DE2632949C2 - - Google Patents

Info

Publication number
DE2632949C2
DE2632949C2 DE2632949A DE2632949A DE2632949C2 DE 2632949 C2 DE2632949 C2 DE 2632949C2 DE 2632949 A DE2632949 A DE 2632949A DE 2632949 A DE2632949 A DE 2632949A DE 2632949 C2 DE2632949 C2 DE 2632949C2
Authority
DE
Germany
Prior art keywords
stripping solution
acid
weight
carbon atoms
phenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2632949A
Other languages
German (de)
English (en)
Other versions
DE2632949A1 (de
Inventor
John E. Stirling N.J. Us Vander Mey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Allied Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Corp filed Critical Allied Corp
Publication of DE2632949A1 publication Critical patent/DE2632949A1/de
Application granted granted Critical
Publication of DE2632949C2 publication Critical patent/DE2632949C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE19762632949 1975-08-01 1976-07-22 Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat Granted DE2632949A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (2)

Publication Number Publication Date
DE2632949A1 DE2632949A1 (de) 1977-02-17
DE2632949C2 true DE2632949C2 (enExample) 1987-11-19

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19762632949 Granted DE2632949A1 (de) 1975-08-01 1976-07-22 Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat

Country Status (6)

Country Link
JP (1) JPS5220101A (enExample)
CA (1) CA1074219A (enExample)
DE (1) DE2632949A1 (enExample)
FR (1) FR2319396A1 (enExample)
GB (1) GB1551143A (enExample)
IT (1) IT1125196B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2749333A1 (de) * 1976-11-08 1978-05-11 Allied Chem Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat
EP0337342A1 (de) * 1988-04-13 1989-10-18 Siemens Aktiengesellschaft Verfahren zum Entschichten von Photolack

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
CA1116059A (en) * 1978-05-22 1982-01-12 Allied Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2749333A1 (de) * 1976-11-08 1978-05-11 Allied Chem Ausstreifloesung zur entfernung polymerer organischer substanzen von einem anorganischen substrat
EP0337342A1 (de) * 1988-04-13 1989-10-18 Siemens Aktiengesellschaft Verfahren zum Entschichten von Photolack

Also Published As

Publication number Publication date
JPS5220101A (en) 1977-02-15
FR2319396A1 (fr) 1977-02-25
IT1125196B (it) 1986-05-14
GB1551143A (en) 1979-08-22
DE2632949A1 (de) 1977-02-17
FR2319396B1 (enExample) 1980-03-14
CA1074219A (en) 1980-03-25

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Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: ALLIED CORP., MORRIS TOWNSHIP, N.J., US

8128 New person/name/address of the agent

Representative=s name: WEBER, D., DIPL.-CHEM. DR.RER.NAT. SEIFFERT, K., D

8110 Request for examination paragraph 44
Q176 The application caused the suspense of an application

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