CN1901204A - 薄膜晶体管基底、显示装置及其制造方法 - Google Patents
薄膜晶体管基底、显示装置及其制造方法 Download PDFInfo
- Publication number
- CN1901204A CN1901204A CNA2006100653732A CN200610065373A CN1901204A CN 1901204 A CN1901204 A CN 1901204A CN A2006100653732 A CNA2006100653732 A CN A2006100653732A CN 200610065373 A CN200610065373 A CN 200610065373A CN 1901204 A CN1901204 A CN 1901204A
- Authority
- CN
- China
- Prior art keywords
- line
- data line
- thin film
- film transistor
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136213—Storage capacitors associated with the pixel electrode
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020050066864 | 2005-07-22 | ||
| KR1020050066864A KR101138429B1 (ko) | 2005-07-22 | 2005-07-22 | 박막 트랜지스터 기판 및 그 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1901204A true CN1901204A (zh) | 2007-01-24 |
Family
ID=37657015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006100653732A Pending CN1901204A (zh) | 2005-07-22 | 2006-03-23 | 薄膜晶体管基底、显示装置及其制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20070018168A1 (enExample) |
| JP (1) | JP2007036196A (enExample) |
| KR (1) | KR101138429B1 (enExample) |
| CN (1) | CN1901204A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102402090A (zh) * | 2011-12-05 | 2012-04-04 | 深圳市华星光电技术有限公司 | 一种阵列基板及液晶显示装置、阵列基板的制造方法 |
| US9728413B2 (en) | 2013-09-22 | 2017-08-08 | Boe Technology Group Co., Ltd. | Method for preparing film patterns |
| CN112735281A (zh) * | 2021-01-15 | 2021-04-30 | 武汉华星光电技术有限公司 | 显示面板 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20070059668A (ko) * | 2005-12-07 | 2007-06-12 | 엘지.필립스 엘시디 주식회사 | 액정표시장치 |
| JP5521270B2 (ja) * | 2007-02-21 | 2014-06-11 | 凸版印刷株式会社 | 薄膜トランジスタアレイ、薄膜トランジスタアレイの製造方法、および薄膜トランジスタアレイを用いたアクティブマトリクス型ディスプレイ |
| KR102026927B1 (ko) * | 2012-12-24 | 2019-10-01 | 엘지디스플레이 주식회사 | 구동부를 포함하는 표시장치 |
| TWI581436B (zh) * | 2014-06-16 | 2017-05-01 | 元太科技工業股份有限公司 | 基板結構及其製作方法 |
| CN104516133B (zh) * | 2015-01-27 | 2017-12-29 | 深圳市华星光电技术有限公司 | 阵列基板及该阵列基板的断线修补方法 |
| KR102542186B1 (ko) * | 2016-04-04 | 2023-06-13 | 삼성디스플레이 주식회사 | 표시 장치 |
| CN110620154A (zh) * | 2019-08-22 | 2019-12-27 | 合肥鑫晟光电科技有限公司 | 薄膜晶体管及其制备方法、阵列基板、显示面板及装置 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4368523A (en) * | 1979-12-20 | 1983-01-11 | Tokyo Shibaura Denki Kabushiki Kaisha | Liquid crystal display device having redundant pairs of address buses |
| FR2585167B1 (fr) * | 1985-07-19 | 1993-05-07 | Gen Electric | Structures conductrices redondantes pour affichages a cristaux liquides commandes par des transistors a effet de champ en couche mince |
| JPH03245126A (ja) * | 1990-02-23 | 1991-10-31 | Hitachi Ltd | 薄膜トランジスタパネル |
| US5715025A (en) * | 1993-02-22 | 1998-02-03 | Goldstar Co., Ltd. | Active matrix for liquid crystal displays in which a data bus consists of two data subbuses and each data subbus is separated from an adjacent data bus by one display electrode |
| US5708483A (en) * | 1993-07-13 | 1998-01-13 | Kabushiki Kaisha Toshiba | Active matrix type display device |
| KR0139319B1 (ko) * | 1994-11-14 | 1998-06-15 | 김광호 | 한 화소에 이중배선과 복수의 트랜지스터를 구비한 액정 표시 장치 |
| JPH1039333A (ja) * | 1996-07-19 | 1998-02-13 | Sharp Corp | アクティブマトリクス型表示装置およびその欠陥修正方法 |
| KR100521256B1 (ko) * | 1998-03-20 | 2006-01-12 | 삼성전자주식회사 | 쌍 박막 트랜지스터를 적용한 액정 표시 장치용 박막 트랜지스터 기판 |
