DE1497407A1 - Photographisches Reproduktionsverfahren - Google Patents
Photographisches ReproduktionsverfahrenInfo
- Publication number
- DE1497407A1 DE1497407A1 DE19651497407 DE1497407A DE1497407A1 DE 1497407 A1 DE1497407 A1 DE 1497407A1 DE 19651497407 DE19651497407 DE 19651497407 DE 1497407 A DE1497407 A DE 1497407A DE 1497407 A1 DE1497407 A1 DE 1497407A1
- Authority
- DE
- Germany
- Prior art keywords
- film
- pattern
- points
- plate
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 31
- 230000003252 repetitive effect Effects 0.000 claims description 5
- 235000008694 Humulus lupulus Nutrition 0.000 claims 1
- 244000025221 Humulus lupulus Species 0.000 claims 1
- 239000011521 glass Substances 0.000 description 21
- 239000012876 carrier material Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 5
- 239000000839 emulsion Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 1
- 239000006089 photosensitive glass Substances 0.000 description 1
- 230000027272 reproductive process Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/08—Photoprinting; Processes and means for preventing photoprinting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEB0082497 | 1965-06-16 | ||
| NL6507872A NL6507872A (enrdf_load_stackoverflow) | 1965-06-16 | 1965-06-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1497407A1 true DE1497407A1 (de) | 1969-07-03 |
Family
ID=25967575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19651497407 Pending DE1497407A1 (de) | 1965-06-16 | 1965-06-16 | Photographisches Reproduktionsverfahren |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE1497407A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1039696A (enrdf_load_stackoverflow) |
| NL (1) | NL6507872A (enrdf_load_stackoverflow) |
-
1965
- 1965-05-19 GB GB21113/65A patent/GB1039696A/en not_active Expired
- 1965-06-16 DE DE19651497407 patent/DE1497407A1/de active Pending
- 1965-06-18 NL NL6507872A patent/NL6507872A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1039696A (en) | 1966-08-17 |
| NL6507872A (enrdf_load_stackoverflow) | 1966-12-19 |
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