CN207474470U - 半导体器件 - Google Patents

半导体器件 Download PDF

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Publication number
CN207474470U
CN207474470U CN201721135203.7U CN201721135203U CN207474470U CN 207474470 U CN207474470 U CN 207474470U CN 201721135203 U CN201721135203 U CN 201721135203U CN 207474470 U CN207474470 U CN 207474470U
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CN
China
Prior art keywords
region
contact
gate electrode
emitter electrode
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn - After Issue
Application number
CN201721135203.7U
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English (en)
Chinese (zh)
Inventor
松尾隆充
松浦仁
齐藤靖之
星野义典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Electronics Corp
Original Assignee
Renesas Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Electronics Corp filed Critical Renesas Electronics Corp
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Publication of CN207474470U publication Critical patent/CN207474470U/zh
Withdrawn - After Issue legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H10D12/441—Vertical IGBTs
    • H10D12/461—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H10D12/481—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/01—Manufacture or treatment
    • H10D12/031—Manufacture or treatment of IGBTs
    • H10D12/032—Manufacture or treatment of IGBTs of vertical IGBTs
    • H10D12/035—Etching a recess in the emitter region 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/01—Manufacture or treatment
    • H10D12/031—Manufacture or treatment of IGBTs
    • H10D12/032—Manufacture or treatment of IGBTs of vertical IGBTs
    • H10D12/038—Manufacture or treatment of IGBTs of vertical IGBTs having a recessed gate, e.g. trench-gate IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H10D12/441—Vertical IGBTs
    • H10D12/461—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/393—Body regions of DMOS transistors or IGBTs 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/512—Disposition of the gate electrodes, e.g. buried gates
    • H10D64/513—Disposition of the gate electrodes, e.g. buried gates within recesses in the substrate, e.g. trench gates, groove gates or buried gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/518—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their lengths or sectional shapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs

Landscapes

  • Electrodes Of Semiconductors (AREA)
CN201721135203.7U 2016-09-12 2017-09-06 半导体器件 Withdrawn - After Issue CN207474470U (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016177746A JP6786316B2 (ja) 2016-09-12 2016-09-12 半導体装置の製造方法
JP2016-177746 2016-09-12

Publications (1)

Publication Number Publication Date
CN207474470U true CN207474470U (zh) 2018-06-08

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN201721135203.7U Withdrawn - After Issue CN207474470U (zh) 2016-09-12 2017-09-06 半导体器件
CN201710794982.XA Active CN107819032B (zh) 2016-09-12 2017-09-06 半导体器件及其制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201710794982.XA Active CN107819032B (zh) 2016-09-12 2017-09-06 半导体器件及其制造方法

Country Status (5)

Country Link
US (1) US10600896B2 (cg-RX-API-DMAC7.html)
EP (2) EP3293770A1 (cg-RX-API-DMAC7.html)
JP (1) JP6786316B2 (cg-RX-API-DMAC7.html)
CN (2) CN207474470U (cg-RX-API-DMAC7.html)
TW (1) TWI717551B (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107819032A (zh) * 2016-09-12 2018-03-20 瑞萨电子株式会社 半导体器件及其制造方法

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Publication number Priority date Publication date Assignee Title
JP7125339B2 (ja) 2018-12-26 2022-08-24 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
EP3863062B1 (en) * 2020-02-07 2025-05-21 Infineon Technologies Austria AG Semiconductor transistor device and method of manufacturing the same
JP7475265B2 (ja) * 2020-12-14 2024-04-26 三菱電機株式会社 半導体装置及び半導体装置の製造方法
KR102861154B1 (ko) 2021-02-22 2025-09-17 삼성전자주식회사 반도체 장치
CN113178474A (zh) * 2021-03-02 2021-07-27 华为技术有限公司 半导体器件及其制作方法、及电子设备
CN114496910A (zh) * 2022-01-10 2022-05-13 上海华虹宏力半导体制造有限公司 双接触孔实现方法
JP7731320B2 (ja) * 2022-05-17 2025-08-29 ルネサスエレクトロニクス株式会社 半導体装置の製造方法

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JP4205128B2 (ja) * 1996-04-11 2009-01-07 三菱電機株式会社 高耐圧半導体装置およびその製造方法
DE19651108C2 (de) 1996-04-11 2000-11-23 Mitsubishi Electric Corp Halbleitereinrichtung des Gategrabentyps mit hoher Durchbruchsspannung und ihr Herstellungsverfahren
JP2005057028A (ja) * 2003-08-04 2005-03-03 Sanken Electric Co Ltd 絶縁ゲート型バイポーラトランジスタ
JP2007207930A (ja) 2006-01-31 2007-08-16 Toshiba Corp 残渣処理システム、残渣処理方法及び半導体装置の製造方法
JP2010505270A (ja) * 2006-09-27 2010-02-18 マックスパワー・セミコンダクター・インコーポレイテッド 窪んだフィールドプレートを備えたパワーｍｏｓｆｅｔ
US8264033B2 (en) * 2009-07-21 2012-09-11 Infineon Technologies Austria Ag Semiconductor device having a floating semiconductor zone
US20130164895A1 (en) * 2011-12-12 2013-06-27 Maxpower Semiconductor, Inc. Trench-Gated Power Devices with Two Types of Trenches and Reliable Polycidation
JP5973730B2 (ja) * 2012-01-05 2016-08-23 ルネサスエレクトロニクス株式会社 Ｉｅ型トレンチゲートｉｇｂｔ
US8946002B2 (en) * 2012-07-24 2015-02-03 Semiconductor Components Industries, Llc Method of forming a semiconductor device having a patterned gate dielectric and structure therefor
JP6190206B2 (ja) * 2012-08-21 2017-08-30 ローム株式会社 半導体装置
JP6284314B2 (ja) * 2012-08-21 2018-02-28 ローム株式会社 半導体装置
JP5900243B2 (ja) * 2012-08-23 2016-04-06 住友電気工業株式会社 炭化珪素半導体装置の製造方法
JP2014075483A (ja) * 2012-10-04 2014-04-24 Sanken Electric Co Ltd 半導体装置及び半導体装置の製造方法
US9666663B2 (en) * 2013-08-09 2017-05-30 Infineon Technologies Ag Semiconductor device with cell trench structures and contacts and method of manufacturing a semiconductor device
JP6354458B2 (ja) * 2014-08-27 2018-07-11 富士電機株式会社 半導体装置
JP5758058B1 (ja) 2015-03-23 2015-08-05 株式会社コーチ・エィ コーチング支援システム、コーチング支援方法、およびコーチング支援プログラム
JP6472714B2 (ja) * 2015-06-03 2019-02-20 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP6584893B2 (ja) * 2015-09-25 2019-10-02 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
JP6786316B2 (ja) * 2016-09-12 2020-11-18 ルネサスエレクトロニクス株式会社 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107819032A (zh) * 2016-09-12 2018-03-20 瑞萨电子株式会社 半导体器件及其制造方法
CN107819032B (zh) * 2016-09-12 2023-10-24 瑞萨电子株式会社 半导体器件及其制造方法

Also Published As

Publication number Publication date
EP3483940A1 (en) 2019-05-15
US20180076308A1 (en) 2018-03-15
TW201826541A (zh) 2018-07-16
TWI717551B (zh) 2021-02-01
US10600896B2 (en) 2020-03-24
JP2018046053A (ja) 2018-03-22
EP3483940B1 (en) 2020-07-22
CN107819032A (zh) 2018-03-20
JP6786316B2 (ja) 2020-11-18
EP3293770A1 (en) 2018-03-14
CN107819032B (zh) 2023-10-24

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