JPS64727A - Forming method of deposit film - Google Patents

Abstract

PURPOSE: To form a deposit film, to lower even a substrate temperature at the time of the formation of the deposit film further and to manufacture the deposit film having the stable quality of the film industrially at low cost in a large quantity by separately introducing active species formed from a compound containing carbon and halogen and a film-formation raw material into film formation space and working and reacting a catalyst consisting of a specific metal or metallic compound heated to these active species and raw material.

CONSTITUTION: Honeycomb molybdenum 112 as a catalyst composed of a metal or metallic compound selected from the element groups of the fourth period, the fifth period and the sixth period of the periodic table is supplied with electric power through a conductor 113, and brought to a red heat state. H₂ gas mixed from a gas supply tube 107 is introduced into a film formation chamber 101. An activating chamber 108 is filled with solid C grains, the solid C grains are heated by an electric furnace as an activation energy source 109, C is brought to a red heat state, and CF₄ gas is blown into the chamber 108 through the introducing tube 107, thus forming active species, then inducing the active species into the film formation chamber 101.

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