GB1551143A - Method of stripping a photoresist and composition therefor - Google Patents

Method of stripping a photoresist and composition therefor

Info

Publication number
GB1551143A
GB1551143A GB3040376A GB3040376A GB1551143A GB 1551143 A GB1551143 A GB 1551143A GB 3040376 A GB3040376 A GB 3040376A GB 3040376 A GB3040376 A GB 3040376A GB 1551143 A GB1551143 A GB 1551143A
Authority
GB
United Kingdom
Prior art keywords
photoresist
stripping
composition therefor
therefor
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3040376A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allied Corp
Original Assignee
Allied Chemical and Dye Corp
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical and Dye Corp, Allied Chemical Corp filed Critical Allied Chemical and Dye Corp
Publication of GB1551143A publication Critical patent/GB1551143A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
GB3040376A 1975-08-01 1976-07-21 Method of stripping a photoresist and composition therefor Expired GB1551143A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (1)

Publication Number Publication Date
GB1551143A true GB1551143A (en) 1979-08-22

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3040376A Expired GB1551143A (en) 1975-08-01 1976-07-21 Method of stripping a photoresist and composition therefor

Country Status (6)

Country Link
JP (1) JPS5220101A (en)
CA (1) CA1074219A (en)
DE (1) DE2632949A1 (en)
FR (1) FR2319396A1 (en)
GB (1) GB1551143A (en)
IT (1) IT1125196B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012047449A3 (en) * 2010-09-27 2012-09-27 Eastman Chemical Company Processes and compositions for removing substances from substrates

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4242218A (en) * 1976-11-08 1980-12-30 Allied Chemical Corporation Phenol-free photoresist stripper
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
CA1116059A (en) * 1978-05-22 1982-01-12 Allied Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
EP0337342A1 (en) * 1988-04-13 1989-10-18 Siemens Aktiengesellschaft Process for the stripping of a photoresist
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (en) * 1963-10-04 1965-12-03 Kalle Ag Detergent solutions for flat printing forms
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8614053B2 (en) 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates
US8916338B2 (en) 2009-03-27 2014-12-23 Eastman Chemical Company Processes and compositions for removing substances from substrates
WO2012047449A3 (en) * 2010-09-27 2012-09-27 Eastman Chemical Company Processes and compositions for removing substances from substrates
CN103108945A (en) * 2010-09-27 2013-05-15 伊士曼化工公司 Processes and compositions for removing substances from substrates

Also Published As

Publication number Publication date
JPS5220101A (en) 1977-02-15
DE2632949A1 (en) 1977-02-17
FR2319396B1 (en) 1980-03-14
IT1125196B (en) 1986-05-14
DE2632949C2 (en) 1987-11-19
CA1074219A (en) 1980-03-25
FR2319396A1 (en) 1977-02-25

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930721