JPS503585A - - Google Patents

Info

Publication number
JPS503585A
JPS503585A JP49010574A JP1057474A JPS503585A JP S503585 A JPS503585 A JP S503585A JP 49010574 A JP49010574 A JP 49010574A JP 1057474 A JP1057474 A JP 1057474A JP S503585 A JPS503585 A JP S503585A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49010574A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS503585A publication Critical patent/JPS503585A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/858Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP49010574A 1973-04-12 1974-01-24 Pending JPS503585A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35058773A 1973-04-12 1973-04-12

Publications (1)

Publication Number Publication Date
JPS503585A true JPS503585A (enrdf_load_stackoverflow) 1975-01-14

Family

ID=23377367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49010574A Pending JPS503585A (enrdf_load_stackoverflow) 1973-04-12 1974-01-24

Country Status (7)

Country Link
JP (1) JPS503585A (enrdf_load_stackoverflow)
CA (1) CA997869A (enrdf_load_stackoverflow)
DE (1) DE2415736A1 (enrdf_load_stackoverflow)
FR (1) FR2225844B1 (enrdf_load_stackoverflow)
GB (1) GB1443999A (enrdf_load_stackoverflow)
IT (1) IT1008753B (enrdf_load_stackoverflow)
NL (1) NL7317176A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS558019A (en) * 1978-06-30 1980-01-21 Nec Corp Semiconductor device
JPS60207368A (ja) * 1984-03-31 1985-10-18 Res Dev Corp Of Japan 相補型mos集積回路の製造方法
JPS60250664A (ja) * 1984-05-26 1985-12-11 Toshiba Corp 半導体集積回路装置およびその製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4442529A (en) * 1981-02-04 1984-04-10 At&T Bell Telephone Laboratories, Incorporated Power supply rejection characteristics of CMOS circuits
NL8301554A (nl) * 1982-05-06 1983-12-01 Mitsubishi Electric Corp Geintegreerde schakeling-inrichting van het cmos-type.
JPS5955052A (ja) * 1982-09-24 1984-03-29 Hitachi Ltd 半導体集積回路装置の製造方法
JPH0652792B2 (ja) * 1985-02-26 1994-07-06 日産自動車株式会社 半導体装置
JPS6386555A (ja) * 1986-09-30 1988-04-16 Toshiba Corp 半導体装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS558019A (en) * 1978-06-30 1980-01-21 Nec Corp Semiconductor device
JPS60207368A (ja) * 1984-03-31 1985-10-18 Res Dev Corp Of Japan 相補型mos集積回路の製造方法
JPS60250664A (ja) * 1984-05-26 1985-12-11 Toshiba Corp 半導体集積回路装置およびその製造方法

Also Published As

Publication number Publication date
FR2225844B1 (enrdf_load_stackoverflow) 1977-06-10
GB1443999A (en) 1976-07-28
FR2225844A1 (enrdf_load_stackoverflow) 1974-11-08
NL7317176A (enrdf_load_stackoverflow) 1974-10-15
IT1008753B (it) 1976-11-30
CA997869A (en) 1976-09-28
DE2415736A1 (de) 1974-10-24

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