JP6108858B2 - p型半導体材料および半導体装置 - Google Patents
p型半導体材料および半導体装置 Download PDFInfo
- Publication number
- JP6108858B2 JP6108858B2 JP2013025334A JP2013025334A JP6108858B2 JP 6108858 B2 JP6108858 B2 JP 6108858B2 JP 2013025334 A JP2013025334 A JP 2013025334A JP 2013025334 A JP2013025334 A JP 2013025334A JP 6108858 B2 JP6108858 B2 JP 6108858B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- silicon substrate
- oxide
- semiconductor layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013025334A JP6108858B2 (ja) | 2012-02-17 | 2013-02-13 | p型半導体材料および半導体装置 |
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012032659 | 2012-02-17 | ||
| JP2012032659 | 2012-02-17 | ||
| JP2012032644 | 2012-02-17 | ||
| JP2012032644 | 2012-02-17 | ||
| JP2012092002 | 2012-04-13 | ||
| JP2012092002 | 2012-04-13 | ||
| JP2013025334A JP6108858B2 (ja) | 2012-02-17 | 2013-02-13 | p型半導体材料および半導体装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017042612A Division JP6329660B2 (ja) | 2012-02-17 | 2017-03-07 | 光電変換装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013234106A JP2013234106A (ja) | 2013-11-21 |
| JP2013234106A5 JP2013234106A5 (https=) | 2016-02-25 |
| JP6108858B2 true JP6108858B2 (ja) | 2017-04-05 |
Family
ID=48915409
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013025334A Active JP6108858B2 (ja) | 2012-02-17 | 2013-02-13 | p型半導体材料および半導体装置 |
| JP2017042612A Expired - Fee Related JP6329660B2 (ja) | 2012-02-17 | 2017-03-07 | 光電変換装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017042612A Expired - Fee Related JP6329660B2 (ja) | 2012-02-17 | 2017-03-07 | 光電変換装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8772770B2 (https=) |
| JP (2) | JP6108858B2 (https=) |
| DE (1) | DE102013202518A1 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5826094B2 (ja) * | 2012-03-30 | 2015-12-02 | 株式会社半導体エネルギー研究所 | p型半導体材料、および光電変換装置の作製方法 |
| WO2013179444A1 (ja) * | 2012-05-31 | 2013-12-05 | 三洋電機株式会社 | テクスチャサイズの測定装置、太陽電池の製造システム、及び太陽電池の製造方法 |
| KR101458566B1 (ko) * | 2013-05-21 | 2014-11-07 | 재단법인대구경북과학기술원 | 정류소자 및 그의 제조 방법 |
| KR101457812B1 (ko) * | 2013-08-19 | 2014-11-05 | 포항공과대학교 산학협력단 | 양방향 스위칭 특성을 갖는 2-단자 스위칭 소자, 이의 제조방법 및 이를 포함하는 저항성 메모리 소자 크로스-포인트 어레이 |
| JP6567539B2 (ja) * | 2013-11-04 | 2019-08-28 | コロンバス・フォトヴォルテイクス・リミテッド・ライアビリティ・カンパニー | 光起電力セル、回路、及び方法 |
| KR20160052270A (ko) * | 2014-11-04 | 2016-05-12 | 엘지전자 주식회사 | 태양 전지 |
| US10566483B2 (en) | 2015-03-17 | 2020-02-18 | Lg Electronics Inc. | Solar cell |
| US20160351733A1 (en) * | 2015-06-01 | 2016-12-01 | International Business Machines Corporation | Dry etch method for texturing silicon and device |
| US20170098722A1 (en) * | 2015-10-01 | 2017-04-06 | Lg Electronics Inc. | Solar cell |
| CN109643660B (zh) * | 2016-08-31 | 2024-03-05 | 株式会社Flosfia | p-型氧化物半导体及其制造方法 |
| US20190305149A1 (en) * | 2016-10-25 | 2019-10-03 | Shin-Etsu Chemical Co., Ltd. | Solar cell with high photoelectric conversion efficiency and method for manufacturing solar cell with high photoelectric conversion efficiency |
