DE3783863T2 - Transistor mit hoher elektronenmobilitaet. - Google Patents
Transistor mit hoher elektronenmobilitaet.Info
- Publication number
- DE3783863T2 DE3783863T2 DE8787309477T DE3783863T DE3783863T2 DE 3783863 T2 DE3783863 T2 DE 3783863T2 DE 8787309477 T DE8787309477 T DE 8787309477T DE 3783863 T DE3783863 T DE 3783863T DE 3783863 T2 DE3783863 T2 DE 3783863T2
- Authority
- DE
- Germany
- Prior art keywords
- transistor
- electron mobility
- high electron
- mobility
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/26—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys
- H01L29/267—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys in different semiconductor regions, e.g. heterojunctions
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Junction Field-Effect Transistors (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61258147A JPS63114176A (ja) | 1986-10-31 | 1986-10-31 | 高速電界効果半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3783863D1 DE3783863D1 (de) | 1993-03-11 |
DE3783863T2 true DE3783863T2 (de) | 1993-05-19 |
Family
ID=17316175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787309477T Expired - Fee Related DE3783863T2 (de) | 1986-10-31 | 1987-10-27 | Transistor mit hoher elektronenmobilitaet. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4958203A (de) |
EP (1) | EP0266166B1 (de) |
JP (1) | JPS63114176A (de) |
DE (1) | DE3783863T2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5689125A (en) * | 1995-06-12 | 1997-11-18 | The United States Of America As Represented By The Secretary Of The Air Force | Cadmium sulfide interface layers for improving III-V semiconductor device performance and characteristics |
US5804842A (en) * | 1995-06-20 | 1998-09-08 | Nec Research Institute, Inc. | Optically writing erasable conductive patterns at a bandgap-engineered heterojunction |
US6117697A (en) * | 1998-07-27 | 2000-09-12 | The United States Of America As Represented By The Secretary Of The Air Force | Solid state magnetic field sensor method |
US9620592B2 (en) * | 2015-02-12 | 2017-04-11 | International Business Machines Corporation | Doped zinc oxide and n-doping to reduce junction leakage |
CN111524958B (zh) * | 2019-02-01 | 2023-05-02 | 联华电子股份有限公司 | 一种高电子迁移率晶体管 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0033037B1 (de) * | 1979-12-28 | 1990-03-21 | Fujitsu Limited | Halbleitervorrichtungen mit Heteroübergang |
JPS57147284A (en) * | 1981-03-06 | 1982-09-11 | Fujitsu Ltd | Semiconductor device |
JPS5963768A (ja) * | 1982-10-05 | 1984-04-11 | Agency Of Ind Science & Technol | 電界効果型半導体装置 |
JPS605570A (ja) * | 1983-06-09 | 1985-01-12 | Fujitsu Ltd | 半導体装置の製造方法 |
US4745447A (en) * | 1985-06-14 | 1988-05-17 | American Telephone And Telegraph Company, At&T Bell Laboratories | Gallium arsenide on gallium indium arsenide Schottky barrier device |
US4705361A (en) * | 1985-11-27 | 1987-11-10 | Texas Instruments Incorporated | Spatial light modulator |
JP2845566B2 (ja) * | 1990-04-16 | 1999-01-13 | 松下電器産業株式会社 | 熱交換器 |
-
1986
- 1986-10-31 JP JP61258147A patent/JPS63114176A/ja active Granted
-
1987
- 1987-10-27 EP EP87309477A patent/EP0266166B1/de not_active Expired - Lifetime
- 1987-10-27 DE DE8787309477T patent/DE3783863T2/de not_active Expired - Fee Related
- 1987-11-02 US US07/115,925 patent/US4958203A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0266166A3 (en) | 1989-02-22 |
EP0266166A2 (de) | 1988-05-04 |
EP0266166B1 (de) | 1993-01-27 |
JPH0260225B2 (de) | 1990-12-14 |
DE3783863D1 (de) | 1993-03-11 |
US4958203A (en) | 1990-09-18 |
JPS63114176A (ja) | 1988-05-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |