GB1322670A - Apparatus for metal evaporation coating - Google Patents
Apparatus for metal evaporation coatingInfo
- Publication number
- GB1322670A GB1322670A GB3537971A GB1322670DA GB1322670A GB 1322670 A GB1322670 A GB 1322670A GB 3537971 A GB3537971 A GB 3537971A GB 1322670D A GB1322670D A GB 1322670DA GB 1322670 A GB1322670 A GB 1322670A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cathode
- anode
- evaporation surface
- cooling
- evaporated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
1322670 Arc evaporation apparatus L P SABLEV N P ATAMANSKY V N GORBUNOV J I DOLOTOV V N LUTSENKO V M LUNEV and V V USOV 28 July 1971 35379/71 Heading C7F [Also in Division H1] Vacuum vapour deposition apparatus comprises an anode 26, a cathode 9 of the metal to be evaporated, arranged on cooling bed 8 and facing the anode, means 6 for maintaining a vacuum, an arc current source 40 connectable between anode 26 and cathode 9, a trigger electrode 29 arranged to generate an electric arc cathode spot on the evaporation surface of the cathode, and means, such as shield 21, for extinguishing the cathode spot when it displaces from the evaporation surface to a non-evaporation surface of the cathode. The anode may be a cylindrical or spherical envelope within chamber 2, or may be the chamber itself, Fig.9 (not shown) or the substrates may constitute the anode, Figs.6, 7, and 8 (not shown). The substrate(s) 13 may be individual plates, or a moving metal band, Fig.4 (not shown); the cathode evaporation surface may be a flat disc or ring, or the inside or outside of a cylinder (for coating the outside or inside respectively of a tube); cooling is by circulation of a cooling liquid via nipples 19 and space 17 or by provision of an external heat sink, Fig. 3 (not shown), and automatic control of trigger electrode 29 is achieved using various described circuits. Metals which may be evaporated are Pb, Sn, Zn, Cr, Cd, Nb, Mo, Ta, Ti and W.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16375771A | 1971-07-19 | 1971-07-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1322670A true GB1322670A (en) | 1973-07-11 |
Family
ID=22591432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3537971A Expired GB1322670A (en) | 1971-07-19 | 1971-07-28 | Apparatus for metal evaporation coating |
Country Status (4)
Country | Link |
---|---|
US (1) | US3793179A (en) |
DE (1) | DE2136532C3 (en) |
FR (1) | FR2147880B1 (en) |
GB (1) | GB1322670A (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4309315A (en) | 1978-12-27 | 1982-01-05 | Nissan Motor Company, Ltd. | Surface-activated functional materials and a method of producing the same |
GB2139648A (en) * | 1983-05-13 | 1984-11-14 | Wedtech Corp | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase |
GB2140040A (en) * | 1983-05-09 | 1984-11-21 | Vac Tec Syst | Evaporation arc stabilization |
GB2148329A (en) * | 1983-09-12 | 1985-05-30 | Vac Tec Syst | Improved method and apparatus for evaporation arc stabilization including initial target cleaning |
GB2150947A (en) * | 1983-12-07 | 1985-07-10 | Vac Tec Syst | Evaporation arc stabilization for non-permeable targets utilizing permeable stop ring |
US4537794A (en) * | 1981-02-24 | 1985-08-27 | Wedtech Corp. | Method of coating ceramics |
GB2156384A (en) * | 1981-02-24 | 1985-10-09 | Wedtech Corp | Apparatus for vapour deposition by arc discharge |
GB2159540A (en) * | 1984-05-25 | 1985-12-04 | Wedtech Corp | Apparatus and methods for coating substrates |
US4596719A (en) * | 1981-02-24 | 1986-06-24 | Wedtech Corp. | Multilayer coating method and apparatus |
DE3529813A1 (en) * | 1984-12-20 | 1986-07-03 | Vladimir Petrovic Petrakov | Ion plasma vapour deposition process and system for carrying out this process |
DE3707545A1 (en) * | 1987-02-03 | 1988-08-11 | Balzers Hochvakuum | ARRANGEMENT FOR STABILIZING AN ARC BETWEEN AN ANODE AND A CATHODE |
