GB2015581A - Improvements in or relating to sputtering - Google Patents

Improvements in or relating to sputtering

Info

Publication number
GB2015581A
GB2015581A GB7908628A GB7908628A GB2015581A GB 2015581 A GB2015581 A GB 2015581A GB 7908628 A GB7908628 A GB 7908628A GB 7908628 A GB7908628 A GB 7908628A GB 2015581 A GB2015581 A GB 2015581A
Authority
GB
United Kingdom
Prior art keywords
sputtering
target rod
anode
deposition
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7908628A
Other versions
GB2015581B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ultra Electronic Controls Ltd
Original Assignee
Ultra Electronic Controls Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultra Electronic Controls Ltd filed Critical Ultra Electronic Controls Ltd
Priority to GB7908628A priority Critical patent/GB2015581B/en
Publication of GB2015581A publication Critical patent/GB2015581A/en
Application granted granted Critical
Publication of GB2015581B publication Critical patent/GB2015581B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention describes an electrode assembly for use in a sputtering apparatus. In the sputtering assembly, a cathode mount 18 is insulatingly supported on an anode 16 and carries a target rod 21. The target rod has a much smaller surface area than the surrounding surface of the anode. High power is supplied to the cathode so that the temperature of the target rod should reach approximately 1000 DEG C. This results in a high rate of deposition and in the deposition of a pure coating. <IMAGE>
GB7908628A 1977-12-12 1979-03-12 Sputtering Expired GB2015581B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB7908628A GB2015581B (en) 1977-12-12 1979-03-12 Sputtering

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB5167277 1977-12-12
GB7908628A GB2015581B (en) 1977-12-12 1979-03-12 Sputtering

Publications (2)

Publication Number Publication Date
GB2015581A true GB2015581A (en) 1979-09-12
GB2015581B GB2015581B (en) 1982-02-10

Family

ID=26266917

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7908628A Expired GB2015581B (en) 1977-12-12 1979-03-12 Sputtering

Country Status (1)

Country Link
GB (1) GB2015581B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4290875A (en) * 1980-03-18 1981-09-22 Ultra Electronic Controls Limited Sputtering apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4290875A (en) * 1980-03-18 1981-09-22 Ultra Electronic Controls Limited Sputtering apparatus

Also Published As

Publication number Publication date
GB2015581B (en) 1982-02-10

Similar Documents

Publication Publication Date Title
GB1322670A (en) Apparatus for metal evaporation coating
ES8307536A1 (en) Sputtering system.
DE59400046D1 (en) Magnetron sputtering source and its use.
JPS53121454A (en) Electron source of thin film electric field emission type and its manufacture
FR2457013A1 (en) METHOD FOR ELECTRICALLY TREATING A SYSTEM OF ELECTRONIC GUNS OF A CATHODE RAY TUBE TO ELIMINATE FAULTS
GB2015581A (en) Improvements in or relating to sputtering
GB2034924B (en) Setting the cathode heating current of an electron beam machine
JPS57162248A (en) Rotary anode x-ray tube
JPS5534689A (en) Sputtering device
JPS5594474A (en) Ion plating apparatus for tube inside using laser beam
JPS5519782A (en) Electron gun
JPS53105699A (en) Cold cathod discharging type ion source device
JPS53128263A (en) Electronic gun
JPS5533719A (en) Electron gun
JPS53137660A (en) Electron gun
GB1384243A (en) Electron guns
JPS5648042A (en) X-ray tube
JPS5427349A (en) Electron tube
JPS5538946A (en) Sputtering apparatus
JPS5459871A (en) Plane display unit and its manufacture
JPS52115684A (en) X-ray tube
JPS55104043A (en) Thermion radiating cathode
GB1334126A (en) Evaporation and or treatment of materials in ultra-high vacuum by electron beans
JPS54142990A (en) X-ray tube
JPS53397A (en) Metalic ion source

Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930312