| CN109891604A (zh) | 2016-10-25 | 2019-06-14 | 信越化学工业株式会社 | 高光电变换效率太阳能电池及高光电变换效率太阳能电池的制造方法 |
| KR101995833B1 (ko) * | 2016-11-14 | 2019-07-03 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR102704085B1 (ko) * | 2017-01-20 | 2024-09-06 | 트리나 솔라 컴패니 리미티드 | 이종 접합 태양전지 및 이의 제조 방법 |
| KR102514785B1 (ko) * | 2017-05-19 | 2023-03-29 | 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 | 태양 전지 및 이의 제조 방법 |
| WO2019159236A1 (ja) * | 2018-02-13 | 2019-08-22 | シャープ株式会社 | 発光素子、発光デバイス、発光素子の製造装置 |
| CN108389929A (zh) * | 2018-04-11 | 2018-08-10 | 浙江师范大学 | 一种选择性接触晶体硅异质结太阳能电池及其制备方法 |
| CN108878570B (zh) * | 2018-06-01 | 2020-06-26 | 上海大学 | 空穴选择型MoOx/SiOx(Mo)/n-Si异质结、太阳电池器件及其制备方法 |
| AU2019290813B2 (en) * | 2018-06-22 | 2022-07-28 | Jingao Solar Co., Ltd. | Crystalline silicon solar cell and preparation method therefor, and photovoltaic assembly |
| CN113193062A (zh) * | 2021-04-13 | 2021-07-30 | Tcl华星光电技术有限公司 | 光电传感器及其制作方法、显示面板 |
| WO2023062846A1 (ja) * | 2021-10-15 | 2023-04-20 | ソニーセミコンダクタソリューションズ株式会社 | 光電変換素子及び撮像装置 |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0795603B2 (ja) | 1990-09-20 | 1995-10-11 | 三洋電機株式会社 | 光起電力装置 |
| JP3106810B2 (ja) | 1993-11-04 | 2000-11-06 | 富士電機株式会社 | 非晶質酸化シリコン薄膜の生成方法 |
| AU2671795A (en) | 1994-06-02 | 1996-01-04 | Boehringer Mannheim Gmbh | Process and intermediate products for preparing cardiodilatin fragments, and highly purified cardiodilatin fragments |
| JP3469729B2 (ja) | 1996-10-31 | 2003-11-25 | 三洋電機株式会社 | 太陽電池素子 |
| JP4662616B2 (ja) | 2000-10-18 | 2011-03-30 | パナソニック株式会社 | 太陽電池 |
| JP2004214300A (ja) | 2002-12-27 | 2004-07-29 | National Institute Of Advanced Industrial & Technology | ヘテロ接合を有する太陽電池 |
| JP2004342678A (ja) | 2003-05-13 | 2004-12-02 | Rikogaku Shinkokai | Cu(In1−xGax)Se2膜の製造方法及び太陽電池 |
| JP4519423B2 (ja) * | 2003-05-30 | 2010-08-04 | 創世理工株式会社 | 半導体を用いた光デバイス |
| JP4351869B2 (ja) * | 2003-06-10 | 2009-10-28 | 隆 河東田 | 半導体を用いた電子デバイス |
| CA2533110A1 (en) * | 2003-07-22 | 2005-05-06 | H.C. Starck Inc. | Method of making m002 powders, products made from m002 powders, deposition of m002 thin films, and methods of using such materials |
| JP4169671B2 (ja) * | 2003-09-24 | 2008-10-22 | 三洋電機株式会社 | 光起電力素子の製造方法 |
| JP2005109360A (ja) | 2003-10-01 | 2005-04-21 | National Institute Of Advanced Industrial & Technology | ヘテロ接合太陽電池 |
| JP2005243378A (ja) * | 2004-02-26 | 2005-09-08 | Kyocera Corp | 光電変換装置 |
| JP2006013028A (ja) | 2004-06-24 | 2006-01-12 | National Institute Of Advanced Industrial & Technology | 化合物太陽電池及びその製造方法 |
| JP4576201B2 (ja) * | 2004-10-26 | 2010-11-04 | 創世理工株式会社 | 三酸化モリブデン層の作製方法 |
| US7989694B2 (en) | 2004-12-06 | 2011-08-02 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion element, solar battery, and photo sensor |
| JP5064747B2 (ja) | 2005-09-29 | 2012-10-31 | 株式会社半導体エネルギー研究所 | 半導体装置、電気泳動表示装置、表示モジュール、電子機器、及び半導体装置の作製方法 |
| EP1998373A3 (en) | 2005-09-29 | 2012-10-31 | Semiconductor Energy Laboratory Co, Ltd. | Semiconductor device having oxide semiconductor layer and manufacturing method thereof |
| JP5078246B2 (ja) | 2005-09-29 | 2012-11-21 | 株式会社半導体エネルギー研究所 | 半導体装置、及び半導体装置の作製方法 |
| US20070277875A1 (en) | 2006-05-31 | 2007-12-06 | Kishor Purushottam Gadkaree | Thin film photovoltaic structure |
| US20070277874A1 (en) | 2006-05-31 | 2007-12-06 | David Francis Dawson-Elli | Thin film photovoltaic structure |
| US20090139558A1 (en) | 2007-11-29 | 2009-06-04 | Shunpei Yamazaki | Photoelectric conversion device and manufacturing method thereof |
| JP5286046B2 (ja) | 2007-11-30 | 2013-09-11 | 株式会社半導体エネルギー研究所 | 光電変換装置の製造方法 |
| EP2075850A3 (en) | 2007-12-28 | 2011-08-24 | Semiconductor Energy Laboratory Co, Ltd. | Photoelectric conversion device and manufacturing method thereof |
| US8222516B2 (en) * | 2008-02-20 | 2012-07-17 | Sunpower Corporation | Front contact solar cell with formed emitter |
| JP2009231610A (ja) * | 2008-03-24 | 2009-10-08 | Pioneer Electronic Corp | 有機太陽電池及び有機太陽電池の製造方法 |
| JP4829926B2 (ja) * | 2008-05-29 | 2011-12-07 | 本田技研工業株式会社 | 太陽電池及び太陽電池の製造方法 |
| WO2010062643A1 (en) * | 2008-10-28 | 2010-06-03 | The Regents Of The University Of Michigan | Stacked white oled having separate red, green and blue sub-elements |
| JP5760334B2 (ja) * | 2009-06-19 | 2015-08-05 | 大日本印刷株式会社 | 有機電子デバイス及びその製造方法 |
| JP2011009419A (ja) * | 2009-06-25 | 2011-01-13 | Konica Minolta Holdings Inc | 太陽電池ユニットとその製造方法 |
| US9214576B2 (en) * | 2010-06-09 | 2015-12-15 | Solarcity Corporation | Transparent conducting oxide for photovoltaic devices |
| JP2012023343A (ja) | 2010-06-18 | 2012-02-02 | Semiconductor Energy Lab Co Ltd | 光電変換装置及びその作製方法 |
| JP5894379B2 (ja) | 2010-06-18 | 2016-03-30 | 株式会社半導体エネルギー研究所 | 光電変換装置 |
| JP5729935B2 (ja) | 2010-07-30 | 2015-06-03 | キヤノン株式会社 | 画像形成装置 |
| JP2012032644A (ja) | 2010-07-30 | 2012-02-16 | Fujifilm Corp | 放射線撮影装置 |
| JP2012092002A (ja) | 2010-09-29 | 2012-05-17 | Sekisui Chem Co Ltd | スラリー組成物の製造方法 |
| KR20120095790A (ko) | 2011-02-21 | 2012-08-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 |
| KR20120095786A (ko) | 2011-02-21 | 2012-08-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 |
| US20120211065A1 (en) | 2011-02-21 | 2012-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| US20120234392A1 (en) | 2011-03-17 | 2012-09-20 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| US9159939B2 (en) | 2011-07-21 | 2015-10-13 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device |
| JP2013058562A (ja) | 2011-09-07 | 2013-03-28 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
-
2013
- 2013-02-13 JP JP2013025334A patent/JP6108858B2/ja active Active
- 2013-02-15 US US13/768,233 patent/US8772770B2/en not_active Expired - Fee Related
- 2013-02-15 DE DE102013202518A patent/DE102013202518A1/de not_active Ceased
