DE2632949A1 - Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat - Google Patents

Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat

Info

Publication number
DE2632949A1
DE2632949A1 DE19762632949 DE2632949A DE2632949A1 DE 2632949 A1 DE2632949 A1 DE 2632949A1 DE 19762632949 DE19762632949 DE 19762632949 DE 2632949 A DE2632949 A DE 2632949A DE 2632949 A1 DE2632949 A1 DE 2632949A1
Authority
DE
Germany
Prior art keywords
photo
stripping solution
acid
stripping
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19762632949
Other languages
German (de)
English (en)
Other versions
DE2632949C2 (enExample
Inventor
Mey John E Vander
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Publication of DE2632949A1 publication Critical patent/DE2632949A1/de
Application granted granted Critical
Publication of DE2632949C2 publication Critical patent/DE2632949C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE19762632949 1975-08-01 1976-07-22 Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat Granted DE2632949A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (2)

Publication Number Publication Date
DE2632949A1 true DE2632949A1 (de) 1977-02-17
DE2632949C2 DE2632949C2 (enExample) 1987-11-19

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19762632949 Granted DE2632949A1 (de) 1975-08-01 1976-07-22 Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat

Country Status (6)

Country Link
JP (1) JPS5220101A (enExample)
CA (1) CA1074219A (enExample)
DE (1) DE2632949A1 (enExample)
FR (1) FR2319396A1 (enExample)
GB (1) GB1551143A (enExample)
IT (1) IT1125196B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2749333A1 (de) * 1976-11-08 1978-05-11 Allied Chem Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
CA1116059A (en) * 1978-05-22 1982-01-12 Allied Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper
JPH0212154A (ja) * 1988-04-13 1990-01-17 Siemens Ag 金属伝導層上のフオトレジスト層の除去方法
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
In Betracht gezogenes älteres Patent: DE-PS 24 54 399 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2749333A1 (de) * 1976-11-08 1978-05-11 Allied Chem Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents

Also Published As

Publication number Publication date
JPS5220101A (en) 1977-02-15
FR2319396A1 (fr) 1977-02-25
DE2632949C2 (enExample) 1987-11-19
IT1125196B (it) 1986-05-14
GB1551143A (en) 1979-08-22
FR2319396B1 (enExample) 1980-03-14
CA1074219A (en) 1980-03-25

Similar Documents

Publication Publication Date Title
DE3856202T2 (de) Triamin-Entschichtungslösung für positive Photolacke
DE2501187C2 (de) Entschichtungsmittel und dessen Verwendung
DE69029586T2 (de) Photolackentferner
DE2744027C2 (de) Organisches Ausstreifmittel
DE60212366T2 (de) Reinigerzusammensetzung
DE69526637T2 (de) Reinigungsmittelzusammensetzung und Verfahren zum Entfernen von Photoresist mit dieser Zusammensetzung
DE60212937T2 (de) Verfahren zum Entfernen von Rückständen von der Mikrostruktur eines Objektes
DE2749333A1 (de) Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat
DE60108286T2 (de) Entfernungsmittel für Polymer
DE2447225C2 (de) Verfahren zum Ablösen von positiven Photolack
DE602004009791T2 (de) Siloxan-harz basierte anti-reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
DE3537441A1 (de) Loesemittel zum entfernen von photoresists
DE2536404C2 (de) Verfahren zur Entplattierung von Zinn oder Zinn-Blei-Legierungen von Kupfersubstraten und wässerige saure Lösung zur Durchführung des Verfahrens
DE2457377C2 (enExample)
DE3831574C2 (de) Entfernerlösung für Resists
DE3723402A1 (de) Verfahren zum spuelen eines substrats
DE3501675A1 (de) Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten
DE2454399A1 (de) Abloesemittel fuer fotolacke
EP1733421B1 (de) Wässrige lösung und verwendung dieser lösung zur entfernung von post-etch residue von halbleitersubstraten
DE10237042A1 (de) Zusammensetzung und Verfahren zur Resistentfernung
EP0177905B1 (de) Verfahren zum Entwickeln und zum Entschichten von Photoresistschichten mit quaternären Ammomiumverbindungen
EP1490899B1 (de) Zusammensetzung zum entfernen von "sidewall-residues"
DE2632949C2 (enExample)
DE2001339A1 (de) Verfahren zur Erhoehung der Adhaesion von Photolacken
DE2919666C2 (enExample)

Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: ALLIED CORP., MORRIS TOWNSHIP, N.J., US

8128 New person/name/address of the agent

Representative=s name: WEBER, D., DIPL.-CHEM. DR.RER.NAT. SEIFFERT, K., D

8110 Request for examination paragraph 44
Q176 The application caused the suspense of an application

Ref document number: 2749333

Country of ref document: DE

AG Has addition no.

Ref country code: DE

Ref document number: 2749333

Format of ref document f/p: P

D2 Grant after examination
8363 Opposition against the patent
8365 Fully valid after opposition proceedings
AG Has addition no.

Ref country code: DE

Ref document number: 2749333

Format of ref document f/p: P