DE1422921A1 - Verfahren zur Umkehrentwicklung von Diazoverbindungen enthaltenden Kopierschichten - Google Patents
Verfahren zur Umkehrentwicklung von Diazoverbindungen enthaltenden KopierschichtenInfo
- Publication number
- DE1422921A1 DE1422921A1 DE19611422921 DE1422921A DE1422921A1 DE 1422921 A1 DE1422921 A1 DE 1422921A1 DE 19611422921 DE19611422921 DE 19611422921 DE 1422921 A DE1422921 A DE 1422921A DE 1422921 A1 DE1422921 A1 DE 1422921A1
- Authority
- DE
- Germany
- Prior art keywords
- light
- kalle
- layer
- exposed
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 16
- 238000011161 development Methods 0.000 title claims description 10
- 150000008049 diazo compounds Chemical class 0.000 title 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 239000012670 alkaline solution Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229920001169 thermoplastic Polymers 0.000 claims description 3
- 239000004416 thermosoftening plastic Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 150000007522 mineralic acids Chemical class 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims 1
- 229920003086 cellulose ether Polymers 0.000 claims 1
- 229920001568 phenolic resin Polymers 0.000 claims 1
- 229920001290 polyvinyl ester Polymers 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 239000000243 solution Substances 0.000 description 35
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 18
- 229910052802 copper Inorganic materials 0.000 description 18
- 239000010949 copper Substances 0.000 description 18
- 238000007639 printing Methods 0.000 description 15
- 239000002253 acid Substances 0.000 description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000007645 offset printing Methods 0.000 description 8
- 229920002689 polyvinyl acetate Polymers 0.000 description 8
- 239000011118 polyvinyl acetate Substances 0.000 description 7
- 240000001624 Espostoa lanata Species 0.000 description 6
- 235000009161 Espostoa lanata Nutrition 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229920002301 cellulose acetate Polymers 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 229920000742 Cotton Polymers 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- ITYXXSSJBOAGAR-UHFFFAOYSA-N 1-(methylamino)-4-(4-methylanilino)anthracene-9,10-dione Chemical compound C1=2C(=O)C3=CC=CC=C3C(=O)C=2C(NC)=CC=C1NC1=CC=C(C)C=C1 ITYXXSSJBOAGAR-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 101001015038 Albizia kalkora Kunitz-type trypsin inhibitor alpha chain Proteins 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 244000269722 Thea sinensis Species 0.000 description 2
- 239000000987 azo dye Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 239000001488 sodium phosphate Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 2
- 235000019801 trisodium phosphate Nutrition 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- RGCKGOZRHPZPFP-UHFFFAOYSA-N Alizarin Natural products C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 description 1
- 101100086716 Caenorhabditis elegans ran-3 gene Proteins 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 102100034003 FAU ubiquitin-like and ribosomal protein S30 Human genes 0.000 description 1
- 101000732045 Homo sapiens FAU ubiquitin-like and ribosomal protein S30 Proteins 0.000 description 1
- 101100182612 Homo sapiens LSR gene Proteins 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 102100032010 Lipolysis-stimulated lipoprotein receptor Human genes 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 229920001283 Polyalkylene terephthalate Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 244000078856 Prunus padus Species 0.000 description 1
- 241000801924 Sena Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 244000223014 Syzygium aromaticum Species 0.000 description 1
- 235000016639 Syzygium aromaticum Nutrition 0.000 description 1
- 241001080024 Telles Species 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- WPPDFTBPZNZZRP-UHFFFAOYSA-N aluminum copper Chemical compound [Al].[Cu] WPPDFTBPZNZZRP-UHFFFAOYSA-N 0.000 description 1
- 235000015115 caffè latte Nutrition 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 235000013601 eggs Nutrition 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 210000002837 heart atrium Anatomy 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 101150029117 meox2 gene Proteins 0.000 description 1
- KKZJGLLVHKMTCM-UHFFFAOYSA-N mitoxantrone Chemical compound O=C1C2=C(O)C=CC(O)=C2C(=O)C2=C1C(NCCNCCO)=CC=C2NCCNCCO KKZJGLLVHKMTCM-UHFFFAOYSA-N 0.000 description 1
- 229960001156 mitoxantrone Drugs 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000037307 sensitive skin Effects 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 235000015149 toffees Nutrition 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0044366 | 1961-07-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1422921A1 true DE1422921A1 (de) | 1969-01-09 |
Family
ID=7223439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19611422921 Withdrawn DE1422921A1 (de) | 1961-07-28 | 1961-07-28 | Verfahren zur Umkehrentwicklung von Diazoverbindungen enthaltenden Kopierschichten |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3264104A (en, 2012) |
| AT (1) | AT242503B (en, 2012) |
| BE (1) | BE620660A (en, 2012) |
| CH (1) | CH418126A (en, 2012) |
| DE (1) | DE1422921A1 (en, 2012) |
| GB (1) | GB1003857A (en, 2012) |
| NL (2) | NL280959A (en, 2012) |
| SE (1) | SE316078B (en, 2012) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0292821A3 (de) * | 1987-05-18 | 1989-10-25 | Hoechst Aktiengesellschaft | Verfahren zur Bildumkehr von normalerweise positiv arbeitenden Photoresistmaterialien |
| EP0361906A3 (en) * | 1988-09-29 | 1991-05-02 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL267931A (en, 2012) * | 1960-08-05 | 1900-01-01 | ||
| US3474719A (en) * | 1966-04-15 | 1969-10-28 | Gaf Corp | Offset printing plates |
| US3634082A (en) * | 1967-07-07 | 1972-01-11 | Shipley Co | Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether |
| US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
| JPS5343285B2 (en, 2012) * | 1972-07-26 | 1978-11-18 | ||
| US3930857A (en) * | 1973-05-03 | 1976-01-06 | International Business Machines Corporation | Resist process |
| JPS5421089B2 (en, 2012) * | 1973-05-29 | 1979-07-27 | ||
| DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
| US4007047A (en) * | 1974-06-06 | 1977-02-08 | International Business Machines Corporation | Modified processing of positive photoresists |
| US3961101A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Process for improved development of electron-beam-sensitive resist films |
| US3961100A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Method for developing electron beam sensitive resist films |
| DE2529054C2 (de) * | 1975-06-30 | 1982-04-29 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes |
| DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
| US4102686A (en) * | 1977-02-25 | 1978-07-25 | Polychrome Corporation | Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin |
| JPS585798B2 (ja) * | 1977-06-30 | 1983-02-01 | 富士写真フイルム株式会社 | 平版印刷版用不感脂化液およびそれを用いる平版印刷版の製造方法 |
| JPS5635130A (en) * | 1979-08-31 | 1981-04-07 | Fujitsu Ltd | Resist material and method for forming resist pattern |
| US4508813A (en) * | 1980-06-16 | 1985-04-02 | Fujitsu Limited | Method for producing negative resist images |
| DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
| DE3325022A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| DE3325023A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| GB2171530B (en) * | 1985-02-27 | 1989-06-28 | Imtec Products Inc | Method of producing reversed photoresist images by vapour diffusion |
| US5256522A (en) * | 1985-08-12 | 1993-10-26 | Hoechst Celanese Corporation | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
| US5217840A (en) * | 1985-08-12 | 1993-06-08 | Hoechst Celanese Corporation | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
| US4931381A (en) * | 1985-08-12 | 1990-06-05 | Hoechst Celanese Corporation | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment |
| ZA872295B (en, 2012) * | 1986-03-13 | 1987-09-22 | ||
| GB2188448B (en) * | 1986-03-13 | 1989-11-15 | Horsell Graphic Ind Ltd | Reversal processing of exposed lithographic printing plates |
| JPH01501176A (ja) * | 1986-10-20 | 1989-04-20 | マクダーミッド，インコーポレーテッド | 像反転可能なシステム及びプロセス |
| JP2598059B2 (ja) * | 1987-03-27 | 1997-04-09 | ホーセル グラフィック インダストリーズ リミッティッド | 露光式石版の製造方法 |
| EP0308400B1 (en) * | 1987-03-27 | 1991-07-17 | Horsell Graphic Industries Limited | Processing of exposed lithographic printing plates |
| CA2001852A1 (en) * | 1988-11-01 | 1990-05-01 | Iwao Numakura | Process and apparatus for the formation of negative resist pattern |
| DE3837500A1 (de) * | 1988-11-04 | 1990-05-23 | Hoechst Ag | Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial |
| EP0394738A3 (de) * | 1989-04-24 | 1991-03-27 | Siemens Aktiengesellschaft | Vereinfachtes Mehrlagenphotoresistsystem |
| EP0413087A1 (en) * | 1989-07-20 | 1991-02-20 | International Business Machines Corporation | Photosensitive composition and use thereof |
| US7157213B2 (en) * | 2004-03-01 | 2007-01-02 | Think Laboratory Co., Ltd. | Developer agent for positive type photosensitive compound |
| EP1574907A1 (en) * | 2004-03-08 | 2005-09-14 | Think Laboratory Co., Ltd. | Developing agent for positive-type photosensitive composition |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2500023A (en) * | 1946-03-16 | 1950-03-07 | Du Pont | Polymerization of substituted ethylenes containing organic coloring matter in presence of azo compounds |
| US2480749A (en) * | 1947-08-27 | 1949-08-30 | Du Pont | Process for preparing cast synthetic resin having integral patterned effects |
| NL70798C (en, 2012) * | 1948-10-15 | |||
| US3046121A (en) * | 1949-07-23 | 1962-07-24 | Azoplate Corp | Process for the manufacture of printing plates and light-sensitive material suttablefor use therein |
| BE506677A (en, 2012) * | 1950-10-31 | |||
| NL199728A (en, 2012) * | 1954-08-20 | |||
| NL204620A (en, 2012) * | 1955-02-25 | |||
| US2930691A (en) * | 1955-03-28 | 1960-03-29 | Technicolor Corp | Planographic dye-absorptive film and method of making same |
| US3032414A (en) * | 1956-11-19 | 1962-05-01 | Kalvar Corp | System of photographic reproduction |
| NL103895C (en, 2012) * | 1957-08-01 | |||
| US2993788A (en) * | 1958-06-17 | 1961-07-25 | Gen Aniline & Film Corp | Multicolor reproduction using light sensitive diazo oxides |
| NL247299A (en, 2012) * | 1959-01-14 | |||
| NL130027C (en, 2012) * | 1959-01-15 |
-
0
- NL NL138044D patent/NL138044C/xx active
- NL NL280959D patent/NL280959A/xx unknown
- BE BE620660D patent/BE620660A/xx unknown
-
1961
- 1961-07-28 DE DE19611422921 patent/DE1422921A1/de not_active Withdrawn
-
1962
- 1962-07-20 GB GB28087/62A patent/GB1003857A/en not_active Expired
- 1962-07-25 US US212437A patent/US3264104A/en not_active Expired - Lifetime
- 1962-07-26 CH CH896262A patent/CH418126A/de unknown
- 1962-07-27 AT AT608562A patent/AT242503B/de active
- 1962-07-27 SE SE8306/62A patent/SE316078B/xx unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0292821A3 (de) * | 1987-05-18 | 1989-10-25 | Hoechst Aktiengesellschaft | Verfahren zur Bildumkehr von normalerweise positiv arbeitenden Photoresistmaterialien |
| EP0361906A3 (en) * | 1988-09-29 | 1991-05-02 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
Also Published As
| Publication number | Publication date |
|---|---|
| SE316078B (en, 2012) | 1969-10-13 |
| CH418126A (de) | 1966-07-31 |
| US3264104A (en) | 1966-08-02 |
| AT242503B (de) | 1965-09-27 |
| NL138044C (en, 2012) | |
| NL280959A (en, 2012) | |
| GB1003857A (en) | 1965-09-08 |
| BE620660A (en, 2012) |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E77 | Valid patent as to the heymanns-index 1977 | ||
| EHJ | Ceased/non-payment of the annual fee |