DE3322125C2 - Kathode für die Elektrolyse von Säurelösungen und Verfahren zu ihrer Herstellung - Google Patents
Kathode für die Elektrolyse von Säurelösungen und Verfahren zu ihrer HerstellungInfo
- Publication number
- DE3322125C2 DE3322125C2 DE3322125A DE3322125A DE3322125C2 DE 3322125 C2 DE3322125 C2 DE 3322125C2 DE 3322125 A DE3322125 A DE 3322125A DE 3322125 A DE3322125 A DE 3322125A DE 3322125 C2 DE3322125 C2 DE 3322125C2
- Authority
- DE
- Germany
- Prior art keywords
- cathode
- sprayed
- electrolysis
- top layer
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005868 electrolysis reaction Methods 0.000 title claims abstract description 16
- 239000002253 acid Substances 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 238000000034 method Methods 0.000 title description 15
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000011347 resin Substances 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 22
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 19
- 239000011737 fluorine Substances 0.000 claims abstract description 19
- 239000000203 mixture Substances 0.000 claims description 28
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 23
- 239000001257 hydrogen Substances 0.000 abstract description 23
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 23
- 239000010410 layer Substances 0.000 description 38
- 239000013543 active substance Substances 0.000 description 25
- 239000000843 powder Substances 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 12
- 238000005260 corrosion Methods 0.000 description 12
- 150000002739 metals Chemical class 0.000 description 12
- 239000007921 spray Substances 0.000 description 11
- 239000000956 alloy Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 10
- 238000005507 spraying Methods 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 5
- 229910052741 iridium Inorganic materials 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 229910052758 niobium Inorganic materials 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229910052703 rhodium Inorganic materials 0.000 description 5
- 229910052707 ruthenium Inorganic materials 0.000 description 5
- 229910052715 tantalum Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- PYVHTIWHNXTVPF-UHFFFAOYSA-N F.F.F.F.C=C Chemical compound F.F.F.F.C=C PYVHTIWHNXTVPF-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- -1 TL Ta Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000010285 flame spraying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ODCGXIDLDHZBBZ-UHFFFAOYSA-N C=C.ClF Chemical compound C=C.ClF ODCGXIDLDHZBBZ-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910003296 Ni-Mo Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 229910002848 Pt–Ru Inorganic materials 0.000 description 1
- 229910018879 Pt—Pd Inorganic materials 0.000 description 1
- 229910018967 Pt—Rh Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical compound FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N iridium(IV) oxide Inorganic materials O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- DDTIGTPWGISMKL-UHFFFAOYSA-N molybdenum nickel Chemical compound [Ni].[Mo] DDTIGTPWGISMKL-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/095—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one of the compounds being organic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/046—Alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Fuel Cell (AREA)
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57111778A JPS6022072B2 (ja) | 1982-06-30 | 1982-06-30 | 酸性溶液電解用陰極及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3322125A1 DE3322125A1 (de) | 1984-01-05 |
| DE3322125C2 true DE3322125C2 (de) | 1986-09-11 |
Family
ID=14569926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3322125A Expired DE3322125C2 (de) | 1982-06-30 | 1983-06-20 | Kathode für die Elektrolyse von Säurelösungen und Verfahren zu ihrer Herstellung |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4473454A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS6022072B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR860000563B1 (cg-RX-API-DMAC7.html) |
| CA (1) | CA1220445A (cg-RX-API-DMAC7.html) |
| DE (1) | DE3322125C2 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2529579A1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB2124655B (cg-RX-API-DMAC7.html) |
| IT (1) | IT1170421B (cg-RX-API-DMAC7.html) |
| MY (1) | MY8600676A (cg-RX-API-DMAC7.html) |
| SE (1) | SE454891B (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3222436C2 (de) * | 1982-06-15 | 1987-02-19 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Verfahren zur Herstellung einer wolframcarbidaktivierten Elektrode und deren Verwendung |
| US4555413A (en) * | 1984-08-01 | 1985-11-26 | Inco Alloys International, Inc. | Process for preparing H2 evolution cathodes |
| US4760470A (en) * | 1985-09-27 | 1988-07-26 | Ampex Corporation | Multi-standard adaptive dropout compensator |
| JPS62183477U (cg-RX-API-DMAC7.html) * | 1986-05-14 | 1987-11-20 | ||
| JP2528294B2 (ja) * | 1986-11-11 | 1996-08-28 | ペルメレック電極 株式会社 | 電解用電極及びその製造方法 |
| JPH0290880A (ja) * | 1988-09-28 | 1990-03-30 | Fuji Photo Film Co Ltd | Ｆｍ変調映像信号の再生装置 |
| JP4448751B2 (ja) | 2004-09-30 | 2010-04-14 | 株式会社オーディオテクニカ | コンデンサマイクロホン |
| KR101842964B1 (ko) * | 2016-08-08 | 2018-03-29 | 한국과학기술연구원 | 텅스텐 카바이드 나노플레이크를 이용한 수소 생산용 전극의 제조 방법 및 이에 의해 제조된 수소 생산용 전극 |
| KR102549737B1 (ko) * | 2021-08-04 | 2023-06-29 | 포항공과대학교 산학협력단 | 산소환원촉매를 이용한 금속기재 표면의 내부식성 강화 방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2150411B2 (de) * | 1971-10-09 | 1974-08-15 | Rheinisch-Westfaelisches Elektrizitaetswerk Ag, 4300 Essen | Chemisch inerte Elektrode |
| US4175023A (en) * | 1976-06-11 | 1979-11-20 | Basf Wyandotte Corporation | Combined cathode and diaphragm unit for electrolytic cells |
| US4210501A (en) * | 1977-12-09 | 1980-07-01 | General Electric Company | Generation of halogens by electrolysis of hydrogen halides in a cell having catalytic electrodes bonded to a solid polymer electrolyte |
| US4295951A (en) * | 1980-05-14 | 1981-10-20 | Hooker Chemicals & Plastics Corp. | Film-coated cathodes for halate cells |
| JPS6022070B2 (ja) * | 1981-09-22 | 1985-05-30 | ペルメレツク電極株式会社 | 酸性溶液電解用陰極及びその製造方法 |
-
1982
- 1982-06-30 JP JP57111778A patent/JPS6022072B2/ja not_active Expired
-
1983
- 1983-06-15 GB GB08316297A patent/GB2124655B/en not_active Expired
- 1983-06-16 KR KR1019830002685A patent/KR860000563B1/ko not_active Expired
- 1983-06-20 DE DE3322125A patent/DE3322125C2/de not_active Expired
- 1983-06-28 FR FR8310649A patent/FR2529579A1/fr active Granted
- 1983-06-28 CA CA000431289A patent/CA1220445A/en not_active Expired
- 1983-06-28 US US06/508,752 patent/US4473454A/en not_active Expired - Fee Related
- 1983-06-29 SE SE8303726A patent/SE454891B/sv not_active IP Right Cessation
- 1983-06-29 IT IT48597/83A patent/IT1170421B/it active
-
1986
- 1986-12-30 MY MY676/86A patent/MY8600676A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPS596387A (ja) | 1984-01-13 |
| IT8348597A0 (it) | 1983-06-29 |
| SE8303726D0 (sv) | 1983-06-29 |
| US4473454A (en) | 1984-09-25 |
| FR2529579A1 (fr) | 1984-01-06 |
| CA1220445A (en) | 1987-04-14 |
| KR840004947A (ko) | 1984-10-31 |
| GB2124655A (en) | 1984-02-22 |
| JPS6022072B2 (ja) | 1985-05-30 |
| GB2124655B (en) | 1985-09-04 |
| SE454891B (sv) | 1988-06-06 |
| MY8600676A (en) | 1986-12-31 |
| GB8316297D0 (en) | 1983-07-20 |
| DE3322125A1 (de) | 1984-01-05 |
| KR860000563B1 (ko) | 1986-05-14 |
| SE8303726L (sv) | 1983-12-31 |
| IT1170421B (it) | 1987-06-03 |
| FR2529579B1 (cg-RX-API-DMAC7.html) | 1985-05-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |