DE102013202518A1 - P-Typ-Halbleitermaterial und Halbleitervorrichtung - Google Patents

P-Typ-Halbleitermaterial und Halbleitervorrichtung Download PDF

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Publication number
DE102013202518A1
DE102013202518A1 DE102013202518A DE102013202518A DE102013202518A1 DE 102013202518 A1 DE102013202518 A1 DE 102013202518A1 DE 102013202518 A DE102013202518 A DE 102013202518A DE 102013202518 A DE102013202518 A DE 102013202518A DE 102013202518 A1 DE102013202518 A1 DE 102013202518A1
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Prior art keywords
silicon substrate
silicon
oxide
semiconductor layer
molybdenum
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Ceased
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DE102013202518A
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German (de)
English (en)
Inventor
Yoshinobu Asami
Riho KATAISHI
Erumu Kikuchi
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of DE102013202518A1 publication Critical patent/DE102013202518A1/de
Ceased legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82Heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/164Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Photovoltaic Devices (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
DE102013202518A 2012-02-17 2013-02-15 P-Typ-Halbleitermaterial und Halbleitervorrichtung Ceased DE102013202518A1 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2012032659 2012-02-17
JP2012-032644 2012-02-17
JP2012-032659 2012-02-17
JP2012032644 2012-02-17
JP2012-092002 2012-04-13
JP2012092002 2012-04-13

Publications (1)

Publication Number Publication Date
DE102013202518A1 true DE102013202518A1 (de) 2013-08-22

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DE102013202518A Ceased DE102013202518A1 (de) 2012-02-17 2013-02-15 P-Typ-Halbleitermaterial und Halbleitervorrichtung

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US (2) US8772770B2 (https=)
JP (2) JP6108858B2 (https=)
DE (1) DE102013202518A1 (https=)

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WO2013179444A1 (ja) * 2012-05-31 2013-12-05 三洋電機株式会社 テクスチャサイズの測定装置、太陽電池の製造システム、及び太陽電池の製造方法
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KR101457812B1 (ko) * 2013-08-19 2014-11-05 포항공과대학교 산학협력단 양방향 스위칭 특성을 갖는 2-단자 스위칭 소자, 이의 제조방법 및 이를 포함하는 저항성 메모리 소자 크로스-포인트 어레이
JP6567539B2 (ja) * 2013-11-04 2019-08-28 コロンバス・フォトヴォルテイクス・リミテッド・ライアビリティ・カンパニー 光起電力セル、回路、及び方法
KR20160052270A (ko) * 2014-11-04 2016-05-12 엘지전자 주식회사 태양 전지
US10566483B2 (en) 2015-03-17 2020-02-18 Lg Electronics Inc. Solar cell
US20160351733A1 (en) * 2015-06-01 2016-12-01 International Business Machines Corporation Dry etch method for texturing silicon and device
US20170098722A1 (en) * 2015-10-01 2017-04-06 Lg Electronics Inc. Solar cell
CN109643660B (zh) * 2016-08-31 2024-03-05 株式会社Flosfia p-型氧化物半导体及其制造方法
US20190305149A1 (en) * 2016-10-25 2019-10-03 Shin-Etsu Chemical Co., Ltd. Solar cell with high photoelectric conversion efficiency and method for manufacturing solar cell with high photoelectric conversion efficiency
CN109891604A (zh) 2016-10-25 2019-06-14 信越化学工业株式会社 高光电变换效率太阳能电池及高光电变换效率太阳能电池的制造方法
KR101995833B1 (ko) * 2016-11-14 2019-07-03 엘지전자 주식회사 태양 전지 및 이의 제조 방법
KR102704085B1 (ko) * 2017-01-20 2024-09-06 트리나 솔라 컴패니 리미티드 이종 접합 태양전지 및 이의 제조 방법
KR102514785B1 (ko) * 2017-05-19 2023-03-29 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 태양 전지 및 이의 제조 방법
WO2019159236A1 (ja) * 2018-02-13 2019-08-22 シャープ株式会社 発光素子、発光デバイス、発光素子の製造装置
CN108389929A (zh) * 2018-04-11 2018-08-10 浙江师范大学 一种选择性接触晶体硅异质结太阳能电池及其制备方法
CN108878570B (zh) * 2018-06-01 2020-06-26 上海大学 空穴选择型MoOx/SiOx(Mo)/n-Si异质结、太阳电池器件及其制备方法
AU2019290813B2 (en) * 2018-06-22 2022-07-28 Jingao Solar Co., Ltd. Crystalline silicon solar cell and preparation method therefor, and photovoltaic assembly
CN113193062A (zh) * 2021-04-13 2021-07-30 Tcl华星光电技术有限公司 光电传感器及其制作方法、显示面板
WO2023062846A1 (ja) * 2021-10-15 2023-04-20 ソニーセミコンダクタソリューションズ株式会社 光電変換素子及び撮像装置

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Publication number Publication date
US8772770B2 (en) 2014-07-08
US20150001535A1 (en) 2015-01-01
JP2013234106A (ja) 2013-11-21
JP2017143279A (ja) 2017-08-17
JP6329660B2 (ja) 2018-05-23
US20130214271A1 (en) 2013-08-22
US9159793B2 (en) 2015-10-13
JP6108858B2 (ja) 2017-04-05

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