CN1766733A - 感光性树脂组合物、显示面板用间隔物及显示面板 - Google Patents

感光性树脂组合物、显示面板用间隔物及显示面板 Download PDF

Info

Publication number
CN1766733A
CN1766733A CNA2005101184499A CN200510118449A CN1766733A CN 1766733 A CN1766733 A CN 1766733A CN A2005101184499 A CNA2005101184499 A CN A2005101184499A CN 200510118449 A CN200510118449 A CN 200510118449A CN 1766733 A CN1766733 A CN 1766733A
Authority
CN
China
Prior art keywords
methyl
acid
ester
ethoxy
propyl ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005101184499A
Other languages
English (en)
Chinese (zh)
Inventor
一户大吾
梶田彻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of CN1766733A publication Critical patent/CN1766733A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Materials For Photolithography (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
CNA2005101184499A 2004-10-28 2005-10-28 感光性树脂组合物、显示面板用间隔物及显示面板 Pending CN1766733A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004313456A JP2006126397A (ja) 2004-10-28 2004-10-28 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP2004313456 2004-10-28

Publications (1)

Publication Number Publication Date
CN1766733A true CN1766733A (zh) 2006-05-03

Family

ID=36721230

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005101184499A Pending CN1766733A (zh) 2004-10-28 2005-10-28 感光性树脂组合物、显示面板用间隔物及显示面板

Country Status (4)

Country Link
JP (1) JP2006126397A (ja)
KR (1) KR20060052240A (ja)
CN (1) CN1766733A (ja)
TW (1) TW200622489A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102040795A (zh) * 2009-10-15 2011-05-04 住友化学株式会社 树脂组合物

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
JP5051365B2 (ja) * 2006-08-24 2012-10-17 Jsr株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
KR101237613B1 (ko) * 2008-02-18 2013-02-26 주식회사 엘지화학 안정성이 개선된 알칼리 가용성 에폭시 수지 조성물 및이를 포함하는 감광성 수지 조성물
CN101872123B (zh) * 2009-04-27 2013-07-24 Jsr株式会社 放射线敏感性树脂组合物、液晶显示用隔片或保护膜及其形成方法
KR101788773B1 (ko) 2014-03-20 2017-10-23 (주)휴넷플러스 감광성 수지 조성물

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3901807B2 (ja) * 1997-09-25 2007-04-04 日立化成工業株式会社 着色画像形成用感光材、感光性エレメント、カラーフィルターの製造法及びカラーフィルター
JPH11133599A (ja) * 1997-10-29 1999-05-21 Hitachi Chem Co Ltd 着色画像形成用感光材、感光性エレメント、これを用いたカラーフィルターの製造法及びカラーフィルター
JPH11133600A (ja) * 1997-10-30 1999-05-21 Jsr Corp 表示パネルスペーサー用感放射線性樹脂組成物
JP2003066604A (ja) * 2001-08-28 2003-03-05 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
TWI247195B (en) * 2003-01-30 2006-01-11 Chi Mei Corp Photosensitive resin composition for spacer
KR20050113351A (ko) * 2004-05-27 2005-12-02 주식회사 동진쎄미켐 감광성 수지 조성물

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102040795A (zh) * 2009-10-15 2011-05-04 住友化学株式会社 树脂组合物

Also Published As

Publication number Publication date
KR20060052240A (ko) 2006-05-19
TW200622489A (en) 2006-07-01
JP2006126397A (ja) 2006-05-18

Similar Documents

Publication Publication Date Title
CN1940724A (zh) 光敏性树脂组合物、液晶显示面板的保护膜及分隔物、它们的形成方法及液晶显示面板
CN1821877A (zh) 隔片形成用放射线敏感性树脂组合物、隔片及其形成方法和液晶显示元件
CN1291278C (zh) 辐射敏感的树脂组合物
CN1950751A (zh) 放射线敏感性树脂组合物、间隔物及其形成方法
CN1696827A (zh) 放射线敏感性树脂组合物、间隔、及其形成方法以及液晶显示元件
CN1916761A (zh) 感光性树脂组合物、显示面板用隔垫和显示面板
CN1725086A (zh) 感光性树脂组合物、显示板用隔离物和显示板
CN1529833A (zh) 光敏着色组合物、使用该组合物的滤色器及其生产方法
CN1690735A (zh) 着色层形成用感放射线性组合物、彩色滤光片及液晶显示屏
CN1800885A (zh) 用于形成着色层的放射线敏感性组合物、滤色器以及彩色液晶显示屏
CN1726434A (zh) 滤色片黑色矩阵光阻组合物
CN1770012A (zh) 着色感光性树脂组合物
CN1711503A (zh) 负型感光性树脂组合物
CN1766733A (zh) 感光性树脂组合物、显示面板用间隔物及显示面板
CN1655060A (zh) 感放射线性树脂组合物、显示面板用间隔物以及显示面板
CN1729429A (zh) 滤色片黑色矩阵光阻组合物及用于该组合物的碳黑分散体组合物
CN101059651A (zh) 放射线敏感性树脂组合物、由该组合物形成的突起和分隔物及其形成方法、及液晶显示元件
CN1532566A (zh) 用于滤色器的辐射敏感组合物
CN1916762A (zh) 感光性树脂组合物、显示面板用间隔物及显示面板
CN101046630A (zh) 用于形成着色层的放射线敏感性组合物、滤色器和彩色液晶显示元件
CN101067723A (zh) 用于形成着色层的放射线敏感性组合物、滤色器以及彩色液晶显示元件
CN1645220A (zh) 隔片形成用放射线敏感性树脂组合物、隔片及其形成方法以及液晶显示元件
CN1797196A (zh) 感光性树脂组合物、显示面板用间隔物以及显示面板
CN1841192A (zh) 放射线敏感性树脂组合物、由该组合物形成的凸起体和间隔体,以及包含其的液晶显示元件
CN1841196A (zh) 放射线敏感性树脂组合物、由该组合物形成的突起和分隔物及其形成方法、及液晶显示元件

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication