DE2525297A1 - Photopolymerisierbare massen und ihre verwendung - Google Patents

Photopolymerisierbare massen und ihre verwendung

Info

Publication number
DE2525297A1
DE2525297A1 DE19752525297 DE2525297A DE2525297A1 DE 2525297 A1 DE2525297 A1 DE 2525297A1 DE 19752525297 DE19752525297 DE 19752525297 DE 2525297 A DE2525297 A DE 2525297A DE 2525297 A1 DE2525297 A1 DE 2525297A1
Authority
DE
Germany
Prior art keywords
weight
percent
acid
glycol
unsaturated polyester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752525297
Other languages
German (de)
English (en)
Inventor
Tadanori Inoue
Takezo Sano
Yukikazu Uemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE2525297A1 publication Critical patent/DE2525297A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66Polyesters containing oxygen in the form of ether groups
    • C08G63/668Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407Processes of polymerisation
    • C08F299/0421Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE19752525297 1974-06-06 1975-06-06 Photopolymerisierbare massen und ihre verwendung Withdrawn DE2525297A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6469874A JPS5242084B2 (it) 1974-06-06 1974-06-06

Publications (1)

Publication Number Publication Date
DE2525297A1 true DE2525297A1 (de) 1975-12-18

Family

ID=13265618

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752525297 Withdrawn DE2525297A1 (de) 1974-06-06 1975-06-06 Photopolymerisierbare massen und ihre verwendung

Country Status (8)

Country Link
JP (1) JPS5242084B2 (it)
CA (1) CA1059683A (it)
DE (1) DE2525297A1 (it)
FR (1) FR2273827A1 (it)
GB (1) GB1500607A (it)
IT (1) IT1036182B (it)
NL (1) NL7506773A (it)
SU (1) SU917712A3 (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176381A (ja) * 1974-12-27 1976-07-01 Toyo Boseki Taishokuseifuhowahoriesuterujushi
CA1069638A (en) * 1976-05-14 1980-01-08 Earl E. Parker Low smoke density fire-retardant unsaturated aliphatic polyester resins containing alumina hydrate
JPS58182631A (ja) * 1982-04-20 1983-10-25 Nippon Synthetic Chem Ind Co Ltd:The 画像形成用組成物
CA2244324A1 (en) * 1997-08-04 1999-02-04 Hsm Holographic Systems Munchen Gmbh A method and an apparatus for fabricating a surface structure, particularly a holographic surface structure, on a substrate
US6099123A (en) * 1997-09-04 2000-08-08 Signet Armorlite, Inc. Production of photopolymerized polyester high index ophthalmic lenses
CN109195776A (zh) 2016-04-14 2019-01-11 德仕托金属有限公司 具有支撑结构的增材制造

Also Published As

Publication number Publication date
IT1036182B (it) 1979-10-30
CA1059683A (en) 1979-07-31
FR2273827A1 (fr) 1976-01-02
SU917712A3 (ru) 1982-03-30
NL7506773A (nl) 1975-12-09
JPS50155303A (it) 1975-12-15
JPS5242084B2 (it) 1977-10-22
GB1500607A (en) 1978-02-08
FR2273827B1 (it) 1979-01-05

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Legal Events

Date Code Title Description
8141 Disposal/no request for examination