GB1334599A - Vacuum deposition of vapourized metals or metal compounds - Google Patents

Vacuum deposition of vapourized metals or metal compounds

Info

Publication number
GB1334599A
GB1334599A GB2022771A GB2022771A GB1334599A GB 1334599 A GB1334599 A GB 1334599A GB 2022771 A GB2022771 A GB 2022771A GB 2022771 A GB2022771 A GB 2022771A GB 1334599 A GB1334599 A GB 1334599A
Authority
GB
United Kingdom
Prior art keywords
vapour
deposit
varied
input
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2022771A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19702004184 external-priority patent/DE2004184C3/en
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of GB1334599A publication Critical patent/GB1334599A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1334599 Program controlled vapour deposition ROBERT BOSCH GmbH 19 April 1971 [30 Jan 1970] 20227/71 Heading C7F In a process for vacuum deposition of metals or metal compounds on substrates in which the vapour is produced by electron beam heating, the vapour density of the metal or compound is varied by a varying programmed control input superimposed on a basic input to vary the energy or intensity of the electron beam so as to achieve a specific rate of growth or layer structure of the deposit. As shown, Fig.1, a vacuum vessel 10 encloses a substrate 13, a crucible 11 containing a metal 12, such as palladium, to be evaporated, an electron gun 16 and a probe 22 connected to current measuring instrument 24. Basic input to the gun is supplied from high-voltage D.C. unit 18 by way of coupling element 19. Variable input is supplied from source of potential 21 through a programme controller 20 to the coupling element 19. The input is varied to compensate for undesired variations in vapour density due to adventitious fluctuations in the conditions by measuring the ionization current from probe 22 and applying this current to a regulator 25. When depositing palladium, the course of deposition may be controlled to give a layer of high internal stress which cracks on cooling giving a deposit of large surface area useful as a catalyst, or to produce deposits of low stress and good adhesion for use as mirrors. The deposit may be formed of two different materials evaporated from separate crucibles, one being deposited at constant vapour density while the vapour density of the other is varied.
GB2022771A 1970-01-30 1971-04-19 Vacuum deposition of vapourized metals or metal compounds Expired GB1334599A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702004184 DE2004184C3 (en) 1970-01-30 Method and device for the vapor deposition of metals or metal compounds on a carrier in a vacuum with the aid of an electron beam gun

Publications (1)

Publication Number Publication Date
GB1334599A true GB1334599A (en) 1973-10-24

Family

ID=5760947

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2022771A Expired GB1334599A (en) 1970-01-30 1971-04-19 Vacuum deposition of vapourized metals or metal compounds

Country Status (5)

Country Link
JP (1) JPS5123950B1 (en)
CH (1) CH544157A (en)
FR (1) FR2075059A5 (en)
GB (1) GB1334599A (en)
NL (1) NL7101237A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2264718A (en) * 1992-03-04 1993-09-08 Univ Hull Vapour deposited coatings having at least three transitions in structure

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225422A (en) * 1984-04-24 1985-11-09 Hitachi Ltd Forming method of thin film and equipment thereof
CN112119108B (en) 2018-05-21 2022-10-28 旭化成株式会社 Polycarbonate diol

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2264718A (en) * 1992-03-04 1993-09-08 Univ Hull Vapour deposited coatings having at least three transitions in structure
GB2264718B (en) * 1992-03-04 1995-04-26 Univ Hull Coatings produced by vapour deposition

Also Published As

Publication number Publication date
DE2004184B2 (en) 1975-07-03
NL7101237A (en) 1971-08-03
FR2075059A5 (en) 1971-10-08
DE2004184A1 (en) 1971-08-05
JPS5123950B1 (en) 1976-07-20
CH544157A (en) 1973-11-15

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Legal Events

Date Code Title Description
PS Patent sealed
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee