DE102013202518A1 - P-Typ-Halbleitermaterial und Halbleitervorrichtung - Google Patents
P-Typ-Halbleitermaterial und Halbleitervorrichtung Download PDFInfo
- Publication number
- DE102013202518A1 DE102013202518A1 DE102013202518A DE102013202518A DE102013202518A1 DE 102013202518 A1 DE102013202518 A1 DE 102013202518A1 DE 102013202518 A DE102013202518 A DE 102013202518A DE 102013202518 A DE102013202518 A DE 102013202518A DE 102013202518 A1 DE102013202518 A1 DE 102013202518A1
- Authority
- DE
- Germany
- Prior art keywords
- silicon substrate
- silicon
- oxide
- semiconductor layer
- molybdenum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 411
- 239000000463 material Substances 0.000 title claims abstract description 121
- 229910000476 molybdenum oxide Inorganic materials 0.000 claims abstract description 115
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 claims abstract description 115
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims abstract description 90
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000000203 mixture Substances 0.000 claims abstract description 44
- 229910052710 silicon Inorganic materials 0.000 claims description 404
- 239000010703 silicon Substances 0.000 claims description 404
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 403
- 239000000758 substrate Substances 0.000 claims description 301
- 239000012535 impurity Substances 0.000 claims description 80
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 13
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 7
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 claims description 7
- 229910017073 AlLi Inorganic materials 0.000 claims description 6
- 229910052684 Cerium Inorganic materials 0.000 claims description 6
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 6
- 229910017911 MgIn Inorganic materials 0.000 claims description 6
- 229910052779 Neodymium Inorganic materials 0.000 claims description 6
- 229910052772 Samarium Inorganic materials 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- 229910052746 lanthanum Inorganic materials 0.000 claims description 6
- AHLBNYSZXLDEJQ-FWEHEUNISA-N orlistat Chemical compound CCCCCCCCCCC[C@H](OC(=O)[C@H](CC(C)C)NC=O)C[C@@H]1OC(=O)[C@H]1CCCCCC AHLBNYSZXLDEJQ-FWEHEUNISA-N 0.000 claims description 6
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 354
- 238000006243 chemical reaction Methods 0.000 description 186
- 239000010408 film Substances 0.000 description 175
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 71
- 229910052814 silicon oxide Inorganic materials 0.000 description 65
- 238000000034 method Methods 0.000 description 41
- 238000002161 passivation Methods 0.000 description 40
- 238000005036 potential barrier Methods 0.000 description 39
- 238000009792 diffusion process Methods 0.000 description 30
- 230000006870 function Effects 0.000 description 29
- 238000005452 bending Methods 0.000 description 23
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 22
- 239000000969 carrier Substances 0.000 description 22
- 238000005215 recombination Methods 0.000 description 21
- 230000006798 recombination Effects 0.000 description 21
- 239000002585 base Substances 0.000 description 20
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 19
- 230000031700 light absorption Effects 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 17
- 238000001704 evaporation Methods 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 15
- 229910052709 silver Inorganic materials 0.000 description 15
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 14
- 230000000694 effects Effects 0.000 description 13
- 238000004544 sputter deposition Methods 0.000 description 13
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- 239000010409 thin film Substances 0.000 description 12
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 11
- 229910021417 amorphous silicon Inorganic materials 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- 238000010248 power generation Methods 0.000 description 11
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 11
- 229910001887 tin oxide Inorganic materials 0.000 description 11
- 239000011787 zinc oxide Substances 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 10
- 239000002253 acid Substances 0.000 description 10
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 10
- 239000004332 silver Substances 0.000 description 10
- 229910052581 Si3N4 Inorganic materials 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 230000007547 defect Effects 0.000 description 9
- 230000008020 evaporation Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- 239000011733 molybdenum Substances 0.000 description 7
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 7
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000011800 void material Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 230000002349 favourable effect Effects 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 229960000583 acetic acid Drugs 0.000 description 5
- 235000011054 acetic acid Nutrition 0.000 description 5
- 229910052787 antimony Inorganic materials 0.000 description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 5
- 239000002800 charge carrier Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000004020 conductor Substances 0.000 description 5
- 229910021419 crystalline silicon Inorganic materials 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 229910017604 nitric acid Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000005641 tunneling Effects 0.000 description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 229910052733 gallium Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229910021389 graphene Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910003437 indium oxide Inorganic materials 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 229910007541 Zn O Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010549 co-Evaporation Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- -1 CuAlO 2 Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 230000010748 Photoabsorption Effects 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000006388 chemical passivation reaction Methods 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000003863 metallic catalyst Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012032659 | 2012-02-17 | ||
| JP2012-032644 | 2012-02-17 | ||
| JP2012-032659 | 2012-02-17 | ||
| JP2012032644 | 2012-02-17 | ||
| JP2012-092002 | 2012-04-13 | ||
| JP2012092002 | 2012-04-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013202518A1 true DE102013202518A1 (de) | 2013-08-22 |
Family
ID=48915409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013202518A Ceased DE102013202518A1 (de) | 2012-02-17 | 2013-02-15 | P-Typ-Halbleitermaterial und Halbleitervorrichtung |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8772770B2 (https=) |
| JP (2) | JP6108858B2 (https=) |
| DE (1) | DE102013202518A1 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5826094B2 (ja) * | 2012-03-30 | 2015-12-02 | 株式会社半導体エネルギー研究所 | p型半導体材料、および光電変換装置の作製方法 |
| WO2013179444A1 (ja) * | 2012-05-31 | 2013-12-05 | 三洋電機株式会社 | テクスチャサイズの測定装置、太陽電池の製造システム、及び太陽電池の製造方法 |
| KR101458566B1 (ko) * | 2013-05-21 | 2014-11-07 | 재단법인대구경북과학기술원 | 정류소자 및 그의 제조 방법 |
