DE2321684C3 - Verfahren zum Erzeugen von Mustern - Google Patents

Verfahren zum Erzeugen von Mustern

Info

Publication number
DE2321684C3
DE2321684C3 DE19732321684 DE2321684A DE2321684C3 DE 2321684 C3 DE2321684 C3 DE 2321684C3 DE 19732321684 DE19732321684 DE 19732321684 DE 2321684 A DE2321684 A DE 2321684A DE 2321684 C3 DE2321684 C3 DE 2321684C3
Authority
DE
Germany
Prior art keywords
electron
lacquer
proh
temperature
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19732321684
Other languages
German (de)
English (en)
Other versions
DE2321684A1 (de
DE2321684B1 (de
Inventor
Murrae John Stanley Chatham Bowden
Eugene David Berkeley Heights Feit
Larry Flack Mendham Thompson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE2321684A1 publication Critical patent/DE2321684A1/de
Publication of DE2321684B1 publication Critical patent/DE2321684B1/de
Application granted granted Critical
Publication of DE2321684C3 publication Critical patent/DE2321684C3/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Electron Beam Exposure (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19732321684 1972-05-01 1973-04-28 Verfahren zum Erzeugen von Mustern Expired DE2321684C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24930872A 1972-05-01 1972-05-01

Publications (3)

Publication Number Publication Date
DE2321684A1 DE2321684A1 (de) 1973-11-15
DE2321684B1 DE2321684B1 (de) 1974-01-31
DE2321684C3 true DE2321684C3 (de) 1979-07-26

Family

ID=22942915

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19732321684 Expired DE2321684C3 (de) 1972-05-01 1973-04-28 Verfahren zum Erzeugen von Mustern

Country Status (8)

Country Link
JP (1) JPS512375B2 (ja)
BE (1) BE798860A (ja)
DE (1) DE2321684C3 (ja)
FR (1) FR2183020B1 (ja)
GB (1) GB1403834A (ja)
IT (1) IT980926B (ja)
NL (1) NL154015B (ja)
SE (1) SE391405B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1421805A (en) * 1972-11-13 1976-01-21 Ibm Method of forming a positive resist
US3893127A (en) * 1973-09-27 1975-07-01 Rca Corp Electron beam recording media
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
JPS59222928A (ja) * 1983-06-02 1984-12-14 Matsushita Electronics Corp マスク製作方法

Also Published As

Publication number Publication date
JPS512375B2 (ja) 1976-01-26
JPS4942352A (ja) 1974-04-20
BE798860A (fr) 1973-08-16
GB1403834A (en) 1975-08-28
SE391405B (sv) 1977-02-14
FR2183020A1 (ja) 1973-12-14
NL7305933A (ja) 1973-11-05
FR2183020B1 (ja) 1976-11-12
DE2321684A1 (de) 1973-11-15
IT980926B (it) 1974-10-10
DE2321684B1 (de) 1974-01-31
NL154015B (nl) 1977-07-15

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)