DE112004000452B4 - Verfahren und Vorrichtung zur Herstellung glatter Diamantschichten - Google Patents

Verfahren und Vorrichtung zur Herstellung glatter Diamantschichten Download PDF

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Publication number
DE112004000452B4
DE112004000452B4 DE112004000452.7T DE112004000452T DE112004000452B4 DE 112004000452 B4 DE112004000452 B4 DE 112004000452B4 DE 112004000452 T DE112004000452 T DE 112004000452T DE 112004000452 B4 DE112004000452 B4 DE 112004000452B4
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Germany
Prior art keywords
operating state
coating
gas
carbon
substrate
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Expired - Lifetime
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DE112004000452.7T
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German (de)
English (en)
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DE112004000452D2 (de
Inventor
Dirk Breidt
Martin Frank
Oliver Lemmer
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Cemecon AG
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Cemecon AG
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Publication of DE112004000452D2 publication Critical patent/DE112004000452D2/de
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/279—Diamond only control of diamond crystallography
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S76/00—Metal tools and implements, making
    • Y10S76/12—Diamond tools

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
DE112004000452.7T 2003-03-21 2004-03-22 Verfahren und Vorrichtung zur Herstellung glatter Diamantschichten Expired - Lifetime DE112004000452B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10312777.1 2003-03-21
DE10312777 2003-03-21
PCT/EP2004/003014 WO2004083484A1 (de) 2003-03-21 2004-03-22 Körper mit glatter diamantschicht, sowie vorrichtung und verfahren

Publications (2)

Publication Number Publication Date
DE112004000452D2 DE112004000452D2 (de) 2006-02-09
DE112004000452B4 true DE112004000452B4 (de) 2015-11-19

Family

ID=33015933

Family Applications (2)

Application Number Title Priority Date Filing Date
DE112004000452.7T Expired - Lifetime DE112004000452B4 (de) 2003-03-21 2004-03-22 Verfahren und Vorrichtung zur Herstellung glatter Diamantschichten
DE112004003154.0T Expired - Lifetime DE112004003154B4 (de) 2003-03-21 2004-03-22 Verfahren und Vorrichtung zur Herstellung einer glatten Diamantschicht

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE112004003154.0T Expired - Lifetime DE112004003154B4 (de) 2003-03-21 2004-03-22 Verfahren und Vorrichtung zur Herstellung einer glatten Diamantschicht

Country Status (4)

Country Link
US (1) US7815735B2 (https=)
JP (1) JP5084258B2 (https=)
DE (2) DE112004000452B4 (https=)
WO (1) WO2004083484A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE529881T1 (de) 2006-08-03 2011-11-15 Creepservice S A R L Verfahren zur beschichtung von substraten mit diamantähnlichen kohlenstoffschichten
AT504006B1 (de) * 2006-08-14 2008-05-15 Rho Best Coating Hartstoffbesc Werkzeuge mit kohlenstoffhaltigen beschichtungen und verfahren zu deren herstellung
JP2008100300A (ja) * 2006-10-17 2008-05-01 Ngk Spark Plug Co Ltd ダイヤモンド被覆切削インサート及び切削工具
KR100924287B1 (ko) * 2007-05-10 2009-10-30 한국과학기술연구원 양광주가 존재하지 않는 직류 전원 플라스마 증착 장치와,양광주를 배제한 상태에서의 물질 증착 방법 및 이에 의해제조된 다이아몬드 박막
KR100922543B1 (ko) * 2007-09-14 2009-10-21 한국과학기술연구원 나노 결정질 다이아몬드 박막 중의 비정상 거대 입자의개재를 방지하는 방법
JP5488873B2 (ja) * 2009-07-13 2014-05-14 三菱マテリアル株式会社 耐欠損性と耐摩耗性にすぐれたダイヤモンド被覆工具
US9175384B2 (en) 2010-04-30 2015-11-03 Cemecon Ag Coated body and a process for coating a body
CN102230156A (zh) * 2011-06-21 2011-11-02 深圳市金洲精工科技股份有限公司 微型刀具上制备复合硬质涂层的方法及微型刀具
DE102013218446A1 (de) 2013-09-13 2015-03-19 Cemecon Ag Werkzeug sowie Verfahren zum Zerspanen von faserverstärktenMaterialien
CN108291299B (zh) 2015-11-27 2021-09-17 塞梅孔公司 用金刚石层和硬质材料层涂覆体
EP3669014B1 (de) 2017-08-18 2024-08-07 Gühring KG Verfahren zum beschichten temperaturempfindlicher substrate mit polykristallinem diamant
JP7556509B2 (ja) * 2019-11-08 2024-09-26 住友電工ハードメタル株式会社 ダイヤモンド被覆工具及びダイヤモンド被覆工具の製造方法
WO2025133335A2 (en) 2023-12-22 2025-06-26 Oerlikon Surface Solutions Ag, Pfäffikon Plasma methods for nanodiamond coatings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998035071A1 (en) * 1997-02-05 1998-08-13 Cemecon-Ceramic Metal Coatings-Dr.-Ing. Antonius Leyendecker Gmbh Hard material coating of a cemented carbide or carbide containing cermet substrate
WO2000060137A1 (en) * 1999-03-31 2000-10-12 Cemecon-Ceramic Metal Coatings-Dr.-Ing. Antonius Leyendecker Gmbh Diamond-coated tool and process for producing thereof
DE19922665A1 (de) * 1999-05-18 2000-11-23 Fraunhofer Ges Forschung Dreidimensionaler Grundkörper mit einer extrem glatten feinkristallinen Diamantschicht