| KR101457812B1 (ko) * | 2013-08-19 | 2014-11-05 | 포항공과대학교 산학협력단 | 양방향 스위칭 특성을 갖는 2-단자 스위칭 소자, 이의 제조방법 및 이를 포함하는 저항성 메모리 소자 크로스-포인트 어레이 |
| JP6567539B2 (ja) * | 2013-11-04 | 2019-08-28 | コロンバス・フォトヴォルテイクス・リミテッド・ライアビリティ・カンパニー | 光起電力セル、回路、及び方法 |
| KR20160052270A (ko) * | 2014-11-04 | 2016-05-12 | 엘지전자 주식회사 | 태양 전지 |
| US10566483B2 (en) | 2015-03-17 | 2020-02-18 | Lg Electronics Inc. | Solar cell |
| US20160351733A1 (en) * | 2015-06-01 | 2016-12-01 | International Business Machines Corporation | Dry etch method for texturing silicon and device |
| US20170098722A1 (en) * | 2015-10-01 | 2017-04-06 | Lg Electronics Inc. | Solar cell |
| CN109643660B (zh) * | 2016-08-31 | 2024-03-05 | 株式会社Flosfia | p-型氧化物半导体及其制造方法 |
| US20190305149A1 (en) * | 2016-10-25 | 2019-10-03 | Shin-Etsu Chemical Co., Ltd. | Solar cell with high photoelectric conversion efficiency and method for manufacturing solar cell with high photoelectric conversion efficiency |
| CN109891604A (zh) | 2016-10-25 | 2019-06-14 | 信越化学工业株式会社 | 高光电变换效率太阳能电池及高光电变换效率太阳能电池的制造方法 |
| KR101995833B1 (ko) * | 2016-11-14 | 2019-07-03 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR102704085B1 (ko) * | 2017-01-20 | 2024-09-06 | 트리나 솔라 컴패니 리미티드 | 이종 접합 태양전지 및 이의 제조 방법 |
| KR102514785B1 (ko) * | 2017-05-19 | 2023-03-29 | 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 | 태양 전지 및 이의 제조 방법 |
| WO2019159236A1 (ja) * | 2018-02-13 | 2019-08-22 | シャープ株式会社 | 発光素子、発光デバイス、発光素子の製造装置 |
| CN108389929A (zh) * | 2018-04-11 | 2018-08-10 | 浙江师范大学 | 一种选择性接触晶体硅异质结太阳能电池及其制备方法 |
| CN108878570B (zh) * | 2018-06-01 | 2020-06-26 | 上海大学 | 空穴选择型MoOx/SiOx(Mo)/n-Si异质结、太阳电池器件及其制备方法 |
| AU2019290813B2 (en) * | 2018-06-22 | 2022-07-28 | Jingao Solar Co., Ltd. | Crystalline silicon solar cell and preparation method therefor, and photovoltaic assembly |
| CN113193062A (zh) * | 2021-04-13 | 2021-07-30 | Tcl华星光电技术有限公司 | 光电传感器及其制作方法、显示面板 |
| WO2023062846A1 (ja) * | 2021-10-15 | 2023-04-20 | ソニーセミコンダクタソリューションズ株式会社 | 光電変換素子及び撮像装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007096055A (ja) | 2005-09-29 | 2007-04-12 | Semiconductor Energy Lab Co Ltd | 半導体装置、及び半導体装置の作製方法 |
| JP2007123861A (ja) | 2005-09-29 | 2007-05-17 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法 |
| JP2012032659A (ja) | 2010-07-30 | 2012-02-16 | Canon Inc | 画像形成装置 |
| JP2012032644A (ja) | 2010-07-30 | 2012-02-16 | Fujifilm Corp | 放射線撮影装置 |
| JP2012092002A (ja) | 2010-09-29 | 2012-05-17 | Sekisui Chem Co Ltd | スラリー組成物の製造方法 |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0795603B2 (ja) | 1990-09-20 | 1995-10-11 | 三洋電機株式会社 | 光起電力装置 |
| JP3106810B2 (ja) | 1993-11-04 | 2000-11-06 | 富士電機株式会社 | 非晶質酸化シリコン薄膜の生成方法 |
| AU2671795A (en) | 1994-06-02 | 1996-01-04 | Boehringer Mannheim Gmbh | Process and intermediate products for preparing cardiodilatin fragments, and highly purified cardiodilatin fragments |
| JP3469729B2 (ja) | 1996-10-31 | 2003-11-25 | 三洋電機株式会社 | 太陽電池素子 |
| JP4662616B2 (ja) | 2000-10-18 | 2011-03-30 | パナソニック株式会社 | 太陽電池 |
| JP2004214300A (ja) | 2002-12-27 | 2004-07-29 | National Institute Of Advanced Industrial & Technology | ヘテロ接合を有する太陽電池 |
| JP2004342678A (ja) | 2003-05-13 | 2004-12-02 | Rikogaku Shinkokai | Cu(In1−xGax)Se2膜の製造方法及び太陽電池 |
| JP4519423B2 (ja) * | 2003-05-30 | 2010-08-04 | 創世理工株式会社 | 半導体を用いた光デバイス |
| JP4351869B2 (ja) * | 2003-06-10 | 2009-10-28 | 隆 河東田 | 半導体を用いた電子デバイス |
| CA2533110A1 (en) * | 2003-07-22 | 2005-05-06 | H.C. Starck Inc. | Method of making m002 powders, products made from m002 powders, deposition of m002 thin films, and methods of using such materials |
| JP4169671B2 (ja) * | 2003-09-24 | 2008-10-22 | 三洋電機株式会社 | 光起電力素子の製造方法 |
