JPS57152463A - Manufacture of photoconductive member - Google Patents

Manufacture of photoconductive member

Info

Publication number
JPS57152463A
JPS57152463A JP56037441A JP3744181A JPS57152463A JP S57152463 A JPS57152463 A JP S57152463A JP 56037441 A JP56037441 A JP 56037441A JP 3744181 A JP3744181 A JP 3744181A JP S57152463 A JPS57152463 A JP S57152463A
Authority
JP
Japan
Prior art keywords
photoconductive
photoconductive layer
compounds
si2f6
sicl4
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56037441A
Other languages
Japanese (ja)
Other versions
JPS6331551B2 (en
Inventor
Isamu Shimizu
Kyosuke Ogawa
Hidekazu Inoue
Junichiro Kanbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP56037441A priority Critical patent/JPS57152463A/en
Priority to US06/354,898 priority patent/US4468443A/en
Priority to DE19823209055 priority patent/DE3209055A1/en
Publication of JPS57152463A publication Critical patent/JPS57152463A/en
Publication of JPS6331551B2 publication Critical patent/JPS6331551B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Abstract

PURPOSE:To obtain economically and easily a photoconductive member with superior photoconductive and electric characteristics by introducing >=2 kinds of specified Si compounds contg. halogen as gaseous starting material when a photoconductive layer is formed on a support. CONSTITUTION:Starting material for forming a photoconductive layer is composed of >=2 kinds of compounds represented by SimHlXk (where l+k=2m+2, l is 0 or an integer, and X is halogen), e.g., SiCl4, Si2F6 and Si2Cl6. The compounds are mixed so as to adjust the percentage of the compound of higher order of (m) such as Si2F6 to the compound of the lowest order of (m) such as SiCl4 to >=1vol%, and the mixture is introduced into a deposition chamber in the gaseous state. Glow discharge, arc discharge or other discharge is then caused in the mixed gaseous atmosphere to form a photoconductive layer on a support.
JP56037441A 1981-03-12 1981-03-16 Manufacture of photoconductive member Granted JPS57152463A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56037441A JPS57152463A (en) 1981-03-16 1981-03-16 Manufacture of photoconductive member
US06/354,898 US4468443A (en) 1981-03-12 1982-03-04 Process for producing photoconductive member from gaseous silicon compounds
DE19823209055 DE3209055A1 (en) 1981-03-12 1982-03-12 METHOD FOR PRODUCING A PHOTO-CONDUCTIVE ELEMENT

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56037441A JPS57152463A (en) 1981-03-16 1981-03-16 Manufacture of photoconductive member

Publications (2)

Publication Number Publication Date
JPS57152463A true JPS57152463A (en) 1982-09-20
JPS6331551B2 JPS6331551B2 (en) 1988-06-24

Family

ID=12497592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56037441A Granted JPS57152463A (en) 1981-03-12 1981-03-16 Manufacture of photoconductive member

Country Status (1)

Country Link
JP (1) JPS57152463A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068050A (en) * 1983-08-19 1985-04-18 エナージー・コンバーション・デバイセス・インコーポレーテッド Deposition method using new composition by selective light excitation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068050A (en) * 1983-08-19 1985-04-18 エナージー・コンバーション・デバイセス・インコーポレーテッド Deposition method using new composition by selective light excitation

Also Published As

Publication number Publication date
JPS6331551B2 (en) 1988-06-24

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