DE1046785B - Verfahren zum Herstellen von Halbleitervorrichtungen mit UEbergaengen verschiedener Leitfaehigkeit oder verschiedenen Leitungstypen mittels Diffusion von Aktivatoren - Google Patents

Verfahren zum Herstellen von Halbleitervorrichtungen mit UEbergaengen verschiedener Leitfaehigkeit oder verschiedenen Leitungstypen mittels Diffusion von Aktivatoren

Info

Publication number
DE1046785B
DE1046785B DEW19150A DEW0019150A DE1046785B DE 1046785 B DE1046785 B DE 1046785B DE W19150 A DEW19150 A DE W19150A DE W0019150 A DEW0019150 A DE W0019150A DE 1046785 B DE1046785 B DE 1046785B
Authority
DE
Germany
Prior art keywords
semiconductor
glaze
silicon
conductive
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEW19150A
Other languages
German (de)
English (en)
Inventor
Calvin Souther Fuller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE1046785B publication Critical patent/DE1046785B/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B9/00—Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point
    • F25B9/002—Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point characterised by the refrigerant
    • F25B9/006—Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point characterised by the refrigerant the refrigerant containing more than one component
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/04—Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
    • H10D48/047—Application of an electrode to the exposed surface of the selenium or tellurium after the selenium or tellurium has been applied to foundation plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H10P32/1408—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
    • H10P32/141—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer comprising oxides only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00—Compositions
    • Y10S252/95—Doping agent source material

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Glass Compositions (AREA)
  • Photovoltaic Devices (AREA)
  • Devices That Are Associated With Refrigeration Equipment (AREA)
  • Resistance Heating (AREA)
DEW19150A 1955-06-28 1956-05-29 Verfahren zum Herstellen von Halbleitervorrichtungen mit UEbergaengen verschiedener Leitfaehigkeit oder verschiedenen Leitungstypen mittels Diffusion von Aktivatoren Pending DE1046785B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US518556A US2794846A (en) 1955-06-28 1955-06-28 Fabrication of semiconductor devices

Publications (1)

Publication Number Publication Date
DE1046785B true DE1046785B (de) 1958-12-18

Family

ID=24064454

Family Applications (1)

Application Number Title Priority Date Filing Date
DEW19150A Pending DE1046785B (de) 1955-06-28 1956-05-29 Verfahren zum Herstellen von Halbleitervorrichtungen mit UEbergaengen verschiedener Leitfaehigkeit oder verschiedenen Leitungstypen mittels Diffusion von Aktivatoren

Country Status (8)

Country Link
US (2) US2794322A (enExample)
JP (1) JPS321180B1 (enExample)
BE (1) BE548647A (enExample)
CH (1) CH361340A (enExample)
DE (1) DE1046785B (enExample)
FR (1) FR1154322A (enExample)
GB (1) GB816799A (enExample)
NL (2) NL207969A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
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DE1137140B (de) * 1959-04-06 1962-09-27 Int Standard Electric Corp Verfahren zum Herstellen von elektrischen Halbleiterbauelementen mit verminderter Oberflaechenleitfaehigkeit am p-n-UEbergang und verminderter Alterung
DE1232265B (de) * 1960-03-11 1967-01-12 Philips Patentverwaltung Verfahren zur Herstellung eines Legierungsdiffusionstransistors

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JP2016021589A (ja) * 2015-09-14 2016-02-04 日立化成株式会社 ｐ型拡散層形成組成物、ｐ型拡散層の製造方法、及び太陽電池素子の製造方法
JP2016027665A (ja) * 2015-09-28 2016-02-18 日立化成株式会社 ｐ型拡散層の製造方法、及び太陽電池素子の製造方法
JP2016036034A (ja) * 2015-09-28 2016-03-17 日立化成株式会社 ｎ型拡散層の製造方法、及び太陽電池素子の製造方法
CN106784137B (zh) * 2016-11-30 2019-07-09 浙江晶科能源有限公司 一种电池片pn结边缘隔离的装置和方法
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US2794322A (en) 1957-06-04
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GB816799A (en) 1959-07-22
US2794846A (en) 1957-06-04
JPS321180B1 (enExample) 1957-02-19
CH361340A (fr) 1962-04-15
NL99619C (enExample)
FR1154322A (fr) 1958-04-04

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