DE69131063T2 - Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre Verwendung - Google Patents
Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre VerwendungInfo
- Publication number
- DE69131063T2 DE69131063T2 DE69131063T DE69131063T DE69131063T2 DE 69131063 T2 DE69131063 T2 DE 69131063T2 DE 69131063 T DE69131063 T DE 69131063T DE 69131063 T DE69131063 T DE 69131063T DE 69131063 T2 DE69131063 T2 DE 69131063T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing process
- hard material
- material film
- film structure
- super hard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/272—Diamond only using DC, AC or RF discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/279—Diamond only control of diamond crystallography
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56530490A | 1990-08-10 | 1990-08-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69131063D1 DE69131063D1 (de) | 1999-05-06 |
DE69131063T2 true DE69131063T2 (de) | 1999-11-18 |
Family
ID=24258022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69131063T Expired - Fee Related DE69131063T2 (de) | 1990-08-10 | 1991-08-09 | Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre Verwendung |
Country Status (5)
Country | Link |
---|---|
US (2) | US5310596A (de) |
EP (2) | EP0470644B1 (de) |
JP (1) | JPH04232273A (de) |
CA (1) | CA2044543C (de) |
DE (1) | DE69131063T2 (de) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2924989B2 (ja) * | 1992-01-28 | 1999-07-26 | 日本特殊陶業株式会社 | ダイヤモンド膜被覆窒化珪素基部材及びその製造方法 |
EP0596619A1 (de) * | 1992-11-03 | 1994-05-11 | Crystallume | Diamantbeschichteter Gegenstand mit integriertem Verschleissanzeiger |
US5635254A (en) * | 1993-01-12 | 1997-06-03 | Martin Marietta Energy Systems, Inc. | Plasma spraying method for forming diamond and diamond-like coatings |
CA2112308C (en) * | 1993-01-22 | 2000-08-15 | Louis K. Bigelow | Method of making white diamond film |
US6835523B1 (en) * | 1993-05-09 | 2004-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus for fabricating coating and method of fabricating the coating |
US5932302A (en) | 1993-07-20 | 1999-08-03 | Semiconductor Energy Laboratory Co., Ltd. | Method for fabricating with ultrasonic vibration a carbon coating |
JP3774904B2 (ja) * | 1994-01-27 | 2006-05-17 | 住友電気工業株式会社 | 平坦なダイヤモンド膜の合成法とダイヤモンド自立膜及びダイヤモンド膜の研磨方法 |
US5453303A (en) * | 1994-07-22 | 1995-09-26 | The United States Of America As Represented By The United States Department Of Energy | Low substrate temperature deposition of diamond coatings derived from glassy carbon |
US5551959A (en) * | 1994-08-24 | 1996-09-03 | Minnesota Mining And Manufacturing Company | Abrasive article having a diamond-like coating layer and method for making same |
US5525815A (en) * | 1994-10-03 | 1996-06-11 | General Electric Company | Diamond film structure with high thermal conductivity |
US5445106A (en) * | 1994-10-03 | 1995-08-29 | General Electric Company | Method for making high thermal conducting diamond |
EP0752293B1 (de) * | 1995-07-05 | 1999-10-20 | Ngk Spark Plug Co., Ltd | Diamantbeschichteter Gegenstand und Verfahren zu seiner Herstellung |
US5672054A (en) * | 1995-12-07 | 1997-09-30 | Carrier Corporation | Rotary compressor with reduced lubrication sensitivity |
US5952102A (en) * | 1996-05-13 | 1999-09-14 | Ceramatec, Inc. | Diamond coated WC and WC-based composites with high apparent toughness |
US6080470A (en) * | 1996-06-17 | 2000-06-27 | Dorfman; Benjamin F. | Hard graphite-like material bonded by diamond-like framework |
US6395379B1 (en) | 1996-09-03 | 2002-05-28 | Balzers Aktiengesellschaft | Workpiece with wear-protective coating |
US5804259A (en) * | 1996-11-07 | 1998-09-08 | Applied Materials, Inc. | Method and apparatus for depositing a multilayered low dielectric constant film |
US6344149B1 (en) | 1998-11-10 | 2002-02-05 | Kennametal Pc Inc. | Polycrystalline diamond member and method of making the same |
FR2812665B1 (fr) * | 2000-08-01 | 2003-08-08 | Sidel Sa | Procede de depot de revetement par plasma, dispositif de mise en oeuvre du procede et revetement obtenu par un tel procede |
EP1182274A1 (de) * | 2000-08-26 | 2002-02-27 | PlasmOTec GmbH & Co. KG | Diamantbeschichtetes Hartmetall-Schneidwerkzeug und Verfahren zu seiner Herstellung |
DE10056242A1 (de) * | 2000-11-14 | 2002-05-23 | Alstom Switzerland Ltd | Kondensationswärmeübertrager |
DE10342397B4 (de) | 2003-09-13 | 2008-04-03 | Schott Ag | Transparente Schutzschicht für einen Körper und deren Verwendung |
JP4813040B2 (ja) * | 2004-10-13 | 2011-11-09 | 独立行政法人科学技術振興機構 | ダイヤモンド層の形成方法と、それを利用する多層硬質炭素膜の形成方法 |
DE102004061464B4 (de) | 2004-12-17 | 2008-12-11 | Schott Ag | Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung |
US7373997B2 (en) * | 2005-02-18 | 2008-05-20 | Smith International, Inc. | Layered hardfacing, durable hardfacing for drill bits |
US8946674B2 (en) * | 2005-08-31 | 2015-02-03 | University Of Florida Research Foundation, Inc. | Group III-nitrides on Si substrates using a nanostructured interlayer |
JP5161450B2 (ja) * | 2005-09-30 | 2013-03-13 | 財団法人高知県産業振興センター | プラズマcvd装置及びプラズマ表面処理方法 |
US8222057B2 (en) * | 2006-08-29 | 2012-07-17 | University Of Florida Research Foundation, Inc. | Crack free multilayered devices, methods of manufacture thereof and articles comprising the same |
US20080226838A1 (en) * | 2007-03-12 | 2008-09-18 | Kochi Industrial Promotion Center | Plasma CVD apparatus and film deposition method |
JP4533926B2 (ja) * | 2007-12-26 | 2010-09-01 | 財団法人高知県産業振興センター | 成膜装置及び成膜方法 |
US8899949B2 (en) * | 2009-09-18 | 2014-12-02 | Toshiba Carrier Corporation | Refrigerant compressor and refrigeration cycle apparatus |
JP2011080130A (ja) * | 2009-10-09 | 2011-04-21 | Osg Corp | ダイヤモンド被覆電極、およびダイヤモンド被覆電極の製造方法 |
US9382625B2 (en) * | 2014-05-01 | 2016-07-05 | Applied Materials, Inc. | Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition |
US10041304B2 (en) * | 2015-03-10 | 2018-08-07 | Halliburton Energy Services, Inc. | Polycrystalline diamond compacts and methods of manufacture |
JP6036948B2 (ja) * | 2015-09-14 | 2016-11-30 | 住友電気工業株式会社 | 導電層付き単結晶ダイヤモンドおよびそれを用いた工具、ならびに導電層付き単結晶ダイヤモンドの製造方法 |
DE102016122834A1 (de) | 2015-11-27 | 2017-06-01 | Cemecon Ag | Beschichtung eines Körpers mit Diamantschicht und Hartstoffschicht |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5131941A (en) * | 1959-04-08 | 1992-07-21 | Lemelson Jerome H | Reaction apparatus and method |
US3661526A (en) * | 1969-06-24 | 1972-05-09 | Univ Case Western Reserve | Process for the catalytic growth of metastable crystals from the vapor phase |
US4301134A (en) * | 1973-11-02 | 1981-11-17 | General Electric Company | Novel diamond products and the manufacture thereof |
US4698256A (en) * | 1984-04-02 | 1987-10-06 | American Cyanamid Company | Articles coated with adherent diamondlike carbon films |
SE453474B (sv) * | 1984-06-27 | 1988-02-08 | Santrade Ltd | Kompoundkropp belagd med skikt av polykristallin diamant |
SE442305B (sv) * | 1984-06-27 | 1985-12-16 | Santrade Ltd | Forfarande for kemisk gasutfellning (cvd) for framstellning av en diamantbelagd sammansatt kropp samt anvendning av kroppen |
JPS61106494A (ja) * | 1984-10-29 | 1986-05-24 | Kyocera Corp | ダイヤモンド被膜部材及びその製法 |
US4725345A (en) * | 1985-04-22 | 1988-02-16 | Kabushiki Kaisha Kenwood | Method for forming a hard carbon thin film on article and applications thereof |
