DE2415736A1 - Metall-silizium-feldeffekttransistor - Google Patents

Metall-silizium-feldeffekttransistor

Info

Publication number
DE2415736A1
DE2415736A1 DE2415736A DE2415736A DE2415736A1 DE 2415736 A1 DE2415736 A1 DE 2415736A1 DE 2415736 A DE2415736 A DE 2415736A DE 2415736 A DE2415736 A DE 2415736A DE 2415736 A1 DE2415736 A1 DE 2415736A1
Authority
DE
Germany
Prior art keywords
substrate
source
zone
drain regions
transistor arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE2415736A
Other languages
German (de)
English (en)
Inventor
Leon Benton Pearce
Richard Nathan Wilenken
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intersil Corp
Original Assignee
Intersil Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intersil Inc filed Critical Intersil Inc
Publication of DE2415736A1 publication Critical patent/DE2415736A1/de
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/858Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
DE2415736A 1973-04-12 1974-04-01 Metall-silizium-feldeffekttransistor Pending DE2415736A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35058773A 1973-04-12 1973-04-12

Publications (1)

Publication Number Publication Date
DE2415736A1 true DE2415736A1 (de) 1974-10-24

Family

ID=23377367

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2415736A Pending DE2415736A1 (de) 1973-04-12 1974-04-01 Metall-silizium-feldeffekttransistor

Country Status (7)

Country Link
JP (1) JPS503585A (enrdf_load_stackoverflow)
CA (1) CA997869A (enrdf_load_stackoverflow)
DE (1) DE2415736A1 (enrdf_load_stackoverflow)
FR (1) FR2225844B1 (enrdf_load_stackoverflow)
GB (1) GB1443999A (enrdf_load_stackoverflow)
IT (1) IT1008753B (enrdf_load_stackoverflow)
NL (1) NL7317176A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS558019A (en) * 1978-06-30 1980-01-21 Nec Corp Semiconductor device
US4442529A (en) * 1981-02-04 1984-04-10 At&T Bell Telephone Laboratories, Incorporated Power supply rejection characteristics of CMOS circuits
NL8301554A (nl) * 1982-05-06 1983-12-01 Mitsubishi Electric Corp Geintegreerde schakeling-inrichting van het cmos-type.
JPS5955052A (ja) * 1982-09-24 1984-03-29 Hitachi Ltd 半導体集積回路装置の製造方法
JPS60207368A (ja) * 1984-03-31 1985-10-18 Res Dev Corp Of Japan 相補型mos集積回路の製造方法
JPS60250664A (ja) * 1984-05-26 1985-12-11 Toshiba Corp 半導体集積回路装置およびその製造方法
JPH0652792B2 (ja) * 1985-02-26 1994-07-06 日産自動車株式会社 半導体装置
JPS6386555A (ja) * 1986-09-30 1988-04-16 Toshiba Corp 半導体装置

Also Published As

Publication number Publication date
FR2225844B1 (enrdf_load_stackoverflow) 1977-06-10
GB1443999A (en) 1976-07-28
FR2225844A1 (enrdf_load_stackoverflow) 1974-11-08
NL7317176A (enrdf_load_stackoverflow) 1974-10-15
IT1008753B (it) 1976-11-30
CA997869A (en) 1976-09-28
JPS503585A (enrdf_load_stackoverflow) 1975-01-14

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