BE798860A - Reserve sensible aux electrons et destinee a la formation d'un positif - Google Patents

Reserve sensible aux electrons et destinee a la formation d'un positif

Info

Publication number
BE798860A
BE798860A BE130538A BE130538A BE798860A BE 798860 A BE798860 A BE 798860A BE 130538 A BE130538 A BE 130538A BE 130538 A BE130538 A BE 130538A BE 798860 A BE798860 A BE 798860A
Authority
BE
Belgium
Prior art keywords
reserve
electrons
sensitive
positive
formation
Prior art date
Application number
BE130538A
Other languages
English (en)
French (fr)
Inventor
Dem J S Bowden
E D Feit
L F Thompson
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE798860A publication Critical patent/BE798860A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Electron Beam Exposure (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BE130538A 1972-05-01 1973-04-27 Reserve sensible aux electrons et destinee a la formation d'un positif BE798860A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24930872A 1972-05-01 1972-05-01

Publications (1)

Publication Number Publication Date
BE798860A true BE798860A (fr) 1973-08-16

Family

ID=22942915

Family Applications (1)

Application Number Title Priority Date Filing Date
BE130538A BE798860A (fr) 1972-05-01 1973-04-27 Reserve sensible aux electrons et destinee a la formation d'un positif

Country Status (8)

Country Link
JP (1) JPS512375B2 (ja)
BE (1) BE798860A (ja)
DE (1) DE2321684C3 (ja)
FR (1) FR2183020B1 (ja)
GB (1) GB1403834A (ja)
IT (1) IT980926B (ja)
NL (1) NL154015B (ja)
SE (1) SE391405B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1421805A (en) * 1972-11-13 1976-01-21 Ibm Method of forming a positive resist
US3893127A (en) * 1973-09-27 1975-07-01 Rca Corp Electron beam recording media
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
JPS59222928A (ja) * 1983-06-02 1984-12-14 Matsushita Electronics Corp マスク製作方法

Also Published As

Publication number Publication date
JPS512375B2 (ja) 1976-01-26
JPS4942352A (ja) 1974-04-20
GB1403834A (en) 1975-08-28
SE391405B (sv) 1977-02-14
FR2183020A1 (ja) 1973-12-14
NL7305933A (ja) 1973-11-05
FR2183020B1 (ja) 1976-11-12
DE2321684C3 (de) 1979-07-26
DE2321684A1 (de) 1973-11-15
IT980926B (it) 1974-10-10
DE2321684B1 (de) 1974-01-31
NL154015B (nl) 1977-07-15

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: WESTERN ELECTRIC CY INC.

Effective date: 19930427