DE10211573A1 - Vakuumverdampfungseinrichtung - Google Patents
VakuumverdampfungseinrichtungInfo
- Publication number
- DE10211573A1 DE10211573A1 DE10211573A DE10211573A DE10211573A1 DE 10211573 A1 DE10211573 A1 DE 10211573A1 DE 10211573 A DE10211573 A DE 10211573A DE 10211573 A DE10211573 A DE 10211573A DE 10211573 A1 DE10211573 A1 DE 10211573A1
- Authority
- DE
- Germany
- Prior art keywords
- lubricant
- target object
- vacuum evaporation
- evaporation device
- distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000007738 vacuum evaporation Methods 0.000 title claims description 23
- 239000000314 lubricant Substances 0.000 claims abstract description 128
- 238000009826 distribution Methods 0.000 claims abstract description 51
- 238000000034 method Methods 0.000 claims abstract description 20
- 238000003860 storage Methods 0.000 claims description 27
- 238000001704 evaporation Methods 0.000 claims description 24
- 230000008020 evaporation Effects 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000001050 lubricating effect Effects 0.000 claims description 6
- 238000013500 data storage Methods 0.000 claims description 3
- 239000010702 perfluoropolyether Substances 0.000 claims description 3
- 239000004605 External Lubricant Substances 0.000 claims description 2
- 238000011049 filling Methods 0.000 claims description 2
- 238000002336 sorption--desorption measurement Methods 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 10
- 239000000654 additive Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010025 steaming Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- KEUKAQNPUBYCIC-UHFFFAOYSA-N ethaneperoxoic acid;hydrogen peroxide Chemical compound OO.CC(=O)OO KEUKAQNPUBYCIC-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012791 sliding layer Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000002156 adsorbate Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000002528 anti-freeze Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
- B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10211573A DE10211573A1 (de) | 2002-03-15 | 2002-03-15 | Vakuumverdampfungseinrichtung |
| US10/119,541 US7155115B2 (en) | 2002-03-15 | 2002-04-09 | Method and device for vacuum sputtering |
| IE20030185A IE20030185A1 (en) | 2002-03-15 | 2003-03-12 | Vacuum vaporization device |
| SG200301288A SG110028A1 (en) | 2002-03-15 | 2003-03-14 | Vacuum vaporization device |
| GB0305900A GB2389546A (en) | 2002-03-15 | 2003-03-14 | Vacuum vaporization device |
| JP2003072406A JP4384866B2 (ja) | 2002-03-15 | 2003-03-17 | 真空気化装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10211573A DE10211573A1 (de) | 2002-03-15 | 2002-03-15 | Vakuumverdampfungseinrichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10211573A1 true DE10211573A1 (de) | 2003-10-16 |
Family
ID=7714121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10211573A Withdrawn DE10211573A1 (de) | 2002-03-15 | 2002-03-15 | Vakuumverdampfungseinrichtung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7155115B2 (enExample) |
| JP (1) | JP4384866B2 (enExample) |
| DE (1) | DE10211573A1 (enExample) |
| GB (1) | GB2389546A (enExample) |
| IE (1) | IE20030185A1 (enExample) |
| SG (1) | SG110028A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9593407B2 (en) | 2011-10-21 | 2017-03-14 | Evatec Ag | Direct liquid deposition |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4344631B2 (ja) * | 2004-03-02 | 2009-10-14 | 長州産業株式会社 | 有機物薄膜堆積用分子線源 |
| KR101094001B1 (ko) * | 2005-07-20 | 2011-12-15 | 쵸슈 산교 가부시키가이샤 | 유기물 박막퇴적용 분자빔원 |
| US20080241366A1 (en) * | 2007-03-29 | 2008-10-02 | Intevac Corporation | Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter |
| US20080241367A1 (en) * | 2007-03-29 | 2008-10-02 | Intevac Corporation | Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter |
| US20090047417A1 (en) * | 2007-03-30 | 2009-02-19 | Barnes Michael S | Method and system for vapor phase application of lubricant in disk media manufacturing process |
| KR101046520B1 (ko) | 2007-09-07 | 2011-07-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 내부 챔버 상의 부산물 막 증착을 제어하기 위한 ｐｅｃｖｄ 시스템에서의 소스 가스 흐름 경로 제어 |
| JP2014075166A (ja) | 2012-10-04 | 2014-04-24 | Showa Denko Kk | 磁気記録媒体の製造方法及び装置 |
| JP6118114B2 (ja) | 2013-01-15 | 2017-04-19 | 昭和電工株式会社 | 磁気記録媒体の製造方法及び装置 |
| JP2014146400A (ja) | 2013-01-29 | 2014-08-14 | Showa Denko Kk | 磁気記録媒体の製造方法 |
