DE2501046C2 - Verfahren zur Herstellung von Reliefs und Tiefdruckformen - Google Patents

Verfahren zur Herstellung von Reliefs und Tiefdruckformen

Info

Publication number
DE2501046C2
DE2501046C2 DE2501046A DE2501046A DE2501046C2 DE 2501046 C2 DE2501046 C2 DE 2501046C2 DE 2501046 A DE2501046 A DE 2501046A DE 2501046 A DE2501046 A DE 2501046A DE 2501046 C2 DE2501046 C2 DE 2501046C2
Authority
DE
Germany
Prior art keywords
film
layer
oxygen
recording material
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2501046A
Other languages
German (de)
English (en)
Other versions
DE2501046A1 (de
Inventor
Yutaka Toyonaka Osaka Fukushima
Kiyomi Neyagawa Osaka Sakurai
Masami Sakai Osaka Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP720974A external-priority patent/JPS5340123B2/ja
Priority claimed from JP5601474A external-priority patent/JPS5340124B2/ja
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of DE2501046A1 publication Critical patent/DE2501046A1/de
Application granted granted Critical
Publication of DE2501046C2 publication Critical patent/DE2501046C2/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/152—Making camera copy, e.g. mechanical negative

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE2501046A 1974-01-14 1975-01-13 Verfahren zur Herstellung von Reliefs und Tiefdruckformen Expired DE2501046C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP720974A JPS5340123B2 (cg-RX-API-DMAC10.html) 1974-01-14 1974-01-14
JP5601474A JPS5340124B2 (cg-RX-API-DMAC10.html) 1974-05-17 1974-05-17

Publications (2)

Publication Number Publication Date
DE2501046A1 DE2501046A1 (de) 1975-07-17
DE2501046C2 true DE2501046C2 (de) 1986-01-23

Family

ID=26341474

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2501046A Expired DE2501046C2 (de) 1974-01-14 1975-01-13 Verfahren zur Herstellung von Reliefs und Tiefdruckformen

Country Status (6)

Country Link
US (1) US3997345A (cg-RX-API-DMAC10.html)
CA (1) CA1055301A (cg-RX-API-DMAC10.html)
DE (1) DE2501046C2 (cg-RX-API-DMAC10.html)
DK (1) DK155858C (cg-RX-API-DMAC10.html)
FR (1) FR2257931B1 (cg-RX-API-DMAC10.html)
GB (1) GB1507881A (cg-RX-API-DMAC10.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4424268A (en) 1982-11-22 1984-01-03 Eastman Kodak Company Pyrylium- and thiopyrylium-sensitized low-persistence photoconductive compositions and elements
CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
US4826754A (en) * 1987-04-27 1989-05-02 Microelectronics Center Of North Carolina Method for anisotropically hardening a protective coating for integrated circuit manufacture
JPH0389349A (ja) * 1989-09-01 1991-04-15 Riso Kagaku Corp 凹凸画像の形成方法
US6238837B1 (en) 1995-05-01 2001-05-29 E.I. Du Pont De Nemours And Company Flexographic element having an infrared ablatable layer

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3856529A (en) * 1967-05-26 1974-12-24 Kalle Ag Method and materials for making half tone prints
US3829315A (en) * 1968-05-27 1974-08-13 Kalle Ag Methods for making half-tone prints
US3537853A (en) * 1968-02-21 1970-11-03 Grace W R & Co Process of forming printing plates,including the step of subjecting the mounted transparency to a surface static electricity eliminator
US3807304A (en) * 1968-07-15 1974-04-30 Itek Corp Photographic process for producing coherent metallic image bonded to a roughened support and products produced thereby
US3835780A (en) * 1968-07-15 1974-09-17 Itek Corp Process of printing by driography
US3661575A (en) * 1970-01-05 1972-05-09 Grace W R & Co Gravure printing plate of photocurable material
US3685993A (en) * 1970-08-03 1972-08-22 Minnesota Mining & Mfg Lithographic plate with resin binder containing silver soap oxidizing agent
DE2061287C3 (de) * 1970-12-12 1981-07-23 Basf Ag, 6700 Ludwigshafen Verfahren zur Herstellung von tiefenvariablen Tiefdruckformen
US3784378A (en) * 1971-10-18 1974-01-08 Du Pont Double-exposure method for producing reverse images in photopolymers
US3861917A (en) * 1972-02-22 1975-01-21 Grace W R & Co Continuous tone lithographic plate and method of making

Also Published As

Publication number Publication date
US3997345A (en) 1976-12-14
GB1507881A (en) 1978-04-19
DE2501046A1 (de) 1975-07-17
FR2257931B1 (cg-RX-API-DMAC10.html) 1981-09-25
DK7675A (cg-RX-API-DMAC10.html) 1975-09-15
DK155858C (da) 1989-10-09
DK155858B (da) 1989-05-22
AU7730275A (en) 1976-07-15
FR2257931A1 (cg-RX-API-DMAC10.html) 1975-08-08
CA1055301A (en) 1979-05-29

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8125 Change of the main classification

Ipc: G03F 7/10

8128 New person/name/address of the agent

Representative=s name: REDIES, F., DR.-ING. DR.JUR. REDIES, B., DIPL.-CHE

8128 New person/name/address of the agent

Representative=s name: TUERK, D., DIPL.-CHEM. DR.RER.NAT. GILLE, C., DIPL

D2 Grant after examination
8364 No opposition during term of opposition