DD152532A5 - Verfahren zur herstellung eines elektrisch leitenden artikels - Google Patents
Verfahren zur herstellung eines elektrisch leitenden artikels Download PDFInfo
- Publication number
- DD152532A5 DD152532A5 DD80222969A DD22296980A DD152532A5 DD 152532 A5 DD152532 A5 DD 152532A5 DD 80222969 A DD80222969 A DD 80222969A DD 22296980 A DD22296980 A DD 22296980A DD 152532 A5 DD152532 A5 DD 152532A5
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- item
- coating
- hydrogen
- glass
- substrate
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 239000011521 glass Substances 0.000 claims abstract description 70
- 238000000576 coating method Methods 0.000 claims abstract description 41
- 239000011248 coating agent Substances 0.000 claims abstract description 39
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 35
- 239000001257 hydrogen Substances 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 32
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000012159 carrier gas Substances 0.000 claims abstract description 25
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 19
- 239000007789 gas Substances 0.000 claims abstract description 18
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 8
- 239000011707 mineral Substances 0.000 claims abstract description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000002310 reflectometry Methods 0.000 claims abstract description 7
- 239000000919 ceramic Substances 0.000 claims abstract description 6
- 239000012790 adhesive layer Substances 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims abstract description 5
- 239000000126 substance Substances 0.000 claims abstract description 4
- 239000003039 volatile agent Substances 0.000 claims abstract description 4
- 239000010410 layer Substances 0.000 claims description 40
- 238000006243 chemical reaction Methods 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 32
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 20
- 230000008569 process Effects 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000000376 reactant Substances 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 8
- 239000003638 chemical reducing agent Substances 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 238000005137 deposition process Methods 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 3
- 230000009471 action Effects 0.000 claims description 2
- 238000005452 bending Methods 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 230000003071 parasitic effect Effects 0.000 claims description 2
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 2
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 239000010431 corundum Substances 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 238000005229 chemical vapour deposition Methods 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000002253 acid Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 150000003606 tin compounds Chemical class 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000008246 gaseous mixture Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- JUGDWSNYRIPJGE-UHFFFAOYSA-N 1-[acetyl(dibutyl)stannyl]ethanone Chemical compound CCCC[Sn](C(C)=O)(C(C)=O)CCCC JUGDWSNYRIPJGE-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- HYHSBSXUHZOYLX-WDSKDSINSA-N S-nitrosoglutathione Chemical compound OC(=O)[C@@H](N)CCC(=O)N[C@@H](CSN=O)C(=O)NCC(O)=O HYHSBSXUHZOYLX-WDSKDSINSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910008433 SnCU Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241000724822 Teia Species 0.000 description 1
- -1 Tin (IV) Compounds Chemical class 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000701 coagulant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- BAQKJENAVQLANS-UHFFFAOYSA-N fenbutrazate Chemical compound C=1C=CC=CC=1C(CC)C(=O)OCCN(C1C)CCOC1C1=CC=CC=C1 BAQKJENAVQLANS-UHFFFAOYSA-N 0.000 description 1
- 229960002533 fenbutrazate Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000003898 horticulture Methods 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 238000012946 outsourcing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Joining Of Glass To Other Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH703379 | 1979-07-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD152532A5 true DD152532A5 (de) | 1981-12-02 |
Family
ID=4318887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD80222969A DD152532A5 (de) | 1979-07-31 | 1980-07-30 | Verfahren zur herstellung eines elektrisch leitenden artikels |
Country Status (15)
| Country | Link |
|---|---|
| EP (1) | EP0023471B1 (ko) |
| JP (1) | JPS5624708A (ko) |
| KR (1) | KR830002390B1 (ko) |
| AU (1) | AU535981B2 (ko) |
| BR (1) | BR8004742A (ko) |
| CA (1) | CA1159723A (ko) |
| CS (1) | CS218598B2 (ko) |
| DD (1) | DD152532A5 (ko) |
| DE (1) | DE3068519D1 (ko) |
| ES (1) | ES8106268A1 (ko) |
| IT (1) | IT1132003B (ko) |
| MX (1) | MX152941A (ko) |
| PL (1) | PL124263B1 (ko) |
| TR (1) | TR21531A (ko) |
| ZA (1) | ZA804151B (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4419570A (en) * | 1980-03-03 | 1983-12-06 | Societa Italiana Vetro - Siv - S.P.A. | Heating glass pane |
| CH643469A5 (fr) * | 1981-12-22 | 1984-06-15 | Siv Soc Italiana Vetro | Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide. |
| US6602606B1 (en) | 1999-05-18 | 2003-08-05 | Nippon Sheet Glass Co., Ltd. | Glass sheet with conductive film, method of manufacturing the same, and photoelectric conversion device using the same |
| US8800482B2 (en) | 2005-12-29 | 2014-08-12 | Exatec Llc | Apparatus and method of dispensing conductive material with active Z-axis control |
| US20080099456A1 (en) * | 2006-10-25 | 2008-05-01 | Schwenke Robert A | Dispensing method for variable line volume |
| EP2229282A1 (en) | 2007-12-31 | 2010-09-22 | Exatec, LLC. | Apparatus and method for printing three-dimensional articles |
| KR101933727B1 (ko) * | 2013-08-26 | 2018-12-31 | 연세대학교 산학협력단 | 원자층 증착법으로 산화물 박막의 일부를 할로겐 원소로 도핑할 수 있는 할로겐 도핑 소스, 상기 할로겐 도핑 소스의 제조 방법, 상기 할로겐 원소 소스를 이용하여 원자층 증착법으로 산화물 박막의 일부를 할로겐으로 도핑하는 방법, 및 상기 방법을 이용하여 형성된 할로겐 원소가 도핑된 산화물 박막 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2566346A (en) * | 1948-09-08 | 1951-09-04 | Pittsburgh Plate Glass Co | Electroconductive products and production thereof |
| GB702774A (en) * | 1951-05-08 | 1954-01-20 | Pittsburgh Plate Glass Co | Electro-conductive products and production thereof |
| NL222116A (ko) * | 1957-11-04 | |||
| JPS539066B2 (ko) * | 1975-03-25 | 1978-04-03 | ||
| JPS5825090B2 (ja) * | 1975-05-08 | 1983-05-25 | 松下電器産業株式会社 | トウメイドウデンセイヒマクオユウスル コウブンシセイケイブツノセイゾウホウホウ |
| JPS5941242B2 (ja) * | 1976-12-13 | 1984-10-05 | 帝人株式会社 | 金属酸化物被膜を設ける方法 |
| FR2380997A1 (fr) * | 1977-02-16 | 1978-09-15 | Saint Gobain | Procede de fabrication de vitrages protegeant de la chaleur |
| JPS6036940B2 (ja) * | 1977-04-15 | 1985-08-23 | 帝人株式会社 | 被膜の形成方法 |
| US4317884A (en) * | 1977-10-05 | 1982-03-02 | Snamprogetti S.P.A. | Method for the production of yeast on ethanol and means therefor |
| JPS6133904A (ja) * | 1984-07-18 | 1986-02-18 | 荻原 正博 | シ−ル機 |
-
1980
- 1980-07-07 MX MX183070A patent/MX152941A/es unknown
- 1980-07-10 ZA ZA00804151A patent/ZA804151B/xx unknown
- 1980-07-28 TR TR21531A patent/TR21531A/xx unknown
- 1980-07-28 IT IT23751/80A patent/IT1132003B/it active
- 1980-07-28 DE DE8080810236T patent/DE3068519D1/de not_active Expired
- 1980-07-28 EP EP80810236A patent/EP0023471B1/fr not_active Expired
- 1980-07-29 AU AU60867/80A patent/AU535981B2/en not_active Ceased
- 1980-07-29 BR BR8004742A patent/BR8004742A/pt not_active IP Right Cessation
- 1980-07-29 CA CA000357200A patent/CA1159723A/en not_active Expired
- 1980-07-30 JP JP10376680A patent/JPS5624708A/ja active Pending
- 1980-07-30 DD DD80222969A patent/DD152532A5/de not_active IP Right Cessation
- 1980-07-30 ES ES493840A patent/ES8106268A1/es not_active Expired
- 1980-07-30 PL PL1980225974A patent/PL124263B1/pl unknown
- 1980-07-30 CS CS805337A patent/CS218598B2/cs unknown
- 1980-07-31 KR KR1019800003057A patent/KR830002390B1/ko active
Also Published As
| Publication number | Publication date |
|---|---|
| CA1159723A (en) | 1984-01-03 |
| ES493840A0 (es) | 1981-08-01 |
| KR830003376A (ko) | 1983-06-20 |
| DE3068519D1 (en) | 1984-08-16 |
| CS218598B2 (en) | 1983-02-25 |
| MX152941A (es) | 1986-07-04 |
| ZA804151B (en) | 1981-07-29 |
| EP0023471A1 (fr) | 1981-02-04 |
| ES8106268A1 (es) | 1981-08-01 |
| KR830002390B1 (ko) | 1983-10-25 |
| AU6086780A (en) | 1981-02-05 |
| PL225974A1 (ko) | 1981-05-08 |
| BR8004742A (pt) | 1981-02-10 |
| PL124263B1 (en) | 1983-01-31 |
| AU535981B2 (en) | 1984-04-12 |
| EP0023471B1 (fr) | 1984-07-11 |
| IT1132003B (it) | 1986-06-25 |
| IT8023751A0 (it) | 1980-07-28 |
| TR21531A (tr) | 1984-08-15 |
| JPS5624708A (en) | 1981-03-09 |
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