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0328373A (ja) * 1989-06-23 1991-02-06 Idemitsu Petrochem Co Ltd ダイヤモンド被覆部材およびその製造方法
JPH04272179A (ja) * 1991-02-28 1992-09-28 Idemitsu Petrochem Co Ltd ダイヤモンド被覆部材の製造方法
JP2813077B2 (ja) * 1991-05-30 1998-10-22 京セラ株式会社 摺動部材
US5989511A (en) * 1991-11-25 1999-11-23 The University Of Chicago Smooth diamond films as low friction, long wear surfaces
US5567522A (en) * 1992-03-10 1996-10-22 Sumitomo Electric Industries, Ltd. Diamond cutting tool and method of manufacturing the same
JPH06279185A (ja) * 1993-03-25 1994-10-04 Canon Inc ダイヤモンド結晶およびダイヤモンド結晶膜の形成方法
JP3260986B2 (ja) * 1994-09-30 2002-02-25 京セラ株式会社 ダイヤモンド複合膜付部材
US5505158A (en) * 1994-11-04 1996-04-09 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for achieving growth-etch deposition of diamond using a chopped oxygen-acetylene flame
US5852341A (en) * 1994-11-14 1998-12-22 Crystallume Diamond film with sharp field emission turn-on
JPH10130092A (ja) * 1996-10-22 1998-05-19 Toshiba Tungaloy Co Ltd ダイヤモンド被覆焼結合金
JPH10226597A (ja) * 1997-02-12 1998-08-25 Toshiba Tungaloy Co Ltd ダイヤモンド被覆硬質部材
JPH10287491A (ja) * 1997-04-10 1998-10-27 Toshiba Tungaloy Co Ltd 表面粗さを調整したダイヤモンド被覆硬質部材
JPH11347805A (ja) * 1998-06-11 1999-12-21 Toshiba Tungaloy Co Ltd ダイヤモンド被覆工具部材およびその製造方法
FR2798940B1 (fr) * 1999-09-03 2001-11-16 Barros Maria Isabel De Procede de fabrication d'une piece metallique recouverte de diamant et piece metallique obtenue au moyen d'un tel procede
WO2004031437A1 (de) * 2002-09-27 2004-04-15 Cemecon Ag Beschichtungsverfahren und beschichteter körper

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998035071A1 (en) * 1997-02-05 1998-08-13 Cemecon-Ceramic Metal Coatings-Dr.-Ing. Antonius Leyendecker Gmbh Hard material coating of a cemented carbide or carbide containing cermet substrate
WO2000060137A1 (en) * 1999-03-31 2000-10-12 Cemecon-Ceramic Metal Coatings-Dr.-Ing. Antonius Leyendecker Gmbh Diamond-coated tool and process for producing thereof
DE19922665A1 (de) * 1999-05-18 2000-11-23 Fraunhofer Ges Forschung Dreidimensionaler Grundkörper mit einer extrem glatten feinkristallinen Diamantschicht

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Ali, N.; Neto, V. F.; Gracio, J.: Promoting secondary nucleation using methane modulations during diamond chemical vapor deposition to produce smoother, harder, and better quality films. In: Journal of Materials Research, 2003, 296-304. Vol. 18, No. 2. *
Chen, K. H.; Bhusari, D. M.; Yang, J. R.; Lin, S. T.; Wang, T. Y.; Chen, L. C.: Highly transparent nano-crystalline diamond films via substrate pretreatment and methane fraction optimization. In: Thin Solid Films, 1998, 34-39. Vol. 332. *

Also Published As

Publication number Publication date
US20060219158A1 (en) 2006-10-05
JP2006521466A (ja) 2006-09-21
DE112004003154A5 (de) 2014-12-04
DE112004000452D2 (de) 2006-02-09
DE112004003154B4 (de) 2018-08-02
JP5084258B2 (ja) 2012-11-28
US7815735B2 (en) 2010-10-19
WO2004083484A1 (de) 2004-09-30

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