DE2112141A1 - Photographisches Material - Google Patents

Photographisches Material

Info

Publication number
DE2112141A1
DE2112141A1 DE19712112141 DE2112141A DE2112141A1 DE 2112141 A1 DE2112141 A1 DE 2112141A1 DE 19712112141 DE19712112141 DE 19712112141 DE 2112141 A DE2112141 A DE 2112141A DE 2112141 A1 DE2112141 A1 DE 2112141A1
Authority
DE
Germany
Prior art keywords
layer
pigment
compounds
compound
material according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712112141
Other languages
German (de)
English (en)
Inventor
Peter Dr Bergthaller
Wolfgang Dr Himmelmann
Juergen Dr Hocker
Erwin Dr Ranz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
Original Assignee
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert AG filed Critical Agfa Gevaert AG
Priority to DE19712112141 priority Critical patent/DE2112141A1/de
Priority to GB1076872A priority patent/GB1383239A/en
Priority to BE780405A priority patent/BE780405A/xx
Priority to CA136,778A priority patent/CA971819A/en
Priority to US00233753A priority patent/US3782950A/en
Priority to IT48891/72A priority patent/IT952188B/it
Priority to CH363472A priority patent/CH586407A5/xx
Priority to FR7208711A priority patent/FR2130183B1/fr
Publication of DE2112141A1 publication Critical patent/DE2112141A1/de
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C07D295/125Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/13Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00Colour separation; Correction of tonal value
    • G03F3/10Checking the colour or tonal value of separation negatives or positives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/112Cellulosic

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
DE19712112141 1971-03-13 1971-03-13 Photographisches Material Pending DE2112141A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE19712112141 DE2112141A1 (de) 1971-03-13 1971-03-13 Photographisches Material
GB1076872A GB1383239A (en) 1971-03-13 1972-03-08 Photographic material
BE780405A BE780405A (fr) 1971-03-13 1972-03-09 Fotografisch materiaal
CA136,778A CA971819A (en) 1971-03-13 1972-03-10 Photographic material
US00233753A US3782950A (en) 1971-03-13 1972-03-10 Photographic material
IT48891/72A IT952188B (it) 1971-03-13 1972-03-10 Materiale fotografico a strati e procedimento per produrre con esso immagini fotografiche
CH363472A CH586407A5 (enExample) 1971-03-13 1972-03-13
FR7208711A FR2130183B1 (enExample) 1971-03-13 1972-03-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712112141 DE2112141A1 (de) 1971-03-13 1971-03-13 Photographisches Material

Publications (1)

Publication Number Publication Date
DE2112141A1 true DE2112141A1 (de) 1972-10-05

Family

ID=5801446

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712112141 Pending DE2112141A1 (de) 1971-03-13 1971-03-13 Photographisches Material

Country Status (8)

Country Link
US (1) US3782950A (enExample)
BE (1) BE780405A (enExample)
CA (1) CA971819A (enExample)
CH (1) CH586407A5 (enExample)
DE (1) DE2112141A1 (enExample)
FR (1) FR2130183B1 (enExample)
GB (1) GB1383239A (enExample)
IT (1) IT952188B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2228110A1 (de) * 1972-06-09 1973-12-20 Agfa Gevaert Ag Lichtempfindliches photographisches material
GB2008784B (en) * 1977-11-17 1982-04-15 Asahi Chemical Ind Heat resistant photoresist composition and process for preparing the same
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
US4565857A (en) * 1984-11-21 1986-01-21 Minnesota Mining And Manufacturing Company Radiation-curable cellulose coating
US4654233A (en) * 1984-11-21 1987-03-31 Minnesota Mining And Manufacturing Company Radiation-curable thermoplastic coating
US4861629A (en) * 1987-12-23 1989-08-29 Hercules Incorporated Polyfunctional ethylenically unsaturated cellulosic polymer-based photocurable compositions
US4855184A (en) * 1988-02-02 1989-08-08 Minnesota Mining And Manufacturing Company Radiation-curable protective coating composition
US5049623A (en) * 1989-08-03 1991-09-17 Monsanto Company Ethylenically unsaturated carbamates and coating compositions
US5055518A (en) * 1989-08-03 1991-10-08 Monsanto Company Ethylenically unsaturated carbamates and coating compositions
US5157093A (en) * 1990-05-10 1992-10-20 Ciba-Geigy Corporation Hydroxyethyl cellulose derivatives containing pendant (meth)acryloyl units bound through urethane groups and hydrogel contact lenses made therefrom
JP3461029B2 (ja) 1994-05-26 2003-10-27 大日本インキ化学工業株式会社 ペリレン顔料組成物及び該組成物を含有する塗料
JP2009214428A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP5618053B2 (ja) * 2010-03-24 2014-11-05 株式会社日本コンタクトレンズ コンタクトレンズ、及びその製造方法
CN115521314B (zh) * 2021-06-25 2024-07-05 广东聚华印刷显示技术有限公司 具有吡咯烷酮基的有机化合物及制备方法、有机发光器件

Also Published As

Publication number Publication date
IT952188B (it) 1973-07-20
CA971819A (en) 1975-07-29
FR2130183B1 (enExample) 1977-01-14
FR2130183A1 (enExample) 1972-11-03
CH586407A5 (enExample) 1977-03-31
BE780405A (fr) 1972-09-11
US3782950A (en) 1974-01-01
GB1383239A (en) 1975-02-05

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Legal Events

Date Code Title Description
OHA Expiration of time for request for examination