US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
DE9207046U1 (en) * | 1992-05-25 | 1992-07-23 | VTD-Vakuumtechnik Dresden GmbH, O-8017 Dresden | Ignition device for a vacuum arc discharge evaporator |
Families Citing this family (69)
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SU1040631A1 (en) * | 1980-06-25 | 1983-09-07 | Предприятие П/Я В-8851 | Vacuum arc apparatus |
US4512867A (en) * | 1981-11-24 | 1985-04-23 | Andreev Anatoly A | Method and apparatus for controlling plasma generation in vapor deposition |
AT376460B (en) * | 1982-09-17 | 1984-11-26 | Kljuchko Gennady V | PLASMA ARC DEVICE FOR APPLYING COVERS |
US4448799A (en) * | 1983-04-21 | 1984-05-15 | Multi-Arc Vacuum Systems Inc. | Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems |
US4559121A (en) * | 1983-09-12 | 1985-12-17 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization for permeable targets |
US4622452A (en) * | 1983-07-21 | 1986-11-11 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition electrode apparatus |
US4559125A (en) * | 1983-09-12 | 1985-12-17 | Vac-Tec Systems, Inc. | Apparatus for evaporation arc stabilization during the initial clean-up of an arc target |
US4600489A (en) * | 1984-01-19 | 1986-07-15 | Vac-Tec Systems, Inc. | Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring |
US4895765A (en) * | 1985-09-30 | 1990-01-23 | Union Carbide Corporation | Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture |
US4839245A (en) * | 1985-09-30 | 1989-06-13 | Union Carbide Corporation | Zirconium nitride coated article and method for making same |
US4929322A (en) * | 1985-09-30 | 1990-05-29 | Union Carbide Corporation | Apparatus and process for arc vapor depositing a coating in an evacuated chamber |
US4620913A (en) * | 1985-11-15 | 1986-11-04 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition method and apparatus |
CH671238A5 (en) * | 1986-11-06 | 1989-08-15 | Vni Instrument Inst | |
US5215640A (en) * | 1987-02-03 | 1993-06-01 | Balzers Ag | Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices |
FR2612204A1 (en) * | 1987-03-12 | 1988-09-16 | Vac Tec Syst | METHOD AND APPARATUS FOR VACUUM ELECTRIC ARC PLASMA DEPOSITION OF DECORATIVE COATINGS AND WEAR RESISTANT COATINGS |
EP0298157B1 (en) * | 1987-06-29 | 1992-09-02 | Hauzer Holding B.V. | Method and device for coating cavities of objects |
US4943325A (en) * | 1988-10-19 | 1990-07-24 | Black & Veatch, Engineers-Architects | Reflector assembly |
JP2718731B2 (en) * | 1988-12-21 | 1998-02-25 | 株式会社神戸製鋼所 | Vacuum arc deposition apparatus and vacuum arc deposition method |
US4936960A (en) * | 1989-01-03 | 1990-06-26 | Advanced Energy Industries, Inc. | Method and apparatus for recovery from low impedance condition during cathodic arc processes |
DE4006456C1 (en) * | 1990-03-01 | 1991-05-29 | Balzers Ag, Balzers, Li | Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface |
US5238546A (en) * | 1990-03-01 | 1993-08-24 | Balzers Aktiengesellschaft | Method and apparatus for vaporizing materials by plasma arc discharge |
US5037522B1 (en) * | 1990-07-24 | 1996-07-02 | Vergason Technology Inc | Electric arc vapor deposition device |
US5858456A (en) * | 1991-02-06 | 1999-01-12 | Applied Vacuum Technologies 1 Ab | Method for metal coating discrete objects by vapor deposition |
CA2065581C (en) | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
US5451308A (en) * | 1991-04-29 | 1995-09-19 | Novatech | Electric arc metal evaporator |
DE4125365C1 (en) * | 1991-07-31 | 1992-05-21 | Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De | |
IT1253065B (en) * | 1991-12-13 | 1995-07-10 | Unicoat Srl | VOLTAIC ARC VAPORIZER |
US5282944A (en) * | 1992-07-30 | 1994-02-01 | The United States Of America As Represented By The United States Department Of Energy | Ion source based on the cathodic arc |
US5380421A (en) * | 1992-11-04 | 1995-01-10 | Gorokhovsky; Vladimir I. | Vacuum-arc plasma source |