JPH06951B2 (ja) * | 1986-02-20 | 1994-01-05 | 東芝タンガロイ株式会社 | 高密着性ダイヤモンド被覆部材 |
US4731296A (en) * | 1986-07-03 | 1988-03-15 | Mitsubishi Kinzoku Kabushiki Kaisha | Diamond-coated tungsten carbide-base sintered hard alloy material for insert of a cutting tool |
DE3706340A1 (de) * | 1987-02-27 | 1988-09-08 | Winter & Sohn Ernst | Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis |
DE3884653T2 (de) * | 1987-04-03 | 1994-02-03 | Fujitsu Ltd | Verfahren und Vorrichtung zur Gasphasenabscheidung von Diamant. |
JPH0779958B2 (ja) * | 1987-05-08 | 1995-08-30 | 住友電気工業株式会社 | 大型ダイヤモンドの合成方法 |
JP2603257B2 (ja) * | 1987-06-05 | 1997-04-23 | 株式会社神戸製鋼所 | ダイヤモンド多層薄膜 |
US4929489A (en) * | 1987-07-20 | 1990-05-29 | Dreschhoff Gisela A M | Method of making and using selective conductive regions in diamond layers |
ZA888034B (en) * | 1987-12-17 | 1989-06-28 | Gen Electric | Diamond growth process |
JP2610469B2 (ja) * | 1988-02-26 | 1997-05-14 | 株式会社 半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜を形成する方法 |
US4925701A (en) * | 1988-05-27 | 1990-05-15 | Xerox Corporation | Processes for the preparation of polycrystalline diamond films |
US5006203A (en) * | 1988-08-12 | 1991-04-09 | Texas Instruments Incorporated | Diamond growth method |
US4958592A (en) * | 1988-08-22 | 1990-09-25 | General Electric Company | Resistance heater for diamond production by CVD |
US4919974A (en) * | 1989-01-12 | 1990-04-24 | Ford Motor Company | Making diamond composite coated cutting tools |
US4988421A (en) * | 1989-01-12 | 1991-01-29 | Ford Motor Company | Method of toughening diamond coated tools |
US5135807A (en) * | 1989-03-10 | 1992-08-04 | Idemitsu Petrochemical Company Limited | Diamond-coated member and process for the preparation thereof |
US5023109A (en) * | 1989-09-06 | 1991-06-11 | General Atomics | Deposition of synthetic diamonds |
US5082359A (en) * | 1989-11-28 | 1992-01-21 | Epion Corporation | Diamond films and method of growing diamond films on nondiamond substrates |
US5169579A (en) * | 1989-12-04 | 1992-12-08 | Board Of Regents, The University Of Texas System | Catalyst and plasma assisted nucleation and renucleation of gas phase selective laser deposition |
US5017317A (en) * | 1989-12-04 | 1991-05-21 | Board Of Regents, The Uni. Of Texas System | Gas phase selective beam deposition |
US5114696A (en) * | 1990-08-06 | 1992-05-19 | Texas Instruments Incorporated | Diamond growth method |
US5242711A (en) * | 1991-08-16 | 1993-09-07 | Rockwell International Corp. | Nucleation control of diamond films by microlithographic patterning |
-
1991
- 1991-06-13 CA CA002044543A patent/CA2044543C/en not_active Expired - Fee Related
- 1991-07-29 JP JP3188837A patent/JPH04232273A/ja active Pending
- 1991-08-09 EP EP91113469A patent/EP0470644B1/de not_active Expired - Lifetime
- 1991-08-09 DE DE69131063T patent/DE69131063T2/de not_active Expired - Fee Related
- 1991-08-09 EP EP98114481A patent/EP0909835A1/de not_active Withdrawn
- 1991-12-18 US US07/810,364 patent/US5310596A/en not_active Expired - Fee Related
-
1993
- 1993-09-02 US US08/115,956 patent/US5518766A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5310596A (en) | 1994-05-10 |
DE69131063D1 (de) | 1999-05-06 |
US5518766A (en) | 1996-05-21 |
EP0909835A1 (de) | 1999-04-21 |
EP0470644A3 (de) | 1992-02-26 |
EP0470644A2 (de) | 1992-02-12 |
JPH04232273A (ja) | 1992-08-20 |
CA2044543C (en) | 1999-12-14 |
EP0470644B1 (de) | 1999-03-31 |
CA2044543A1 (en) | 1992-02-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: SAINT-GOBAIN ABRASIVES, INC., WORCESTER, MASS., US |
|
8339 | Ceased/non-payment of the annual fee |