| JP2005109360A (ja) | 2003-10-01 | 2005-04-21 | National Institute Of Advanced Industrial & Technology | ヘテロ接合太陽電池 |
| JP2005243378A (ja) * | 2004-02-26 | 2005-09-08 | Kyocera Corp | 光電変換装置 |
| JP2006013028A (ja) | 2004-06-24 | 2006-01-12 | National Institute Of Advanced Industrial & Technology | 化合物太陽電池及びその製造方法 |
| JP4576201B2 (ja) * | 2004-10-26 | 2010-11-04 | 創世理工株式会社 | 三酸化モリブデン層の作製方法 |
| US7989694B2 (en) | 2004-12-06 | 2011-08-02 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion element, solar battery, and photo sensor |
| EP1998373A3 (en) | 2005-09-29 | 2012-10-31 | Semiconductor Energy Laboratory Co, Ltd. | Semiconductor device having oxide semiconductor layer and manufacturing method thereof |
| US20070277875A1 (en) | 2006-05-31 | 2007-12-06 | Kishor Purushottam Gadkaree | Thin film photovoltaic structure |
| US20070277874A1 (en) | 2006-05-31 | 2007-12-06 | David Francis Dawson-Elli | Thin film photovoltaic structure |
| US20090139558A1 (en) | 2007-11-29 | 2009-06-04 | Shunpei Yamazaki | Photoelectric conversion device and manufacturing method thereof |
| JP5286046B2 (ja) | 2007-11-30 | 2013-09-11 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| EP2075850A3 (en) | 2007-12-28 | 2011-08-24 | Semiconductor Energy Laboratory Co, Ltd. | Photoelectric conversion device and manufacturing method thereof |
| US8222516B2 (en) * | 2008-02-20 | 2012-07-17 | Sunpower Corporation | Front contact solar cell with formed emitter |
| JP2009231610A (ja) * | 2008-03-24 | 2009-10-08 | Pioneer Electronic Corp | 有機太陽電池及び有機太陽電池の製造方法 |
| JP4829926B2 (ja) * | 2008-05-29 | 2011-12-07 | 本田技研工業株式会社 | 太陽電池及び太陽電池の製造方法 |
| WO2010062643A1 (en) * | 2008-10-28 | 2010-06-03 | The Regents Of The University Of Michigan | Stacked white oled having separate red, green and blue sub-elements |
| JP5760334B2 (ja) * | 2009-06-19 | 2015-08-05 | 大日本印刷株式会社 | 有機電子デバイス及びその製造方法 |
| JP2011009419A (ja) * | 2009-06-25 | 2011-01-13 | Konica Minolta Holdings Inc | 太陽電池ユニットとその製造方法 |
| US9214576B2 (en) * | 2010-06-09 | 2015-12-15 | Solarcity Corporation | Transparent conducting oxide for photovoltaic devices |
| JP2012023343A (ja) | 2010-06-18 | 2012-02-02 | Semiconductor Energy Lab Co Ltd | 光電変換装置及びその作製方法 |
| JP5894379B2 (ja) | 2010-06-18 | 2016-03-30 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
| KR20120095790A (ko) | 2011-02-21 | 2012-08-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 |
| KR20120095786A (ko) | 2011-02-21 | 2012-08-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 |
| US20120211065A1 (en) | 2011-02-21 | 2012-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| US20120234392A1 (en) | 2011-03-17 | 2012-09-20 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| US9159939B2 (en) | 2011-07-21 | 2015-10-13 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| JP2013058562A (ja) | 2011-09-07 | 2013-03-28 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
-
2013
- 2013-02-13 JP JP2013025334A patent/JP6108858B2/ja active Active
- 2013-02-15 US US13/768,233 patent/US8772770B2/en not_active Expired - Fee Related
- 2013-02-15 DE DE102013202518A patent/DE102013202518A1/de not_active Ceased
-
2014
- 2014-07-03 US US14/323,575 patent/US9159793B2/en active Active
-
2017
- 2017-03-07 JP JP2017042612A patent/JP6329660B2/ja not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007096055A (ja) | 2005-09-29 | 2007-04-12 | Semiconductor Energy Lab Co Ltd | 半導体装置、及び半導体装置の作製方法 |
| JP2007123861A (ja) | 2005-09-29 | 2007-05-17 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法 |
| JP2012032659A (ja) | 2010-07-30 | 2012-02-16 | Canon Inc | 画像形成装置 |
| JP2012032644A (ja) | 2010-07-30 | 2012-02-16 | Fujifilm Corp | 放射線撮影装置 |
