JPS6022072B2 - 酸性溶液電解用陰極及びその製造方法 - Google Patents
酸性溶液電解用陰極及びその製造方法Info
- Publication number
- JPS6022072B2 JPS6022072B2 JP57111778A JP11177882A JPS6022072B2 JP S6022072 B2 JPS6022072 B2 JP S6022072B2 JP 57111778 A JP57111778 A JP 57111778A JP 11177882 A JP11177882 A JP 11177882A JP S6022072 B2 JPS6022072 B2 JP S6022072B2
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- coating layer
- mixture
- powder
- active material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005868 electrolysis reaction Methods 0.000 title claims description 16
- 239000003929 acidic solution Substances 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000011247 coating layer Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 22
- 229920005989 resin Polymers 0.000 claims description 22
- 239000006182 cathode active material Substances 0.000 claims description 19
- 239000000843 powder Substances 0.000 claims description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 14
- 239000011737 fluorine Substances 0.000 claims description 14
- 229910052731 fluorine Inorganic materials 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005507 spraying Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 9
- 239000000956 alloy Substances 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 9
- 239000010410 layer Substances 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 238000007750 plasma spraying Methods 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 238000010285 flame spraying Methods 0.000 claims description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims 3
- 229910052804 chromium Inorganic materials 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 20
- 239000001257 hydrogen Substances 0.000 description 20
- 229910052739 hydrogen Inorganic materials 0.000 description 20
- 238000005260 corrosion Methods 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 238000007751 thermal spraying Methods 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000010406 cathode material Substances 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 241000124033 Salix Species 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- -1 composed of these Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- FPBWSPZHCJXUBL-UHFFFAOYSA-N 1-chloro-1-fluoroethene Chemical group FC(Cl)=C FPBWSPZHCJXUBL-UHFFFAOYSA-N 0.000 description 1
- 229910003296 Ni-Mo Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018106 Ni—C Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- DDTIGTPWGISMKL-UHFFFAOYSA-N molybdenum nickel Chemical compound [Ni].[Mo] DDTIGTPWGISMKL-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000012255 powdered metal Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/095—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one of the compounds being organic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/046—Alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Fuel Cell (AREA)
- Coating By Spraying Or Casting (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57111778A JPS6022072B2 (ja) | 1982-06-30 | 1982-06-30 | 酸性溶液電解用陰極及びその製造方法 |
| IN717/CAL/83A IN159552B (cg-RX-API-DMAC7.html) | 1982-06-30 | 1983-06-06 | |
| GB08316297A GB2124655B (en) | 1982-06-30 | 1983-06-15 | Production of coated metal cathode for electrolysis |
| KR1019830002685A KR860000563B1 (ko) | 1982-06-30 | 1983-06-16 | 산성용액의 전해질용 캐소드 및 그 제조방법 |
| DE3322125A DE3322125C2 (de) | 1982-06-30 | 1983-06-20 | Kathode für die Elektrolyse von Säurelösungen und Verfahren zu ihrer Herstellung |
| CA000431289A CA1220445A (en) | 1982-06-30 | 1983-06-28 | Cathode with intermediate layer and fluorine resin and active substance top layer |
| FR8310649A FR2529579A1 (fr) | 1982-06-30 | 1983-06-28 | Cathode pour l'electrolyse de solutions acides et procede pour sa production |
| US06/508,752 US4473454A (en) | 1982-06-30 | 1983-06-28 | Cathode for electrolysis of acid solution and process for the production thereof |
| SE8303726A SE454891B (sv) | 1982-06-30 | 1983-06-29 | Katod for elektrolys av sura losningar samt sett att framstella katoden |
| IT48597/83A IT1170421B (it) | 1982-06-30 | 1983-06-29 | Catodo per elettrolisi di soluzioni acide e procedimento per produrlo |
| MY676/86A MY8600676A (en) | 1982-06-30 | 1986-12-30 | Production of coated metal chatode for electrolysis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57111778A JPS6022072B2 (ja) | 1982-06-30 | 1982-06-30 | 酸性溶液電解用陰極及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS596387A JPS596387A (ja) | 1984-01-13 |
| JPS6022072B2 true JPS6022072B2 (ja) | 1985-05-30 |
Family
ID=14569926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57111778A Expired JPS6022072B2 (ja) | 1982-06-30 | 1982-06-30 | 酸性溶液電解用陰極及びその製造方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4473454A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS6022072B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR860000563B1 (cg-RX-API-DMAC7.html) |
| CA (1) | CA1220445A (cg-RX-API-DMAC7.html) |
| DE (1) | DE3322125C2 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2529579A1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB2124655B (cg-RX-API-DMAC7.html) |
| IT (1) | IT1170421B (cg-RX-API-DMAC7.html) |
| MY (1) | MY8600676A (cg-RX-API-DMAC7.html) |
| SE (1) | SE454891B (cg-RX-API-DMAC7.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6278990A (ja) * | 1985-09-27 | 1987-04-11 | アムペックス コーポレーシヨン | デジタルドロツプアウト補償器 |
| JPS62183477U (cg-RX-API-DMAC7.html) * | 1986-05-14 | 1987-11-20 | ||
| JPH0290880A (ja) * | 1988-09-28 | 1990-03-30 | Fuji Photo Film Co Ltd | Ｆｍ変調映像信号の再生装置 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3222436C2 (de) * | 1982-06-15 | 1987-02-19 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Verfahren zur Herstellung einer wolframcarbidaktivierten Elektrode und deren Verwendung |
| US4555413A (en) * | 1984-08-01 | 1985-11-26 | Inco Alloys International, Inc. | Process for preparing H2 evolution cathodes |
| JP2528294B2 (ja) * | 1986-11-11 | 1996-08-28 | ペルメレック電極 株式会社 | 電解用電極及びその製造方法 |
| JP4448751B2 (ja) | 2004-09-30 | 2010-04-14 | 株式会社オーディオテクニカ | コンデンサマイクロホン |
| KR101842964B1 (ko) * | 2016-08-08 | 2018-03-29 | 한국과학기술연구원 | 텅스텐 카바이드 나노플레이크를 이용한 수소 생산용 전극의 제조 방법 및 이에 의해 제조된 수소 생산용 전극 |
| KR102549737B1 (ko) * | 2021-08-04 | 2023-06-29 | 포항공과대학교 산학협력단 | 산소환원촉매를 이용한 금속기재 표면의 내부식성 강화 방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2150411B2 (de) * | 1971-10-09 | 1974-08-15 | Rheinisch-Westfaelisches Elektrizitaetswerk Ag, 4300 Essen | Chemisch inerte Elektrode |
| US4175023A (en) * | 1976-06-11 | 1979-11-20 | Basf Wyandotte Corporation | Combined cathode and diaphragm unit for electrolytic cells |
| US4210501A (en) * | 1977-12-09 | 1980-07-01 | General Electric Company | Generation of halogens by electrolysis of hydrogen halides in a cell having catalytic electrodes bonded to a solid polymer electrolyte |
| US4295951A (en) * | 1980-05-14 | 1981-10-20 | Hooker Chemicals & Plastics Corp. | Film-coated cathodes for halate cells |
| JPS6022070B2 (ja) * | 1981-09-22 | 1985-05-30 | ペルメレツク電極株式会社 | 酸性溶液電解用陰極及びその製造方法 |
-
1982
- 1982-06-30 JP JP57111778A patent/JPS6022072B2/ja not_active Expired
-
1983
- 1983-06-15 GB GB08316297A patent/GB2124655B/en not_active Expired
- 1983-06-16 KR KR1019830002685A patent/KR860000563B1/ko not_active Expired
- 1983-06-20 DE DE3322125A patent/DE3322125C2/de not_active Expired
- 1983-06-28 FR FR8310649A patent/FR2529579A1/fr active Granted
- 1983-06-28 CA CA000431289A patent/CA1220445A/en not_active Expired
- 1983-06-28 US US06/508,752 patent/US4473454A/en not_active Expired - Fee Related
- 1983-06-29 SE SE8303726A patent/SE454891B/sv not_active IP Right Cessation
- 1983-06-29 IT IT48597/83A patent/IT1170421B/it active
-
1986
- 1986-12-30 MY MY676/86A patent/MY8600676A/xx unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6278990A (ja) * | 1985-09-27 | 1987-04-11 | アムペックス コーポレーシヨン | デジタルドロツプアウト補償器 |
| JPS62183477U (cg-RX-API-DMAC7.html) * | 1986-05-14 | 1987-11-20 | ||
| JPH0290880A (ja) * | 1988-09-28 | 1990-03-30 | Fuji Photo Film Co Ltd | Ｆｍ変調映像信号の再生装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS596387A (ja) | 1984-01-13 |
| IT8348597A0 (it) | 1983-06-29 |
| SE8303726D0 (sv) | 1983-06-29 |
| US4473454A (en) | 1984-09-25 |
| FR2529579A1 (fr) | 1984-01-06 |
| CA1220445A (en) | 1987-04-14 |
| DE3322125C2 (de) | 1986-09-11 |
| KR840004947A (ko) | 1984-10-31 |
| GB2124655A (en) | 1984-02-22 |
| GB2124655B (en) | 1985-09-04 |
| SE454891B (sv) | 1988-06-06 |
| MY8600676A (en) | 1986-12-31 |
| GB8316297D0 (en) | 1983-07-20 |
| DE3322125A1 (de) | 1984-01-05 |
| KR860000563B1 (ko) | 1986-05-14 |
| SE8303726L (sv) | 1983-12-31 |
| IT1170421B (it) | 1987-06-03 |
| FR2529579B1 (cg-RX-API-DMAC7.html) | 1985-05-10 |
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