DE2136532C3 - Vakuumverdampfungsanlage zum Verdampfen von Metallen - Google Patents

Vakuumverdampfungsanlage zum Verdampfen von Metallen

Info

Publication number
DE2136532C3
DE2136532C3 DE2136532A DE2136532A DE2136532C3 DE 2136532 C3 DE2136532 C3 DE 2136532C3 DE 2136532 A DE2136532 A DE 2136532A DE 2136532 A DE2136532 A DE 2136532A DE 2136532 C3 DE2136532 C3 DE 2136532C3
Authority
DE
Germany
Prior art keywords
cathode
vacuum evaporation
evaporation system
arc
screen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2136532A
Other languages
German (de)
English (en)
Other versions
DE2136532B2 (de
DE2136532A1 (de
Inventor
Leonid Pavlovitsch Sablev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE2136532A1 publication Critical patent/DE2136532A1/de
Publication of DE2136532B2 publication Critical patent/DE2136532B2/de
Application granted granted Critical
Publication of DE2136532C3 publication Critical patent/DE2136532C3/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
DE2136532A 1971-07-19 1971-07-21 Vakuumverdampfungsanlage zum Verdampfen von Metallen Expired DE2136532C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16375771A 1971-07-19 1971-07-19

Publications (3)

Publication Number Publication Date
DE2136532A1 DE2136532A1 (de) 1973-02-08
DE2136532B2 DE2136532B2 (de) 1978-07-20
DE2136532C3 true DE2136532C3 (de) 1979-03-22

Family

ID=22591432

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2136532A Expired DE2136532C3 (de) 1971-07-19 1971-07-21 Vakuumverdampfungsanlage zum Verdampfen von Metallen

Country Status (4)

Country Link
US (1) US3793179A (OSRAM)
DE (1) DE2136532C3 (OSRAM)
FR (1) FR2147880B1 (OSRAM)
GB (1) GB1322670A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4441117C1 (de) * 1994-11-18 1995-10-26 Plasma Applikation Mbh Ges Verfahren zur Beschichtung von Substraten und Vorrichtung zur Durchführung des Verfahrens

