IT1008753B - Transistor a silicio ad effetto di campo a base non polarizzata - Google Patents

Transistor a silicio ad effetto di campo a base non polarizzata

Info

Publication number
IT1008753B
IT1008753B IT47931/74A IT4793174A IT1008753B IT 1008753 B IT1008753 B IT 1008753B IT 47931/74 A IT47931/74 A IT 47931/74A IT 4793174 A IT4793174 A IT 4793174A IT 1008753 B IT1008753 B IT 1008753B
Authority
IT
Italy
Prior art keywords
field effect
silicon transistor
polarized base
effect silicon
polarized
Prior art date
Application number
IT47931/74A
Other languages
English (en)
Italian (it)
Original Assignee
Intersil Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intersil Inc filed Critical Intersil Inc
Application granted granted Critical
Publication of IT1008753B publication Critical patent/IT1008753B/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/858Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
IT47931/74A 1973-04-12 1974-01-25 Transistor a silicio ad effetto di campo a base non polarizzata IT1008753B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35058773A 1973-04-12 1973-04-12

Publications (1)

Publication Number Publication Date
IT1008753B true IT1008753B (it) 1976-11-30

Family

ID=23377367

Family Applications (1)

Application Number Title Priority Date Filing Date
IT47931/74A IT1008753B (it) 1973-04-12 1974-01-25 Transistor a silicio ad effetto di campo a base non polarizzata

Country Status (7)

Country Link
JP (1) JPS503585A (enrdf_load_stackoverflow)
CA (1) CA997869A (enrdf_load_stackoverflow)
DE (1) DE2415736A1 (enrdf_load_stackoverflow)
FR (1) FR2225844B1 (enrdf_load_stackoverflow)
GB (1) GB1443999A (enrdf_load_stackoverflow)
IT (1) IT1008753B (enrdf_load_stackoverflow)
NL (1) NL7317176A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS558019A (en) * 1978-06-30 1980-01-21 Nec Corp Semiconductor device
US4442529A (en) * 1981-02-04 1984-04-10 At&T Bell Telephone Laboratories, Incorporated Power supply rejection characteristics of CMOS circuits
NL8301554A (nl) * 1982-05-06 1983-12-01 Mitsubishi Electric Corp Geintegreerde schakeling-inrichting van het cmos-type.
JPS5955052A (ja) * 1982-09-24 1984-03-29 Hitachi Ltd 半導体集積回路装置の製造方法
JPS60207368A (ja) * 1984-03-31 1985-10-18 Res Dev Corp Of Japan 相補型mos集積回路の製造方法
JPS60250664A (ja) * 1984-05-26 1985-12-11 Toshiba Corp 半導体集積回路装置およびその製造方法
JPH0652792B2 (ja) * 1985-02-26 1994-07-06 日産自動車株式会社 半導体装置
JPS6386555A (ja) * 1986-09-30 1988-04-16 Toshiba Corp 半導体装置

Also Published As

Publication number Publication date
FR2225844B1 (enrdf_load_stackoverflow) 1977-06-10
GB1443999A (en) 1976-07-28
FR2225844A1 (enrdf_load_stackoverflow) 1974-11-08
NL7317176A (enrdf_load_stackoverflow) 1974-10-15
CA997869A (en) 1976-09-28
JPS503585A (enrdf_load_stackoverflow) 1975-01-14
DE2415736A1 (de) 1974-10-24

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