| JPH11288000A (ja) * | 1998-04-06 | 1999-10-19 | Hitachi Ltd | 液晶表示装置 |
| KR100289538B1 (ko) * | 1998-05-20 | 2001-06-01 | 김순택 | 박막트랜지스터 액정표시소자의 배선 레이아웃 |
| JP4118485B2 (ja) * | 2000-03-13 | 2008-07-16 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| KR100370800B1 (ko) * | 2000-06-09 | 2003-02-05 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 어레이기판 제작방법 |
| JP4570278B2 (ja) * | 2000-08-28 | 2010-10-27 | シャープ株式会社 | アクティブマトリクス基板 |
| JP2003107523A (ja) * | 2001-09-28 | 2003-04-09 | Hitachi Ltd | 液晶表示装置 |
| US6862052B2 (en) * | 2001-12-14 | 2005-03-01 | Samsung Electronics Co., Ltd. | Liquid crystal display, thin film transistor array panel for liquid crystal display and manufacturing method thereof |
| JP2003186035A (ja) * | 2001-12-19 | 2003-07-03 | Hitachi Ltd | 液晶表示装置 |
| KR100965155B1 (ko) * | 2003-06-12 | 2010-06-23 | 삼성전자주식회사 | 액정표시장치 및 그 리페어 방법 |
| KR20050003739A (ko) * | 2003-07-04 | 2005-01-12 | 김재훈 | 액정표시장치 및 이의 제조방법 |
-
2005
- 2005-07-22 KR KR1020050066864A patent/KR101138429B1/ko not_active Expired - Lifetime
-
2006
- 2006-02-16 US US11/355,765 patent/US20070018168A1/en not_active Abandoned
- 2006-03-23 CN CNA2006100653732A patent/CN1901204A/zh active Pending
- 2006-05-24 JP JP2006144575A patent/JP2007036196A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102402090A (zh) * | 2011-12-05 | 2012-04-04 | 深圳市华星光电技术有限公司 | 一种阵列基板及液晶显示装置、阵列基板的制造方法 |
| CN102402090B (zh) * | 2011-12-05 | 2014-05-14 | 深圳市华星光电技术有限公司 | 一种阵列基板及液晶显示装置、阵列基板的制造方法 |
| US9728413B2 (en) | 2013-09-22 | 2017-08-08 | Boe Technology Group Co., Ltd. | Method for preparing film patterns |
| CN112735281A (zh) * | 2021-01-15 | 2021-04-30 | 武汉华星光电技术有限公司 | 显示面板 |
| US12349561B2 (en) | 2021-01-15 | 2025-07-01 | Wuhan China Star Optoelectronics Technology Co., Ltd. | Display panel with transistor disposed in region corresponding to data line |
Also Published As
| Publication number | Publication date |
|---|---|
| US20070018168A1 (en) | 2007-01-25 |
| JP2007036196A (ja) | 2007-02-08 |
| KR20070012054A (ko) | 2007-01-25 |
| KR101138429B1 (ko) | 2012-04-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101064318A (zh) | 用于显示设备的薄膜晶体管阵列面板及其制造方法 | |
| US9501165B2 (en) | Organic light emitting diode display device with touch screen and method of fabricating the same | |
| CN109638061B (zh) | 显示面板及其制造方法 | |
| CN1495477A (zh) | 显示器基板、液晶显示器和制造该液晶显示器的方法 | |
| CN112133729B (zh) | 一种显示基板及其制备方法、显示装置 | |
| CN1555506A (zh) | 用于液晶显示器的薄膜晶体管面板 | |
| CN1801479A (zh) | 制造包括塑料基板的柔性薄膜晶体管阵列板的方法 | |
| CN101079429A (zh) | 薄膜晶体管阵列基板及其制造方法 | |
| CN1921095A (zh) | 半导体芯片、显示屏板及其制造方法 | |
| CN1452142A (zh) | 显示器件及其制造方法 | |
| CN1854834A (zh) | 显示装置及其制造方法 | |
| CN1728363A (zh) | 薄膜晶体管阵列面板及其制造方法 | |
| CN1955800A (zh) | 液晶显示装置及其制造方法 | |
| TWI747914B (zh) | 顯示設備 | |
| CN1670909A (zh) | 薄膜晶体管阵列面板及其制造方法 | |
| CN1773341A (zh) | 制造柔性显示装置的方法 | |
| CN1869775A (zh) | 液晶显示器及其制造方法 | |
| CN1758120A (zh) | 液晶显示器及其显示板 | |
| CN1761050A (zh) | 薄膜晶体管阵列面板及其制造方法 | |
| CN1901204A (zh) | 薄膜晶体管基底、显示装置及其制造方法 | |
| CN1825571A (zh) | 薄膜晶体管阵列面板及其制造方法 | |
| CN1580917A (zh) | 薄膜晶体管阵列面板及其制造方法 | |
| CN1900776A (zh) | 液晶显示装置及其制造方法 | |
| CN1847940A (zh) | 形成焊盘电极及液晶显示器件的方法 | |
| CN1484080A (zh) | 有源矩阵基片、具有该基片的液晶显示装置和该基片的制造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20070124 |