| JP2012092002A (ja) | 2010-09-29 | 2012-05-17 | Sekisui Chem Co Ltd | スラリー組成物の製造方法 |
Non-Patent Citations (2)
| Title |
|---|
| C. Osterwald, G. Cheek, J. B. DuBow und V. R. Pai Vernerker, "Molybdenum Trioxide(MoO3)/Silicon Photodiodes (Molybdäntrioxid(MoO3)/Slizium-Photodioden)", Appl. Phys. Lett., Vol. 35, Nr. 10, 15. November 1979 |
| J. Shewchun, J. Dubow, C. W. Wilmsen, R. Singh, D. Burk und J. F. Wager, "The Operation of the Semiconductor-Insulator-Semiconductor Solar Cell: Experiment (Bedienung der Halbleiter-Isolator-Halbleiter-Solarzelle: Experiment)", J. Appl. Phys., Vol. 50, Nr. 4, April 1979 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8772770B2 (en) | 2014-07-08 |
| US20150001535A1 (en) | 2015-01-01 |
| JP2013234106A (ja) | 2013-11-21 |
| JP2017143279A (ja) | 2017-08-17 |
| JP6329660B2 (ja) | 2018-05-23 |
| US20130214271A1 (en) | 2013-08-22 |
| US9159793B2 (en) | 2015-10-13 |
| JP6108858B2 (ja) | 2017-04-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102013202518A1 (de) | P-Typ-Halbleitermaterial und Halbleitervorrichtung | |
| Chen et al. | Carrier recombination suppression and transport enhancement enable high‐performance self‐powered broadband Sb2Se3 photodetectors | |
| Balasubramani et al. | Colossal photosensitive boost in Schottky diode behaviour with Ce-V2O5 interfaced layer of MIS structure | |
| EP3378104B1 (de) | Solarzelle mit mehreren durch ladungsträger-selektive kontakte miteinander verbundenen absorbern | |
| DE202023103922U1 (de) | Solarzelle und Photovoltaikmodul | |
| US8889464B2 (en) | Method for manufacturing solar cell | |
| Raj et al. | Indium phosphide based solar cell using ultra-thin ZnO as an electron selective layer | |
| DE112012003057T5 (de) | Verfahren zum Stabilisieren von hydriertem, amorphem Silicium und amorphen, hydrierten Siliciumlegierungen | |
| DE2639841B2 (de) | Solarzelle und Verfahren zu ihrer Herstellung | |
| DE102012209713A1 (de) | Verbesserter Kontakt für Silicium-Heterojunction-Solarzellen | |
| DE102011018268A1 (de) | Single Junction CIGS/CIC Solar Module | |
| JP7102504B2 (ja) | 太陽電池、多接合型太陽電池、太陽電池モジュール及び太陽光発電システム | |
| Jin et al. | Tunable photovoltaic effect and solar cell performance of self-doped perovskite SrTiO3 | |
| Takabe et al. | Influence of air exposure duration and a-Si capping layer thickness on the performance of p-BaSi2/n-Si heterojunction solar cells | |
| DE202008009492U1 (de) | Halbleitermaterial und dessen Verwendung als Absorptionsmaterial für Solarzellen | |
| Artegiani et al. | A new method for CdSexTe1-x band grading for high efficiency thin-absorber CdTe solar cells | |
| Artegiani et al. | Analysis of magnesium zinc oxide layers for high efficiency CdTe devices | |
| JP5826094B2 (ja) | p型半導体材料、および光電変換装置の作製方法 | |
| Caglar et al. | Improving the electrical performance of NiO based photodiode fabricated by sol-gel process with Al doping | |
| Ko et al. | Nitrogen-doped ZnO/n-Si core–shell nanowire photodiode prepared by atomic layer deposition | |
| DE112012001058B4 (de) | Verfahren zur herstellung einer tandem-photovoltaikeinheit | |
| Boulahia et al. | Electrical and optical performances investigation of planar solar blind photodetector based on IZTO/Ga2O3 Schottky diode via TCAD simulation | |
| DE102012104616B4 (de) | Verfahren zum Bilden einer Fensterschicht in einer Dünnschicht-Photovoltaikvorrichtung auf Cadmiumtelluridbasis | |
| US20110265875A1 (en) | Copper and indium based photovoltaic devices and associated methods | |
| Shin et al. | Characterization of Cu (In, Ga) Se2 solar cells grown on Na-free glass with an NaF layer on a Mo film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |