OF SUBSTRATES. |
| JPS6270576A (ja) * | 1985-09-21 | 1987-04-01 | Kawasaki Steel Corp | 大量蒸気流発生用蒸発源装置 |
| EP0222219A3 (en) * | 1985-11-02 | 1989-01-11 | Leybold Aktiengesellschaft | Device for the bombardment of a medium with an electron beam |
| JPS62207860A (ja) * | 1986-03-07 | 1987-09-12 | Jeol Ltd | 真空蒸着装置 |
| FR2666593A1 (fr) * | 1990-09-11 | 1992-03-13 | Balzers Hochvakuum | Procede et dispositif pour piloter la densite d'un flux de vaporisation et/ou sa distribution. |
| US5277938A (en) * | 1990-09-11 | 1994-01-11 | Balzers Aktiengesellschaft | Method for controlling evaporation for vapor deposition |
| EP1591750A1 (de) * | 2004-04-26 | 2005-11-02 | Applied Films GmbH & Co. KG | Verfahren und Vorrichtung zur Regelung der Dicke einer Beschichtung auf einem in seiner Längsrichtung bewegten Band |
| RU2285233C2 (ru) * | 2004-04-26 | 2006-10-10 | Эплайд Филмз ГмбХ энд Ко. КГ | Способ и устройство регулирования толщины слоя материала покрытия, наносимого на перемещающееся в продольном направлении полотно |
| DE102016003108A1 (de) * | 2016-03-15 | 2017-09-21 | Forschungszentrum Jülich GmbH Fachbereich Patente | Verfahren zur in-situ Charakterisierung einer auf einem Substrat abzuscheidenden Schicht und Sensoranordnung |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3330092C2 (enExample) | 1990-10-18 |
| GB2145543B (en) | 1986-11-26 |
| CH663801A5 (de) | 1988-01-15 |
| JPS6059064A (ja) | 1985-04-05 |
| GB8420821D0 (en) | 1984-09-19 |
| US4627989A (en) | 1986-12-09 |
| GB2145543A (en) | 1985-03-27 |
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