-
2014
- 2014-07-03 US US14/323,575 patent/US9159793B2/en active Active
-
2017
- 2017-03-07 JP JP2017042612A patent/JP6329660B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US8772770B2 (en) | 2014-07-08 |
| US20150001535A1 (en) | 2015-01-01 |
| JP2013234106A (ja) | 2013-11-21 |
| JP2017143279A (ja) | 2017-08-17 |
| JP6329660B2 (ja) | 2018-05-23 |
| US20130214271A1 (en) | 2013-08-22 |
| DE102013202518A1 (de) | 2013-08-22 |
| US9159793B2 (en) | 2015-10-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6329660B2 (ja) | 光電変換装置 | |
| CN1862840B (zh) | 表面钝化的光生伏打器件 | |
| US9508875B2 (en) | Solar cell and method for manufacturing the same | |
| Du et al. | Preparation of ITO/SiOx/n-Si solar cells with non-decline potential field and hole tunneling by magnetron sputtering | |
| CN103107228B (zh) | 光电转换装置 | |
| TWI435454B (zh) | 太陽能電池 | |
| CN102074593A (zh) | 太阳能电池 | |
| KR20150114792A (ko) | 초박형 hit 태양전지 및 그 제조방법 | |
| US20100200059A1 (en) | Dual-side light-absorbing thin film solar cell | |
| WO2020059053A1 (ja) | 太陽電池、多接合型太陽電池、太陽電池モジュール及び太陽光発電システム | |
| JP5826094B2 (ja) | p型半導体材料、および光電変換装置の作製方法 | |
| CN114041209B (zh) | 光电转换层、太阳能电池、多结太阳能电池、太阳能电池组件和光伏发电系统 | |
| Zhang et al. | Efficient photovoltaic devices based on p-ZnSe/n-CdS core–shell heterojunctions with high open-circuit voltage | |
| CN102347382A (zh) | 光伏器件 | |
| US12125926B2 (en) | Semiconductor device and solar cell and production method for semiconductor device | |
| US20130180577A1 (en) | Photoelectric conversion device | |
| US20230207718A1 (en) | Solar cell, method for manufacturing solar cell, multi-junction solar cell, solar cell module, and photovoltaic power generation system | |
| JP5980059B2 (ja) | 太陽電池 | |
| KR101172188B1 (ko) | 알칼리 안티몬 화합물로 이루어진 pn 접합소자, 이의 제조 방법 및 이를 이용한 태양광소자 | |
| KR101195040B1 (ko) | 태양전지 및 태양전지 제조방법 | |
| Montgomery et al. | Development of ZnO-InP heterojunction solar cells for thin film photovoltaics | |
| Bullock et al. | Proof-of-concept p-type silicon solar cells with molybdenum oxide partial rear contacts | |
| Bag et al. | Interlayer thickness dependence of photovoltaic properties of polycrystalline p-β-FeSi2 (Al)/n-Si (100) heterojunctions | |
| US20200091365A1 (en) | Solar cell, multi-junction solar cell, solar cell module, and solar power generation system | |
| TW201801339A (zh) | 光發電元件 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160106 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160106 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161129 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161206 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170120 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170207 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170307 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6108858 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |