DE3851175T2 - Bipolartransistor mit Heteroübergängen. - Google Patents

Bipolartransistor mit Heteroübergängen.

Info

Publication number
DE3851175T2
DE3851175T2 DE3851175T DE3851175T DE3851175T2 DE 3851175 T2 DE3851175 T2 DE 3851175T2 DE 3851175 T DE3851175 T DE 3851175T DE 3851175 T DE3851175 T DE 3851175T DE 3851175 T2 DE3851175 T2 DE 3851175T2
Authority
DE
Germany
Prior art keywords
heterojunctions
bipolar transistor
bipolar
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3851175T
Other languages
English (en)
Other versions
DE3851175D1 (de
Inventor
Thomas N Jackson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3851175D1 publication Critical patent/DE3851175D1/de
Publication of DE3851175T2 publication Critical patent/DE3851175T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/737—Hetero-junction transistors
    • H01L29/7371—Vertical transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
    • H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System further characterised by the doping material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/207—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds further characterised by the doping material
DE3851175T 1987-04-23 1988-02-24 Bipolartransistor mit Heteroübergängen. Expired - Fee Related DE3851175T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/041,812 US4872040A (en) 1987-04-23 1987-04-23 Self-aligned heterojunction transistor

Publications (2)

Publication Number Publication Date
DE3851175D1 DE3851175D1 (de) 1994-09-29
DE3851175T2 true DE3851175T2 (de) 1995-03-30

Family

ID=21918456

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3851175T Expired - Fee Related DE3851175T2 (de) 1987-04-23 1988-02-24 Bipolartransistor mit Heteroübergängen.

Country Status (4)

Country Link
US (1) US4872040A (de)
EP (1) EP0288681B1 (de)
JP (1) JPS63268276A (de)
DE (1) DE3851175T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61198776A (ja) * 1985-02-28 1986-09-03 Fujitsu Ltd ヘテロ接合バイポ−ラトランジスタおよびその製造方法
US4967254A (en) * 1987-07-16 1990-10-30 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
JP2619407B2 (ja) * 1987-08-24 1997-06-11 株式会社日立製作所 半導体装置の製造方法
JPH01175256A (ja) * 1987-12-29 1989-07-11 Nec Corp ヘテロ構造バイポーラ・トランジスタおよびその製造方法
US4939562A (en) * 1989-04-07 1990-07-03 Raytheon Company Heterojunction bipolar transistors and method of manufacture
US5183778A (en) * 1989-11-20 1993-02-02 Fujitsu Limited Method of producing a semiconductor device
JPH03160714A (ja) * 1989-11-20 1991-07-10 Fujitsu Ltd 半導体装置及びその製造方法
EP0478923B1 (de) * 1990-08-31 1997-11-05 Texas Instruments Incorporated Verfahren zum Herstellen selbst-ausrichtender bipolarer Transistoren mit Heteroübergang
US6046109A (en) * 1997-12-29 2000-04-04 Industrial Technology Research Institute Creation of local semi-insulating regions on semiconductor substrates
US7282425B2 (en) * 2005-01-31 2007-10-16 International Business Machines Corporation Structure and method of integrating compound and elemental semiconductors for high-performance CMOS

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU7731575A (en) * 1974-01-18 1976-07-15 Nat Patent Dev Corp Heterojunction devices
DE2719464A1 (de) * 1977-04-30 1978-12-21 Erich Dr Kasper Verfahren zur herstellung von bipolaren hochfrequenztransistoren
US4381953A (en) * 1980-03-24 1983-05-03 International Business Machines Corporation Polysilicon-base self-aligned bipolar transistor process
US4395722A (en) * 1980-10-21 1983-07-26 The United States Of America As Represented By The Secretary Of The Army Heterojunction transistor
US4380774A (en) * 1980-12-19 1983-04-19 The United States Of America As Represented By The Secretary Of The Navy High-performance bipolar microwave transistor
US4385198A (en) * 1981-07-08 1983-05-24 The United States Of America As Represented By The Secretary Of The Air Force Gallium arsenide-germanium heteroface junction device
US4573064A (en) * 1981-11-02 1986-02-25 Texas Instruments Incorporated GaAs/GaAlAs Heterojunction bipolar integrated circuit devices
US4482906A (en) * 1982-06-30 1984-11-13 International Business Machines Corporation Gallium aluminum arsenide integrated circuit structure using germanium
JPS59130774A (ja) * 1983-01-17 1984-07-27 Yanmar Diesel Engine Co Ltd 農用トラクタ−のブレ−キ装置
US4593305A (en) * 1983-05-17 1986-06-03 Kabushiki Kaisha Toshiba Heterostructure bipolar transistor
JPS6010776A (ja) * 1983-06-30 1985-01-19 Fujitsu Ltd バイポーラトランジスタの製造方法
US4599791A (en) * 1983-11-28 1986-07-15 At&T Bell Laboratories Method of making integrated circuits employing proton-bombarded AlGaAs layers
US4586071A (en) * 1984-05-11 1986-04-29 International Business Machines Corporation Heterostructure bipolar transistor
US4596070A (en) * 1984-07-13 1986-06-24 Texas Instruments Incorporated Interdigitated IMPATT devices
JPH0744182B2 (ja) * 1984-11-09 1995-05-15 株式会社日立製作所 ヘテロ接合バイポ−ラ・トランジスタ
US4649411A (en) * 1984-12-17 1987-03-10 Motorola, Inc. Gallium arsenide bipolar ECL circuit structure
JPS61147571A (ja) * 1984-12-21 1986-07-05 Toshiba Corp ヘテロ接合バイポ−ラトランジスタの製造方法
JPS61197424A (ja) * 1985-02-27 1986-09-01 Mitsubishi Metal Corp 六フツ化ウランよりウラン酸化物を得る方法
JP2553510B2 (ja) * 1985-03-25 1996-11-13 日本電気株式会社 半導体装置およびその製造方法

Also Published As

Publication number Publication date
EP0288681A1 (de) 1988-11-02
JPH0553299B2 (de) 1993-08-09
EP0288681B1 (de) 1994-08-24
DE3851175D1 (de) 1994-09-29
JPS63268276A (ja) 1988-11-04
US4872040A (en) 1989-10-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee