DE242880C - - Google Patents
Info
- Publication number
- DE242880C DE242880C DENDAT242880D DE242880DA DE242880C DE 242880 C DE242880 C DE 242880C DE NDAT242880 D DENDAT242880 D DE NDAT242880D DE 242880D A DE242880D A DE 242880DA DE 242880 C DE242880 C DE 242880C
- Authority
- DE
- Germany
- Prior art keywords
- water
- machine
- piston
- valve
- cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 62
- 238000002485 combustion reaction Methods 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 11
- 239000007789 gas Substances 0.000 claims description 9
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 6
- 239000000446 fuel Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000002826 coolant Substances 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 241000182341 Cubitermes group Species 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000035929 gnawing Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 201000009032 substance abuse Diseases 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02B—INTERNAL-COMBUSTION PISTON ENGINES; COMBUSTION ENGINES IN GENERAL
- F02B47/00—Methods of operating engines involving adding non-fuel substances or anti-knock agents to combustion air, fuel, or fuel-air mixtures of engines
- F02B47/02—Methods of operating engines involving adding non-fuel substances or anti-knock agents to combustion air, fuel, or fuel-air mixtures of engines the substances being water or steam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/10—Internal combustion engine [ICE] based vehicles
- Y02T10/12—Improving ICE efficiencies
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cylinder Crankcases Of Internal Combustion Engines (AREA)
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE242880C true DE242880C (OSRAM) |
Family
ID=502050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DENDAT242880D Active DE242880C (OSRAM) |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE242880C (OSRAM) |
Cited By (105)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6952253B2 (en) | 2002-11-12 | 2005-10-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US6954256B2 (en) | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
| US7009682B2 (en) | 2002-11-18 | 2006-03-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7012673B2 (en) | 2003-06-27 | 2006-03-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7034917B2 (en) | 2004-04-01 | 2006-04-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
| US7038760B2 (en) | 2003-06-30 | 2006-05-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7050146B2 (en) | 2004-02-09 | 2006-05-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7075616B2 (en) | 2002-11-12 | 2006-07-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7081943B2 (en) | 2002-11-12 | 2006-07-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7110087B2 (en) | 2003-06-30 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7110081B2 (en) | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7113259B2 (en) | 2003-10-31 | 2006-09-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7119876B2 (en) | 2004-10-18 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7119874B2 (en) | 2003-06-27 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7133114B2 (en) | 2004-09-20 | 2006-11-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7145630B2 (en) | 2004-11-23 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7158211B2 (en) | 2003-09-29 | 2007-01-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7161654B2 (en) | 2004-12-02 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7161663B2 (en) | 2004-07-22 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus |
| US7175968B2 (en) | 2003-07-28 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a substrate |
| US7184122B2 (en) | 2003-07-24 | 2007-02-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7193232B2 (en) | 2002-11-12 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid |
| US7193681B2 (en) | 2003-09-29 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7196770B2 (en) | 2004-12-07 | 2007-03-27 | Asml Netherlands B.V. | Prewetting of substrate before immersion exposure |
| US7199858B2 (en) | 2002-11-12 | 2007-04-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7209213B2 (en) | 2004-10-07 | 2007-04-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7224431B2 (en) | 2005-02-22 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7227619B2 (en) | 2004-04-01 | 2007-06-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7242455B2 (en) | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
| US7248334B2 (en) | 2004-12-07 | 2007-07-24 | Asml Netherlands B.V. | Sensor shield |
| US7251013B2 (en) | 2004-11-12 | 2007-07-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7253879B2 (en) | 2005-04-19 | 2007-08-07 | Asml Holding N.V. | Liquid immersion lithography system with tilted liquid flow |
| US7291850B2 (en) | 2005-04-08 | 2007-11-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7295283B2 (en) | 2004-04-02 | 2007-11-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7304715B2 (en) | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7317504B2 (en) | 2004-04-08 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7317507B2 (en) | 2005-05-03 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7324185B2 (en) | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7326522B2 (en) | 2004-02-11 | 2008-02-05 | Asml Netherlands B.V. | Device manufacturing method and a substrate |
| US7330238B2 (en) | 2005-03-28 | 2008-02-12 | Asml Netherlands, B.V. | Lithographic apparatus, immersion projection apparatus and device manufacturing method |
| US7352435B2 (en) | 2003-10-15 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7352440B2 (en) | 2004-12-10 | 2008-04-01 | Asml Netherlands B.V. | Substrate placement in immersion lithography |
| US7352434B2 (en) | 2003-05-13 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7352433B2 (en) | 2003-10-28 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7355674B2 (en) | 2004-09-28 | 2008-04-08 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and computer program product |
| US7359030B2 (en) | 2002-11-29 | 2008-04-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7365827B2 (en) | 2004-12-08 | 2008-04-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7379159B2 (en) | 2004-05-03 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7378025B2 (en) | 2005-02-22 | 2008-05-27 | Asml Netherlands B.V. | Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method |
| US7394521B2 (en) | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7403261B2 (en) | 2004-12-15 | 2008-07-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7405805B2 (en) | 2004-12-28 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7411657B2 (en) | 2004-11-17 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7411658B2 (en) | 2005-10-06 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7411654B2 (en) | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7414699B2 (en) | 2004-11-12 | 2008-08-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7420194B2 (en) | 2005-12-27 | 2008-09-02 | Asml Netherlands B.V. | Lithographic apparatus and substrate edge seal |
| US7423720B2 (en) | 2004-11-12 | 2008-09-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7428038B2 (en) | 2005-02-28 | 2008-09-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid |
| US7433015B2 (en) | 2003-10-15 | 2008-10-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7433016B2 (en) | 2005-05-03 | 2008-10-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7446850B2 (en) | 2004-12-03 | 2008-11-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US7468779B2 (en) | 2005-06-28 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7474379B2 (en) | 2005-06-28 | 2009-01-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7486381B2 (en) | 2004-05-21 | 2009-02-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7491661B2 (en) | 2004-12-28 | 2009-02-17 | Asml Netherlands B.V. | Device manufacturing method, top coat material and substrate |
| US7522261B2 (en) | 2004-09-24 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7528931B2 (en) | 2004-12-20 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7545481B2 (en) | 2003-11-24 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7583357B2 (en) | 2004-11-12 | 2009-09-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7589818B2 (en) | 2003-12-23 | 2009-09-15 | Asml Netherlands B.V. | Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
| US7633073B2 (en) | 2005-11-23 | 2009-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7652746B2 (en) | 2005-06-21 | 2010-01-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7656501B2 (en) | 2005-11-16 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus |
| US7670730B2 (en) | 2004-12-30 | 2010-03-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7684010B2 (en) | 2005-03-09 | 2010-03-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing |
| US7705962B2 (en) | 2005-01-14 | 2010-04-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7733459B2 (en) | 2003-08-29 | 2010-06-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7738074B2 (en) | 2003-07-16 | 2010-06-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7751027B2 (en) | 2005-06-21 | 2010-07-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7791709B2 (en) | 2006-12-08 | 2010-09-07 | Asml Netherlands B.V. | Substrate support and lithographic process |
| US7804577B2 (en) | 2005-11-16 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus |
| US7808611B2 (en) | 2003-05-30 | 2010-10-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using acidic liquid |
| US7817245B2 (en) | 2003-09-29 | 2010-10-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7834974B2 (en) | 2005-06-28 | 2010-11-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7869147B2 (en) | 2006-04-07 | 2011-01-11 | Carl Zeiss Smt Gmbh | Holding device for optical element |
| US9746781B2 (en) | 2005-01-31 | 2017-08-29 | Nikon Corporation | Exposure apparatus and method for producing device |
| US10303066B2 (en) | 2003-07-28 | 2019-05-28 | Asml Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| US10345712B2 (en) | 2003-11-14 | 2019-07-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10451973B2 (en) | 2005-05-03 | 2019-10-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10509326B2 (en) | 2004-12-20 | 2019-12-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10514618B2 (en) | 2003-08-29 | 2019-12-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10527955B2 (en) | 2003-10-28 | 2020-01-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10599054B2 (en) | 2004-08-19 | 2020-03-24 | Asml Holding N.V. | Lithographic apparatus and device manufacturing method |
| US10620544B2 (en) | 2010-04-22 | 2020-04-14 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
| US10649349B2 (en) | 2006-12-07 | 2020-05-12 | Asml Holding N.V. | Lithographic apparatus, a dryer and a method of removing liquid from a surface |
| US10705432B2 (en) | 2004-04-14 | 2020-07-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10712675B2 (en) | 2005-02-10 | 2020-07-14 | Asml Netherlands B.V. | Immersion liquid, exposure apparatus, and exposure process |
| US10739684B2 (en) | 2004-07-07 | 2020-08-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10768536B2 (en) | 2005-11-16 | 2020-09-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10802410B2 (en) | 2006-04-14 | 2020-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid |
-
0
- DE DENDAT242880D patent/DE242880C/de active Active
Cited By (154)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7224436B2 (en) | 2002-11-12 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7075616B2 (en) | 2002-11-12 | 2006-07-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7482611B2 (en) | 2002-11-12 | 2009-01-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7795603B2 (en) | 2002-11-12 | 2010-09-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US6952253B2 (en) | 2002-11-12 | 2005-10-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7081943B2 (en) | 2002-11-12 | 2006-07-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10620545B2 (en) | 2002-11-12 | 2020-04-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7193232B2 (en) | 2002-11-12 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid |
| US7199858B2 (en) | 2002-11-12 | 2007-04-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7110081B2 (en) | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7009682B2 (en) | 2002-11-18 | 2006-03-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7119881B2 (en) | 2002-11-18 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7359030B2 (en) | 2002-11-29 | 2008-04-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7817244B2 (en) | 2002-12-10 | 2010-10-19 | Nikon Corporation | Exposure apparatus and method for producing device |
| US7834976B2 (en) | 2002-12-10 | 2010-11-16 | Nikon Corporation | Exposure apparatus and method for producing device |
| US7242455B2 (en) | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
| US7352434B2 (en) | 2003-05-13 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10466595B2 (en) | 2003-05-13 | 2019-11-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7808611B2 (en) | 2003-05-30 | 2010-10-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using acidic liquid |
| US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10678139B2 (en) | 2003-06-09 | 2020-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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| US10303066B2 (en) | 2003-07-28 | 2019-05-28 | Asml Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
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| US7746445B2 (en) | 2003-07-28 | 2010-06-29 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a substrate |
| US7733459B2 (en) | 2003-08-29 | 2010-06-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US11003096B2 (en) | 2003-08-29 | 2021-05-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10514618B2 (en) | 2003-08-29 | 2019-12-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US6954256B2 (en) | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
| US7817245B2 (en) | 2003-09-29 | 2010-10-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7193681B2 (en) | 2003-09-29 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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| US7532304B2 (en) | 2003-10-28 | 2009-05-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10527955B2 (en) | 2003-10-28 | 2020-01-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7113259B2 (en) | 2003-10-31 | 2006-09-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10345712B2 (en) | 2003-11-14 | 2019-07-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7545481B2 (en) | 2003-11-24 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US10613447B2 (en) | 2003-12-23 | 2020-04-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7710541B2 (en) | 2003-12-23 | 2010-05-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7394521B2 (en) | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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