DE3209055A1 - Verfahren zur herstellung eines fotoleitfaehigen elements - Google Patents
Verfahren zur herstellung eines fotoleitfaehigen elementsInfo
- Publication number
- DE3209055A1 DE3209055A1 DE19823209055 DE3209055A DE3209055A1 DE 3209055 A1 DE3209055 A1 DE 3209055A1 DE 19823209055 DE19823209055 DE 19823209055 DE 3209055 A DE3209055 A DE 3209055A DE 3209055 A1 DE3209055 A1 DE 3209055A1
- Authority
- DE
- Germany
- Prior art keywords
- compounds
- photoconductive
- layer
- formula
- substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
- G03G5/08278—Depositing methods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
- H10F77/1692—Thin semiconductor films on metallic or insulating substrates the films including only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56036267A JPS57149466A (en) | 1981-03-12 | 1981-03-12 | Production of photoconductive member |
| JP56037442A JPS57152464A (en) | 1981-03-16 | 1981-03-16 | Manufacture of photoconductive member |
| JP56037441A JPS57152463A (en) | 1981-03-16 | 1981-03-16 | Manufacture of photoconductive member |
| JP56060154A JPS57174449A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
| JP56060158A JPS57174452A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
| JP56060157A JPS57174454A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
| JP56060156A JPS6050871B2 (ja) | 1981-04-21 | 1981-04-21 | 光導電部材の製造法 |
| JP56060153A JPS57174448A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
| JP56060155A JPS57174450A (en) | 1981-04-21 | 1981-04-21 | Production of photoconductive member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3209055A1 true DE3209055A1 (de) | 1982-10-21 |
| DE3209055C2 DE3209055C2 (enExample) | 1988-02-11 |
Family
ID=27576896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19823209055 Granted DE3209055A1 (de) | 1981-03-12 | 1982-03-12 | Verfahren zur herstellung eines fotoleitfaehigen elements |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4468443A (enExample) |
| DE (1) | DE3209055A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3345108A1 (de) * | 1982-12-16 | 1984-06-20 | Sharp K.K., Osaka | Photorezeptor fuer die elektrophotographie |
| DE3415620A1 (de) * | 1983-04-28 | 1984-10-31 | Canon K.K., Tokio/Tokyo | Verfahren zur herstellung eines bilderzeugungselements |
| EP0220993A3 (en) * | 1985-10-30 | 1988-06-08 | Fujitsu Limited | Electrophotographic multi-layered photosensitive member having a top layer of amorphous silicon carbine and method for fabricating the same |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3429899A1 (de) * | 1983-08-16 | 1985-03-07 | Canon K.K., Tokio/Tokyo | Verfahren zur bildung eines abscheidungsfilms |
| JPS60243663A (ja) * | 1984-05-18 | 1985-12-03 | Kyocera Corp | 電子写真感光体 |
| US4759947A (en) * | 1984-10-08 | 1988-07-26 | Canon Kabushiki Kaisha | Method for forming deposition film using Si compound and active species from carbon and halogen compound |
| US4849315A (en) * | 1985-01-21 | 1989-07-18 | Xerox Corporation | Processes for restoring hydrogenated and halogenated amorphous silicon imaging members |
| US4726963A (en) * | 1985-02-19 | 1988-02-23 | Canon Kabushiki Kaisha | Process for forming deposited film |
| US4778692A (en) * | 1985-02-20 | 1988-10-18 | Canon Kabushiki Kaisha | Process for forming deposited film |
| US5244698A (en) * | 1985-02-21 | 1993-09-14 | Canon Kabushiki Kaisha | Process for forming deposited film |
| US4818563A (en) * | 1985-02-21 | 1989-04-04 | Canon Kabushiki Kaisha | Process for forming deposited film |
| US4853251A (en) * | 1985-02-22 | 1989-08-01 | Canon Kabushiki Kaisha | Process for forming deposited film including carbon as a constituent element |
| US4801468A (en) * | 1985-02-25 | 1989-01-31 | Canon Kabushiki Kaisha | Process for forming deposited film |
| JP2537175B2 (ja) * | 1985-03-27 | 1996-09-25 | キヤノン株式会社 | 機能性堆積膜の製造装置 |
| JPH0647727B2 (ja) * | 1985-12-24 | 1994-06-22 | キヤノン株式会社 | 堆積膜形成法 |
| JPH084071B2 (ja) * | 1985-12-28 | 1996-01-17 | キヤノン株式会社 | 堆積膜形成法 |
| US5030536A (en) * | 1989-12-26 | 1991-07-09 | Xerox Corporation | Processes for restoring amorphous silicon imaging members |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2855718A1 (de) * | 1977-12-22 | 1979-06-28 | Canon Kk | Lichtempfindliches element fuer die elektrophotographie und verfahren zu dessen herstellung |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4317844A (en) * | 1975-07-28 | 1982-03-02 | Rca Corporation | Semiconductor device having a body of amorphous silicon and method of making the same |
| US4328258A (en) * | 1977-12-05 | 1982-05-04 | Plasma Physics Corp. | Method of forming semiconducting materials and barriers |
| US4217374A (en) * | 1978-03-08 | 1980-08-12 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors |
| JPS574053A (en) * | 1980-06-09 | 1982-01-09 | Canon Inc | Photoconductive member |
-
1982
- 1982-03-04 US US06/354,898 patent/US4468443A/en not_active Expired - Lifetime
- 1982-03-12 DE DE19823209055 patent/DE3209055A1/de active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2855718A1 (de) * | 1977-12-22 | 1979-06-28 | Canon Kk | Lichtempfindliches element fuer die elektrophotographie und verfahren zu dessen herstellung |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3345108A1 (de) * | 1982-12-16 | 1984-06-20 | Sharp K.K., Osaka | Photorezeptor fuer die elektrophotographie |
| DE3415620A1 (de) * | 1983-04-28 | 1984-10-31 | Canon K.K., Tokio/Tokyo | Verfahren zur herstellung eines bilderzeugungselements |
| FR2545233A1 (fr) * | 1983-04-28 | 1984-11-02 | Canon Kk | Procede de production d'un element photoconducteur de production d'image |
| EP0220993A3 (en) * | 1985-10-30 | 1988-06-08 | Fujitsu Limited | Electrophotographic multi-layered photosensitive member having a top layer of amorphous silicon carbine and method for fabricating the same |
| US4777103A (en) * | 1985-10-30 | 1988-10-11 | Fujitsu Limited | Electrophotographic multi-layered photosensitive member having a top protective layer of hydrogenated amorphous silicon carbide and method for fabricating the same |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3209055C2 (enExample) | 1988-02-11 |
| US4468443A (en) | 1984-08-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition |