JPS5223401A - Method of etching photography - Google Patents
Method of etching photographyInfo
- Publication number
- JPS5223401A JPS5223401A JP9858675A JP9858675A JPS5223401A JP S5223401 A JPS5223401 A JP S5223401A JP 9858675 A JP9858675 A JP 9858675A JP 9858675 A JP9858675 A JP 9858675A JP S5223401 A JPS5223401 A JP S5223401A
- Authority
- JP
- Japan
- Prior art keywords
- photography
- etching
- etching photography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9858675A JPS5223401A (en) | 1975-08-15 | 1975-08-15 | Method of etching photography |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9858675A JPS5223401A (en) | 1975-08-15 | 1975-08-15 | Method of etching photography |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5223401A true JPS5223401A (en) | 1977-02-22 |
JPS553690B2 JPS553690B2 (en) | 1980-01-26 |
Family
ID=14223742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9858675A Granted JPS5223401A (en) | 1975-08-15 | 1975-08-15 | Method of etching photography |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5223401A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5532077A (en) * | 1978-08-28 | 1980-03-06 | Sharp Corp | Photoresist baking method |
JPS56111221A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Formation on mask for etching |
JPS57167029A (en) * | 1981-03-19 | 1982-10-14 | Hoechst Ag | Burning of positive type photosensitive layer exposed and developed |
JPS5919323A (en) * | 1982-07-23 | 1984-01-31 | Matsushita Electric Ind Co Ltd | Method for etching |
JPS6248018A (en) * | 1985-08-28 | 1987-03-02 | Sony Corp | Hardening process of resist film |
JPS62113141A (en) * | 1985-11-13 | 1987-05-25 | Fuji Electric Co Ltd | Photolithographic method |
JPS62241332A (en) * | 1986-04-11 | 1987-10-22 | Rohm Co Ltd | Manufacture of semiconductor device |
JPS62241333A (en) * | 1986-04-11 | 1987-10-22 | Rohm Co Ltd | Manufacture of semiconductor device |
JPS63115337A (en) * | 1986-11-04 | 1988-05-19 | Matsushita Electronics Corp | Processing of photoresist |
JPS63200531A (en) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Manufacture of semiconductor device |
JPH02209724A (en) * | 1983-05-23 | 1990-08-21 | Fusion Semiconductor Syst | Method of hardening photoresist |
JPH06186755A (en) * | 1993-07-01 | 1994-07-08 | Fujitsu Ltd | Formation of resist pattern |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6130307U (en) * | 1984-07-27 | 1986-02-24 | 株式会社クボタ | tiller |
JPH052006Y2 (en) * | 1985-01-08 | 1993-01-19 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51111072A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Photo etching method |
-
1975
- 1975-08-15 JP JP9858675A patent/JPS5223401A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51111072A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Photo etching method |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5532077A (en) * | 1978-08-28 | 1980-03-06 | Sharp Corp | Photoresist baking method |
JPS56111221A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Formation on mask for etching |
JPS57167029A (en) * | 1981-03-19 | 1982-10-14 | Hoechst Ag | Burning of positive type photosensitive layer exposed and developed |
JPH0345826B2 (en) * | 1981-03-19 | 1991-07-12 | Hoechst Ag | |
JPS5919323A (en) * | 1982-07-23 | 1984-01-31 | Matsushita Electric Ind Co Ltd | Method for etching |
JPH02209724A (en) * | 1983-05-23 | 1990-08-21 | Fusion Semiconductor Syst | Method of hardening photoresist |
JPH0527107B2 (en) * | 1983-05-23 | 1993-04-20 | Fuyuujon Semikondakutaa Shisutemuzu | |
JPS6248018A (en) * | 1985-08-28 | 1987-03-02 | Sony Corp | Hardening process of resist film |
JPS62113141A (en) * | 1985-11-13 | 1987-05-25 | Fuji Electric Co Ltd | Photolithographic method |
JPS62241332A (en) * | 1986-04-11 | 1987-10-22 | Rohm Co Ltd | Manufacture of semiconductor device |
JPS62241333A (en) * | 1986-04-11 | 1987-10-22 | Rohm Co Ltd | Manufacture of semiconductor device |
JPS63115337A (en) * | 1986-11-04 | 1988-05-19 | Matsushita Electronics Corp | Processing of photoresist |
JPS63200531A (en) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Manufacture of semiconductor device |
JPH06186755A (en) * | 1993-07-01 | 1994-07-08 | Fujitsu Ltd | Formation of resist pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS553690B2 (en) | 1980-01-26 |
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