JPS57169082A - Continuous vacuum vapor-depositing method - Google Patents

Continuous vacuum vapor-depositing method

Info

Publication number
JPS57169082A
JPS57169082A JP5174281A JP5174281A JPS57169082A JP S57169082 A JPS57169082 A JP S57169082A JP 5174281 A JP5174281 A JP 5174281A JP 5174281 A JP5174281 A JP 5174281A JP S57169082 A JPS57169082 A JP S57169082A
Authority
JP
Japan
Prior art keywords
evaporation
vapor
deposition
controlling
case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5174281A
Other languages
Japanese (ja)
Inventor
Yoshio Shimozato
Shigeo Itano
Tetsuyoshi Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP5174281A priority Critical patent/JPS57169082A/en
Publication of JPS57169082A publication Critical patent/JPS57169082A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To elevate a response propertly for controlling the quantity of evaporation, by dividing an evaporation source into an optional number, and suitably controlling the quantity of evaporation of a small evaporation soruce, in case of continuous vacuum vapor-deposition. CONSTITUTION:An evaporation in a vacuum evaporation chamber 7 is divided into small evaporation sources V-1-V-4, and a molten vapor-deposition metal M is vapor-deposited onto a steel belt 6 by an electric heater 8. Uniformity of the quatity of vapor-deposition in the lengthwise direction of the steel belt 6 is secured by detecting the quantity of vapor-deposition and controlling turn-on power of the electric heater 8. Also, in case when the target quantity of vapor- deposition is changed, for instance, in case when the quantity of vapor-deposition is reduced to 3/4, it can be reduced to 3/4 instantaneously by closing a shutter 5 of the evaporation source V-1 and setting the quantity of evaporation from the evaporation source V-1 to zero. Also, as necessary, the quantity of evaporation can be controlled minutely by controlling the electric power.
JP5174281A 1981-04-08 1981-04-08 Continuous vacuum vapor-depositing method Pending JPS57169082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5174281A JPS57169082A (en) 1981-04-08 1981-04-08 Continuous vacuum vapor-depositing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5174281A JPS57169082A (en) 1981-04-08 1981-04-08 Continuous vacuum vapor-depositing method

Publications (1)

Publication Number Publication Date
JPS57169082A true JPS57169082A (en) 1982-10-18

Family

ID=12895363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5174281A Pending JPS57169082A (en) 1981-04-08 1981-04-08 Continuous vacuum vapor-depositing method

Country Status (1)

Country Link
JP (1) JPS57169082A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059064A (en) * 1983-08-20 1985-04-05 ライボルト・アクチエンゲゼルシャフト Method and device for controlling local evaporation power of evaporator on manufacturing thin layer on substrate by vacuum evaporation process
JPS62158861A (en) * 1985-12-28 1987-07-14 Ishikawajima Harima Heavy Ind Co Ltd Ion plating device
EP1246951A1 (en) * 1999-10-22 2002-10-09 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059064A (en) * 1983-08-20 1985-04-05 ライボルト・アクチエンゲゼルシャフト Method and device for controlling local evaporation power of evaporator on manufacturing thin layer on substrate by vacuum evaporation process
JPS62158861A (en) * 1985-12-28 1987-07-14 Ishikawajima Harima Heavy Ind Co Ltd Ion plating device
EP1246951A1 (en) * 1999-10-22 2002-10-09 Kurt J. Lesker Company Method and apparatus for coating a substrate in a vacuum
EP1246951A4 (en) * 1999-10-22 2004-10-13 Kurt J Lesker Company Method and apparatus for coating a substrate in a vacuum

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