CH544157A - Process for the vapor deposition of metals or metal compounds on a carrier with the aid of electron beam heating, as well as vapor deposition device for carrying out the process - Google Patents

Process for the vapor deposition of metals or metal compounds on a carrier with the aid of electron beam heating, as well as vapor deposition device for carrying out the process

Info

Publication number
CH544157A
CH544157A CH1862970A CH1862970A CH544157A CH 544157 A CH544157 A CH 544157A CH 1862970 A CH1862970 A CH 1862970A CH 1862970 A CH1862970 A CH 1862970A CH 544157 A CH544157 A CH 544157A
Authority
CH
Switzerland
Prior art keywords
vapor deposition
metals
aid
carrier
carrying
Prior art date
Application number
CH1862970A
Other languages
German (de)
Inventor
Traub Eberhardt Ing Dr
Topp Bernhard
Brill Klaus
Grothe Wolfgang
Original Assignee
Bosch Gmbh Robert
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19702004184 external-priority patent/DE2004184C3/en
Application filed by Bosch Gmbh Robert filed Critical Bosch Gmbh Robert
Publication of CH544157A publication Critical patent/CH544157A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
CH1862970A 1970-01-30 1970-12-16 Process for the vapor deposition of metals or metal compounds on a carrier with the aid of electron beam heating, as well as vapor deposition device for carrying out the process CH544157A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702004184 DE2004184C3 (en) 1970-01-30 Method and device for the vapor deposition of metals or metal compounds on a carrier in a vacuum with the aid of an electron beam gun

Publications (1)

Publication Number Publication Date
CH544157A true CH544157A (en) 1973-11-15

Family

ID=5760947

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1862970A CH544157A (en) 1970-01-30 1970-12-16 Process for the vapor deposition of metals or metal compounds on a carrier with the aid of electron beam heating, as well as vapor deposition device for carrying out the process

Country Status (5)

Country Link
JP (1) JPS5123950B1 (en)
CH (1) CH544157A (en)
FR (1) FR2075059A5 (en)
GB (1) GB1334599A (en)
NL (1) NL7101237A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225422A (en) * 1984-04-24 1985-11-09 Hitachi Ltd Forming method of thin film and equipment thereof
GB2264718B (en) * 1992-03-04 1995-04-26 Univ Hull Coatings produced by vapour deposition
WO2019225540A1 (en) 2018-05-21 2019-11-28 旭化成株式会社 Polycarbonate diol

Also Published As

Publication number Publication date
GB1334599A (en) 1973-10-24
NL7101237A (en) 1971-08-03
DE2004184B2 (en) 1975-07-03
DE2004184A1 (en) 1971-08-05
FR2075059A5 (en) 1971-10-08
JPS5123950B1 (en) 1976-07-20

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Legal Events

Date Code Title Description
PL Patent ceased