| JP2014146401A (ja) | 2013-01-29 | 2014-08-14 | Showa Denko Kk | 磁気記録媒体の製造方法及び装置 |
| JP6118130B2 (ja) | 2013-02-25 | 2017-04-19 | 昭和電工株式会社 | 磁気記録媒体の製造方法及び装置 |
| JP6175265B2 (ja) | 2013-04-02 | 2017-08-02 | 昭和電工株式会社 | 磁気記録媒体の製造方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4125086A (en) * | 1977-01-06 | 1978-11-14 | The United States Of America As Represented By The Secretary Of The Army | Nozzle beam type metal vapor source |
| US4412508A (en) * | 1980-12-15 | 1983-11-01 | The United States Of America As Represented By The Secretary Of The Army | Nozzle beam source for vapor deposition |
| US4383645A (en) * | 1980-12-15 | 1983-05-17 | Allied Corporation | Vapor sprayer and process for providing a volatile fluid as a vapor spray |
| US4392453A (en) * | 1981-08-26 | 1983-07-12 | Varian Associates, Inc. | Molecular beam converters for vacuum coating systems |
| CH654596A5 (de) * | 1983-09-05 | 1986-02-28 | Balzers Hochvakuum | Verdampferzelle. |
| FR2562099B1 (fr) * | 1984-03-30 | 1986-06-20 | Commissariat Energie Atomique | Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires |
| JPS63310792A (ja) * | 1987-06-12 | 1988-12-19 | Nissin Electric Co Ltd | 分子線エピタキシ−装置の原料補給装置 |
| US5336324A (en) * | 1991-12-04 | 1994-08-09 | Emcore Corporation | Apparatus for depositing a coating on a substrate |
| DE4342574C1 (de) | 1993-12-14 | 1995-04-13 | Hilmar Weinert | Bandbedampfungsanlage |
| US5562965A (en) | 1995-06-07 | 1996-10-08 | Seagate Technologies, Inc. | Vapor lubrication of fractionated lubricant on thin film discs |
| US6011904A (en) * | 1997-06-10 | 2000-01-04 | Board Of Regents, University Of Texas | Molecular beam epitaxy effusion cell |
| GB2342100B (en) | 1997-07-25 | 2002-12-04 | Seagate Technology | Method and apparatus for zone lubrication of magnetic media |
| US6214410B1 (en) | 1997-09-09 | 2001-04-10 | Seagate Technology Llc | Vacuum assisted lubrication of magnetic recording media |
| JPH11172418A (ja) | 1997-12-12 | 1999-06-29 | Ulvac Corp | 成膜装置 |
| US6264751B1 (en) | 1998-05-18 | 2001-07-24 | Hoya Corporation | Mechanism for performing water repellency processing on both sides simultaneously |
| US6183831B1 (en) | 1998-08-20 | 2001-02-06 | Intevac, Inc. | Hard disk vapor lube |
| JP2000068055A (ja) * | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法 |
| JP4112702B2 (ja) | 1998-09-11 | 2008-07-02 | 株式会社アルバック | 成膜装置 |
| DE19843818A1 (de) * | 1998-09-24 | 2000-03-30 | Leybold Systems Gmbh | Bedampfungsvorrichtung für Vakuum-Bedampfungsanlagen |
| KR100368319B1 (ko) * | 1998-12-30 | 2003-03-17 | 주식회사 하이닉스반도체 | 액체운송장치 |
| JP2000200781A (ja) * | 1999-01-07 | 2000-07-18 | Ebara Corp | 液体原料気化装置及び方法 |
| JP3782255B2 (ja) | 1999-04-28 | 2006-06-07 | 株式会社アルバック | 有機化合物用の蒸着源、及び蒸着装置 |
| US6596085B1 (en) * | 2000-02-01 | 2003-07-22 | Applied Materials, Inc. | Methods and apparatus for improved vaporization of deposition material in a substrate processing system |
-
2002
- 2002-03-15 DE DE10211573A patent/DE10211573A1/de not_active Withdrawn
- 2002-04-09 US US10/119,541 patent/US7155115B2/en not_active Expired - Fee Related
-
2003
- 2003-03-12 IE IE20030185A patent/IE20030185A1/en not_active IP Right Cessation
- 2003-03-14 SG SG200301288A patent/SG110028A1/en unknown
- 2003-03-14 GB GB0305900A patent/GB2389546A/en not_active Withdrawn
- 2003-03-17 JP JP2003072406A patent/JP4384866B2/ja not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9593407B2 (en) | 2011-10-21 | 2017-03-14 | Evatec Ag | Direct liquid deposition |
| US10066287B2 (en) | 2011-10-21 | 2018-09-04 | Evatec Ag | Direct liquid deposition |
Also Published As
| Publication number | Publication date |
|---|---|
| US7155115B2 (en) | 2006-12-26 |
| GB0305900D0 (en) | 2003-04-23 |
| IE20030185A1 (en) | 2003-09-17 |
| JP2004002971A (ja) | 2004-01-08 |
| SG110028A1 (en) | 2005-04-28 |
| US20030175422A1 (en) | 2003-09-18 |
| JP4384866B2 (ja) | 2009-12-16 |
| GB2389546A (en) | 2003-12-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OR8 | Request for search as to paragraph 43 lit. 1 sentence 1 patent law | ||
| 8105 | Search report available | ||
| 8127 | New person/name/address of the applicant |
Owner name: OC OERLIKON BALZERS AG, BALZERS, LI |
|
| 8128 | New person/name/address of the agent |
Representative=s name: BOCKHORNI & KOLLEGEN, 80687 MUENCHEN |
|
| 8141 | Disposal/no request for examination |