WO1994016117A1 (en) * | 1992-12-30 | 1994-07-21 | Nauchno-Proizvodstvennoe Predpriyatie 'novatekh' | Device for the vacuum-plasma treatment of articles |
US5744017A (en) * | 1993-12-17 | 1998-04-28 | Kabushiki Kaisha Kobe Seiko Sho | Vacuum arc deposition apparatus |
US5480527A (en) * | 1994-04-25 | 1996-01-02 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
DE4441117C1 (en) * | 1994-11-18 | 1995-10-26 | Plasma Applikation Mbh Ges | Process for coating substrates and device for carrying out the process |
JP3287163B2 (en) * | 1995-01-23 | 2002-05-27 | 日新電機株式会社 | Arc evaporation source |
US5518597A (en) * | 1995-03-28 | 1996-05-21 | Minnesota Mining And Manufacturing Company | Cathodic arc coating apparatus and method |
WO1996031899A1 (en) * | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
CH689558A5 (en) | 1995-07-11 | 1999-06-15 | Erich Bergmann | Vaporization and evaporator unit. |
US5656091A (en) * | 1995-11-02 | 1997-08-12 | Vacuum Plating Technology Corporation | Electric arc vapor deposition apparatus and method |
US5895559A (en) * | 1996-04-08 | 1999-04-20 | Christy; Ronald | Cathodic arc cathode |
DE19652634C2 (en) * | 1996-09-13 | 2002-12-19 | Euromat Ges Fuer Werkstofftech | Process for the internal coating of a metallic component, in particular a component with a cylindrical cavity, a device for carrying it out and the use of the method |
DE19654336C2 (en) * | 1996-12-24 | 2002-12-12 | Bekaert Cmtm Gmbh | Surface treatment of metallic strips using a magnetically moving arc |
US6009829A (en) * | 1997-08-30 | 2000-01-04 | United Technologies Corporation | Apparatus for driving the arc in a cathodic arc coater |
US6036828A (en) * | 1997-08-30 | 2000-03-14 | United Technologies Corporation | Apparatus for steering the arc in a cathodic arc coater |
US5932078A (en) * | 1997-08-30 | 1999-08-03 | United Technologies Corporation | Cathodic arc vapor deposition apparatus |
US5972185A (en) * | 1997-08-30 | 1999-10-26 | United Technologies Corporation | Cathodic arc vapor deposition apparatus (annular cathode) |
AU9410498A (en) * | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
US6103074A (en) * | 1998-02-14 | 2000-08-15 | Phygen, Inc. | Cathode arc vapor deposition method and apparatus |
US5976636A (en) * | 1998-03-19 | 1999-11-02 | Industrial Technology Research Institute | Magnetic apparatus for arc ion plating |
JP5033278B2 (en) * | 1998-04-29 | 2012-09-26 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | Tools or machine parts and methods for increasing the wear resistance of such parts |
US6929727B2 (en) * | 1999-04-12 | 2005-08-16 | G & H Technologies, Llc | Rectangular cathodic arc source and method of steering an arc spot |
CA2268659C (en) * | 1999-04-12 | 2008-12-30 | Vladimir I. Gorokhovsky | Rectangular cathodic arc source and method of steering an arc spot |
US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
US7300559B2 (en) * | 2000-04-10 | 2007-11-27 | G & H Technologies Llc | Filtered cathodic arc deposition method and apparatus |
US6402901B1 (en) * | 2001-03-16 | 2002-06-11 | 4 Wave, Inc. | System and method for performing sputter deposition using a spherical geometry |
US6436254B1 (en) * | 2001-04-03 | 2002-08-20 | General Electric Company | Cathode mounting system for cathodic arc cathodes |
US6936145B2 (en) * | 2002-02-28 | 2005-08-30 | Ionedge Corporation | Coating method and apparatus |
DE10224991A1 (en) * | 2002-06-05 | 2004-01-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for reducing the ignition voltage of plasmas |
US6770178B2 (en) * | 2002-08-09 | 2004-08-03 | United Technologies Corporation | Cathodic arc disposable sting shielding |
US20050176251A1 (en) * | 2004-02-05 | 2005-08-11 | Duong Chau H. | Polishing pad with releasable slick particles |
US9997338B2 (en) * | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
US20090065045A1 (en) * | 2007-09-10 | 2009-03-12 | Zenith Solar Ltd. | Solar electricity generation system |
US9893223B2 (en) | 2010-11-16 | 2018-02-13 | Suncore Photovoltaics, Inc. | Solar electricity generation system |
US9153422B2 (en) | 2011-08-02 | 2015-10-06 | Envaerospace, Inc. | Arc PVD plasma source and method of deposition of nanoimplanted coatings |
US10304665B2 (en) | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
DE212014000271U1 (en) * | 2014-08-04 | 2017-04-13 | Surasak Surinphong | Filter apparatus for an arc ion evaporator of a cathodic arc plasma coating apparatus |
RU2710809C1 (en) * | 2019-08-05 | 2020-01-14 | Общество с ограниченной ответственностью "НПП "Уралавиаспецтехнология" | Apparatus for applying ion-plasma coatings |
CN113957389B (en) * | 2020-07-21 | 2023-08-11 | 宝山钢铁股份有限公司 | Vacuum coating device with porous noise reduction and uniform distribution of metal vapor |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2972695A (en) * | 1957-05-24 | 1961-02-21 | Vickers Electrical Co Ltd | Stabilisation of low pressure d.c. arc discharges |
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
DE1953659C3 (en) * | 1969-10-21 | 1979-01-25 | N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) | Ion source for atomization with slow ions |
US3661758A (en) * | 1970-06-26 | 1972-05-09 | Hewlett Packard Co | Rf sputtering system with the anode enclosing the target |
-
1971
- 1971-07-19 US US00163757A patent/US3793179A/en not_active Expired - Lifetime
- 1971-07-21 DE DE2136532A patent/DE2136532C3/en not_active Expired
- 1971-07-28 GB GB3537971A patent/GB1322670A/en not_active Expired
- 1971-08-05 FR FR7128763A patent/FR2147880B1/fr not_active Expired
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4309315A (en) | 1978-12-27 | 1982-01-05 | Nissan Motor Company, Ltd. | Surface-activated functional materials and a method of producing the same |
US4596719A (en) * | 1981-02-24 | 1986-06-24 | Wedtech Corp. | Multilayer coating method and apparatus |
US4537794A (en) * | 1981-02-24 | 1985-08-27 | Wedtech Corp. | Method of coating ceramics |
GB2156384A (en) * | 1981-02-24 | 1985-10-09 | Wedtech Corp | Apparatus for vapour deposition by arc discharge |
US4609564A (en) * | 1981-02-24 | 1986-09-02 | Wedtech Corp. | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase |
GB2140040A (en) * | 1983-05-09 | 1984-11-21 | Vac Tec Syst | Evaporation arc stabilization |
GB2139648A (en) * | 1983-05-13 | 1984-11-14 | Wedtech Corp | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase |
US4505948A (en) * | 1983-05-13 | 1985-03-19 | Wedtech Corp. | Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase |
GB2148329A (en) * | 1983-09-12 | 1985-05-30 | Vac Tec Syst | Improved method and apparatus for evaporation arc stabilization including initial target cleaning |
GB2150947A (en) * | 1983-12-07 | 1985-07-10 | Vac Tec Syst | Evaporation arc stabilization for non-permeable targets utilizing permeable stop ring |
US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
GB2159540A (en) * | 1984-05-25 | 1985-12-04 | Wedtech Corp | Apparatus and methods for coating substrates |
DE3529813A1 (en) * | 1984-12-20 | 1986-07-03 | Vladimir Petrovic Petrakov | Ion plasma vapour deposition process and system for carrying out this process |
DE3707545A1 (en) * | 1987-02-03 | 1988-08-11 | Balzers Hochvakuum | ARRANGEMENT FOR STABILIZING AN ARC BETWEEN AN ANODE AND A CATHODE |
DE9207046U1 (en) * | 1992-05-25 | 1992-07-23 | VTD-Vakuumtechnik Dresden GmbH, O-8017 Dresden | Ignition device for a vacuum arc discharge evaporator |
Also Published As
Publication number | Publication date |
---|---|
FR2147880B1 (en) | 1976-03-26 |
DE2136532C3 (en) | 1979-03-22 |
FR2147880A1 (en) | 1973-03-11 |
DE2136532B2 (en) | 1978-07-20 |
US3793179A (en) | 1974-02-19 |
DE2136532A1 (en) | 1973-02-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PE20 | Patent expired after termination of 20 years |