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5927215B2 (ja) 1978-12-27 1984-07-04 日産自動車株式会社 表面活性化処理を施した機能材料とその製造方法
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US4448799A (en) * 1983-04-21 1984-05-15 Multi-Arc Vacuum Systems Inc. Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
US4430184A (en) 1983-05-09 1984-02-07 Vac-Tec Systems, Inc. Evaporation arc stabilization
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning
US4559125A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
FR2556373B1 (fr) * 1983-12-07 1989-09-08 Vac Tec Syst Procede ameliore et appareil pour la stabilisation d'un arc de pulverisation de cibles non permeables a l'aide d'un anneau d'arret permeable
US4600489A (en) * 1984-01-19 1986-07-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
IL74360A (en) * 1984-05-25 1989-01-31 Wedtech Corp Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
SU1414878A1 (ru) * 1984-12-20 1988-08-07 Предприятие П/Я А-1628 Способ ионно-плазменного напылени и устройство дл его осуществлени
US4895765A (en) * 1985-09-30 1990-01-23 Union Carbide Corporation Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4839245A (en) * 1985-09-30 1989-06-13 Union Carbide Corporation Zirconium nitride coated article and method for making same
US4620913A (en) * 1985-11-15 1986-11-04 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition method and apparatus
CH671238A5 (OSRAM) * 1986-11-06 1989-08-15 Vni Instrument Inst
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
DE3707545A1 (de) * 1987-02-03 1988-08-11 Balzers Hochvakuum Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode
FR2612204A1 (fr) * 1987-03-12 1988-09-16 Vac Tec Syst Procede et appareil pour le depot par un plasma d'arc electrique sous vide de revetements decoratifs et de revetements resistant a l'usure
DE3781551T2 (de) * 1987-06-29 1993-04-08 Hauzer Holding Verfahren und vorrichtung zur beschichtung von aushoehlungen von gegenstaenden.
US4943325A (en) * 1988-10-19 1990-07-24 Black & Veatch, Engineers-Architects Reflector assembly
JP2718731B2 (ja) * 1988-12-21 1998-02-25 株式会社神戸製鋼所 真空アーク蒸着装置及び真空アーク蒸着方法
US4936960A (en) * 1989-01-03 1990-06-26 Advanced Energy Industries, Inc. Method and apparatus for recovery from low impedance condition during cathodic arc processes
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge
DE4006456C1 (en) * 1990-03-01 1991-05-29 Balzers Ag, Balzers, Li Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
US5858456A (en) * 1991-02-06 1999-01-12 Applied Vacuum Technologies 1 Ab Method for metal coating discrete objects by vapor deposition
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
WO1992019789A1 (fr) * 1991-04-29 1992-11-12 Nauchno-Proizvodstvennoe Predpriyatie 'novatekh' Evaporateur a arc electrique de metaux
DE4125365C1 (OSRAM) 1991-07-31 1992-05-21 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
IT1253065B (it) * 1991-12-13 1995-07-10 Unicoat Srl Vaporizzatore ad arco voltaico
DE9207046U1 (de) * 1992-05-25 1992-07-23 VTD-Vakuumtechnik Dresden GmbH, O-8017 Dresden Zündeinrichtung für einen Vakuumbogenentladungsverdampfer
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5380421A (en) * 1992-11-04 1995-01-10 Gorokhovsky; Vladimir I. Vacuum-arc plasma source
DE69225002T2 (de) * 1992-12-30 1998-09-03 N Proizv Predprijatie Novatech Anlage zum vakuum-plasma-behandlen von werkstücken
DE69416963T2 (de) * 1993-12-17 1999-09-16 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Vorrichtung zur Bogenbeschichtung im Vakuum
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
JP3287163B2 (ja) * 1995-01-23 2002-05-27 日新電機株式会社 アーク式蒸発源
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
CH689558A5 (de) 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
US5895559A (en) * 1996-04-08 1999-04-20 Christy; Ronald Cathodic arc cathode
DE19652633A1 (de) * 1996-09-13 1998-03-19 Euromat Gmbh Verfahren und Vorrichtung zum Innenbeschichten metallischer Bauteile
DE19654336C2 (de) * 1996-12-24 2002-12-12 Bekaert Cmtm Gmbh Oberflächenbehandlung von metallischen Bändern mittels magnetisch bewegten Lichtbogen
US5972185A (en) * 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US6009829A (en) * 1997-08-30 2000-01-04 United Technologies Corporation Apparatus for driving the arc in a cathodic arc coater
DE19853943B4 (de) * 1997-11-26 2006-04-20 Vapor Technologies, Inc. (Delaware Corporation), Longmont Katode zur Zerstäubung oder Bogenaufdampfung sowie Vorrichtung zur Beschichtung oder Ionenimplantation mit einer solchen Katode
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
US5976636A (en) * 1998-03-19 1999-11-02 Industrial Technology Research Institute Magnetic apparatus for arc ion plating
JP5033278B2 (ja) * 1998-04-29 2012-09-26 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 工具または機械部品、およびそのような部品の耐摩耗性を高めるための方法
CA2268659C (en) * 1999-04-12 2008-12-30 Vladimir I. Gorokhovsky Rectangular cathodic arc source and method of steering an arc spot
US6929727B2 (en) * 1999-04-12 2005-08-16 G & H Technologies, Llc Rectangular cathodic arc source and method of steering an arc spot
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US6402901B1 (en) * 2001-03-16 2002-06-11 4 Wave, Inc. System and method for performing sputter deposition using a spherical geometry
US6436254B1 (en) * 2001-04-03 2002-08-20 General Electric Company Cathode mounting system for cathodic arc cathodes
RU2214476C2 (ru) * 2001-07-18 2003-10-20 Дочернее государственное предприятие "Институт ядерной физики" Национального ядерного центра Республики Казахстан Способ формирования покрытия из драгоценных металлов и их сплавов
RU2214477C2 (ru) * 2001-07-18 2003-10-20 Дочернее государственное предприятие "Институт ядерной физики" Национального ядерного центра Республики Казахстан Установка для напыления покрытий
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
DE10224991A1 (de) * 2002-06-05 2004-01-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Einrichtung zur Reduzierung der Zündspannung von Plasmen
US6770178B2 (en) * 2002-08-09 2004-08-03 United Technologies Corporation Cathodic arc disposable sting shielding
US20050176251A1 (en) * 2004-02-05 2005-08-11 Duong Chau H. Polishing pad with releasable slick particles
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
US20090065045A1 (en) * 2007-09-10 2009-03-12 Zenith Solar Ltd. Solar electricity generation system
US9893223B2 (en) 2010-11-16 2018-02-13 Suncore Photovoltaics, Inc. Solar electricity generation system
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
KR200487382Y1 (ko) * 2014-08-04 2018-09-07 수라사크 수린퐁 음극 아크 플라즈마 증착 시스템에 사용되는 아크 이온 증발기용 필터 장치
RU2710809C1 (ru) * 2019-08-05 2020-01-14 Общество с ограниченной ответственностью "НПП "Уралавиаспецтехнология" Установка для нанесения ионно-плазменных покрытий
CN113957389B (zh) * 2020-07-21 2023-08-11 宝山钢铁股份有限公司 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置
CN118756099B (zh) * 2024-09-09 2024-12-17 湘潭宏大真空技术股份有限公司 一种用于af膜的蒸发镀膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2972695A (en) * 1957-05-24 1961-02-21 Vickers Electrical Co Ltd Stabilisation of low pressure d.c. arc discharges
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
DE1953659C3 (de) * 1969-10-21 1979-01-25 N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) Ionenquelle für die Zerstäubung mit langsamen Ionen
US3661758A (en) * 1970-06-26 1972-05-09 Hewlett Packard Co Rf sputtering system with the anode enclosing the target

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4441117C1 (de) * 1994-11-18 1995-10-26 Plasma Applikation Mbh Ges Verfahren zur Beschichtung von Substraten und Vorrichtung zur Durchführung des Verfahrens

Also Published As

Publication number Publication date
DE2136532B2 (de) 1978-07-20
FR2147880A1 (OSRAM) 1973-03-11
US3793179A (en) 1974-02-19
FR2147880B1 (OSRAM) 1976-03-26
DE2136532A1 (de) 1973-02-08
GB1322670A (en) 1973-07-11

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8328 Change in the person/name/address of the agent

Free format text: EITLE, W., DIPL.-ING. HOFFMANN, K., DIPL.-ING. DR.RER.NAT. LEHN, W., DIPL.-ING. FUECHSLE, K., DIPL.-ING. HANSEN, B., DIPL.-CHEM. DR.RER.NAT. BRAUNS, H., DIPL.-CHEM. DR.RER.NAT. GOERG, K., DIPL.-ING. KOHLMANN, K., DIPL.-ING. KOLB, H., DIPL.-CHEM. DR.RER.NAT. RITTER UND EDLER VON FISCHERN, B., DIPL.-ING., PAT.-ANWAELTE NETTE, A., RECHTSANW., 8000 MUENCHEN