GB2264718B - Coatings produced by vapour deposition - Google Patents

Coatings produced by vapour deposition

Info

Publication number
GB2264718B
GB2264718B GB9204807A GB9204807A GB2264718B GB 2264718 B GB2264718 B GB 2264718B GB 9204807 A GB9204807 A GB 9204807A GB 9204807 A GB9204807 A GB 9204807A GB 2264718 B GB2264718 B GB 2264718B
Authority
GB
United Kingdom
Prior art keywords
vapour deposition
coatings produced
coatings
produced
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9204807A
Other versions
GB9204807D0 (en
GB2264718A (en
Inventor
Allan Matthews
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Hull
Original Assignee
University of Hull
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Hull filed Critical University of Hull
Priority to GB9204807A priority Critical patent/GB2264718B/en
Publication of GB9204807D0 publication Critical patent/GB9204807D0/en
Publication of GB2264718A publication Critical patent/GB2264718A/en
Application granted granted Critical
Publication of GB2264718B publication Critical patent/GB2264718B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB9204807A 1992-03-04 1992-03-04 Coatings produced by vapour deposition Expired - Fee Related GB2264718B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9204807A GB2264718B (en) 1992-03-04 1992-03-04 Coatings produced by vapour deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9204807A GB2264718B (en) 1992-03-04 1992-03-04 Coatings produced by vapour deposition

Publications (3)

Publication Number Publication Date
GB9204807D0 GB9204807D0 (en) 1992-04-22
GB2264718A GB2264718A (en) 1993-09-08
GB2264718B true GB2264718B (en) 1995-04-26

Family

ID=10711569

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9204807A Expired - Fee Related GB2264718B (en) 1992-03-04 1992-03-04 Coatings produced by vapour deposition

Country Status (1)

Country Link
GB (1) GB2264718B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19742619C1 (en) * 1997-09-26 1999-01-28 Siemens Ag Method and apparatus for introducing powdery solids or liquids into an inductively coupled plasma
DE19742691C1 (en) * 1997-09-26 1999-01-28 Siemens Ag Method and apparatus for coating substrates
ITRM20010060A1 (en) * 2001-02-06 2001-05-07 Carlo Misiano PERFECTION OF A METHOD AND APPARATUS FOR THE DEPOSITION OF THIN FILMS, ESPECIALLY IN REACTIVE CONDITIONS.
DE10342398B4 (en) * 2003-09-13 2008-05-29 Schott Ag Protective layer for a body, and methods of making and using protective layers

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1265545A (en) * 1968-06-24 1972-03-01
GB1334599A (en) * 1970-01-30 1973-10-24 Bosch Gmbh Robert Vacuum deposition of vapourized metals or metal compounds
GB1496590A (en) * 1974-12-06 1977-12-30 Bell Northern Research Ltd Sputtered dielectric thin films
GB2010919A (en) * 1977-12-23 1979-07-04 Balzers Hochvakuum Method for the manufacture of gold-coloured coatings
US4440618A (en) * 1982-03-19 1984-04-03 Anelva Corporation Gas discharge device comprising a pressure controller for controlling a pressure over a wide range
US4591509A (en) * 1980-03-27 1986-05-27 Kernforschungszentrum Karlsruhe Gmbh Process for the preparation of superconducting compound materials
EP0345487A1 (en) * 1988-06-10 1989-12-13 Fujitsu Limited A sputtering method for fabricating thin film
US4933065A (en) * 1988-10-08 1990-06-12 Leybold Aktiengesellschaft Apparatus for applying dielectric or metallic materials
US4963394A (en) * 1988-04-12 1990-10-16 Siemens Aktiengesellschaft Method for producing thin metal films by vapor-deposition
US5015353A (en) * 1987-09-30 1991-05-14 The United States Of America As Represented By The Secretary Of The Navy Method for producing substoichiometric silicon nitride of preselected proportions
GB2242442A (en) * 1990-03-09 1991-10-02 Allan Matthews Modulated composition composites produced by vapour deposition
GB2243162A (en) * 1990-04-17 1991-10-23 Riken Kk A chromium nitride coating having a steadily increasing nitrogen concentration

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1265545A (en) * 1968-06-24 1972-03-01
GB1334599A (en) * 1970-01-30 1973-10-24 Bosch Gmbh Robert Vacuum deposition of vapourized metals or metal compounds
GB1496590A (en) * 1974-12-06 1977-12-30 Bell Northern Research Ltd Sputtered dielectric thin films
GB2010919A (en) * 1977-12-23 1979-07-04 Balzers Hochvakuum Method for the manufacture of gold-coloured coatings
US4591509A (en) * 1980-03-27 1986-05-27 Kernforschungszentrum Karlsruhe Gmbh Process for the preparation of superconducting compound materials
US4440618A (en) * 1982-03-19 1984-04-03 Anelva Corporation Gas discharge device comprising a pressure controller for controlling a pressure over a wide range
US5015353A (en) * 1987-09-30 1991-05-14 The United States Of America As Represented By The Secretary Of The Navy Method for producing substoichiometric silicon nitride of preselected proportions
US4963394A (en) * 1988-04-12 1990-10-16 Siemens Aktiengesellschaft Method for producing thin metal films by vapor-deposition
EP0345487A1 (en) * 1988-06-10 1989-12-13 Fujitsu Limited A sputtering method for fabricating thin film
US4933065A (en) * 1988-10-08 1990-06-12 Leybold Aktiengesellschaft Apparatus for applying dielectric or metallic materials
GB2242442A (en) * 1990-03-09 1991-10-02 Allan Matthews Modulated composition composites produced by vapour deposition
GB2243162A (en) * 1990-04-17 1991-10-23 Riken Kk A chromium nitride coating having a steadily increasing nitrogen concentration

Also Published As

Publication number Publication date
GB9204807D0 (en) 1992-04-22
GB2264718A (en) 1993-09-08

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee