DE2507038C3 - Inverser Planartransistor und Verfahren zu seiner Herstellung - Google Patents
Inverser Planartransistor und Verfahren zu seiner HerstellungInfo
- Publication number
- DE2507038C3 DE2507038C3 DE2507038A DE2507038A DE2507038C3 DE 2507038 C3 DE2507038 C3 DE 2507038C3 DE 2507038 A DE2507038 A DE 2507038A DE 2507038 A DE2507038 A DE 2507038A DE 2507038 C3 DE2507038 C3 DE 2507038C3
- Authority
- DE
- Germany
- Prior art keywords
- area
- zone
- emitter
- planar transistor
- inverse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/40—Vertical BJTs
- H10D10/461—Inverted vertical BJTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/2205—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities from the substrate during epitaxy, e.g. autodoping; Preventing or using autodoping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2507038A DE2507038C3 (de) | 1975-02-19 | 1975-02-19 | Inverser Planartransistor und Verfahren zu seiner Herstellung |
| GB49938/75A GB1494149A (en) | 1975-02-19 | 1975-12-05 | Integrated circuits |
| FR7603630A FR2301925A1 (fr) | 1975-02-19 | 1976-02-10 | Transistor planar inverse |
| IT20065/76A IT1055197B (it) | 1975-02-19 | 1976-02-11 | Transistore planare inverso |
| JP51016882A JPS51107779A (enExample) | 1975-02-19 | 1976-02-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2507038A DE2507038C3 (de) | 1975-02-19 | 1975-02-19 | Inverser Planartransistor und Verfahren zu seiner Herstellung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2507038A1 DE2507038A1 (de) | 1976-09-02 |
| DE2507038B2 DE2507038B2 (de) | 1979-05-23 |
| DE2507038C3 true DE2507038C3 (de) | 1980-01-24 |
Family
ID=5939232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2507038A Expired DE2507038C3 (de) | 1975-02-19 | 1975-02-19 | Inverser Planartransistor und Verfahren zu seiner Herstellung |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS51107779A (enExample) |
| DE (1) | DE2507038C3 (enExample) |
| FR (1) | FR2301925A1 (enExample) |
| GB (1) | GB1494149A (enExample) |
| IT (1) | IT1055197B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2532608C2 (de) * | 1975-07-22 | 1982-09-02 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Planardiffusionsverfahren zum Herstellen einer monolithisch integrierten Schaltung |
| DE2554426C3 (de) * | 1975-12-03 | 1979-06-21 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Erzeugung einer lokal hohen inversen Stromverstärkung bei einem Planartransistor sowie nach diesem Verfahren hergestellter invers betriebener Transistor |
| JPS5385182A (en) * | 1977-01-05 | 1978-07-27 | Hitachi Ltd | Iil type semiconductor device |
| JPS55111159A (en) * | 1979-02-20 | 1980-08-27 | Fuji Electric Co Ltd | Semiconductor integrated circuit |
| JPS564275A (en) * | 1979-06-25 | 1981-01-17 | Fujitsu Ltd | Semiconductor device |
| JPS6031107B2 (ja) * | 1981-01-09 | 1985-07-20 | 株式会社日立製作所 | 半導体集積回路装置 |
| JPS59158554A (ja) * | 1983-02-27 | 1984-09-08 | Rohm Co Ltd | トランジスタ |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4926752A (enExample) * | 1972-07-06 | 1974-03-09 | ||
| JPS5720711B2 (enExample) * | 1974-07-09 | 1982-04-30 | ||
| JPS5837699B2 (ja) * | 1974-12-16 | 1983-08-18 | 三菱電機株式会社 | ハンドウタイキオクソウチ |
-
1975
- 1975-02-19 DE DE2507038A patent/DE2507038C3/de not_active Expired
- 1975-12-05 GB GB49938/75A patent/GB1494149A/en not_active Expired
-
1976
- 1976-02-10 FR FR7603630A patent/FR2301925A1/fr active Granted
- 1976-02-11 IT IT20065/76A patent/IT1055197B/it active
- 1976-02-18 JP JP51016882A patent/JPS51107779A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2301925B1 (enExample) | 1982-03-19 |
| DE2507038B2 (de) | 1979-05-23 |
| FR2301925A1 (fr) | 1976-09-17 |
| JPS51107779A (enExample) | 1976-09-24 |
| GB1494149A (en) | 1977-12-07 |
| DE2507038A1 (de) | 1976-09-02 |
| IT1055197B (it) | 1981-12-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1260029B (de) | Verfahren zum Herstellen von Halbleiterbauelementen auf einem Halbleitereinkristallgrundplaettchen | |
| DE2507366C3 (de) | Verfahren zur Unterdrückung parasitärer Schaltungselemente | |
| DE2757762C2 (de) | Monolithische Kombination zweier komplementärer Bipolartransistoren | |
| EP0007923A1 (de) | Verfahren zur Herstellung eines doppeltdiffundierten, lateralen Transistors und eines mit diesem integrierten komplementären vertikalen Transistors | |
| DE1207014C2 (de) | Verfahren zum herstellen einer integrierten halbleiterschaltungsanordnung | |
| DE3545040A1 (de) | Verfahren zur herstellung einer vergrabenen schicht und einer kollektorzone in einer monolithischen halbleitervorrichtung | |
| DE3850309T2 (de) | Hochfrequenz-Bipolartransistor und dessen Herstellungsverfahren. | |
| DE69404700T2 (de) | Referenzdiode in integriertem Bipolarschaltkreis | |
| DE1539090B1 (de) | Integrierte Halbleiteranordnung und Verfahren zu ihrer Herstellung | |
| DE3022122C2 (enExample) | ||
| DE2507038C3 (de) | Inverser Planartransistor und Verfahren zu seiner Herstellung | |
| DE3851815T2 (de) | Feldeffekttransistor und dessen Herstellungsmethode. | |
| DE3851175T2 (de) | Bipolartransistor mit Heteroübergängen. | |
| DE2318179C2 (de) | Halbleiteranordnung und Verfahren zu ihrer Herstellung | |
| DE69225355T2 (de) | Transistor mit einer vorbestimmten Stromverstärkung in einer integrierten Bipolarschaltung | |
| DE2403816C3 (de) | Halbleiteranordnung und Verfahren zu ihrer Herstellung | |
| DE2529951A1 (de) | Lateraler, bipolarer transistor | |
| DE3688030T2 (de) | Bipolare integrierte schaltung mit isolationsstruktur und substratkontakt und verfahren zur herstellung. | |
| DE2101279C2 (de) | Integrierter, lateraler Transistor | |
| DE2627922A1 (de) | Halbleiterbauteil | |
| DE2527076A1 (de) | Integriertes schaltungsbauteil | |
| DE2835330A1 (de) | Integrierter bipolarer halbleiterschaltkreis sowie verfahren zu seiner herstellung | |
| DE19752052A1 (de) | Halbleitervorrichtung und Herstellungsverfahren | |
| DE3129487C2 (enExample) | ||
| EP0017021B1 (de) | Verfahren zur Herstellung einer Halbleiteranordnung mit komplementären Transistoren |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |