CN1468390A - 光引发反应 - Google Patents

光引发反应 Download PDF

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Publication number
CN1468390A
CN1468390A CNA018169201A CN01816920A CN1468390A CN 1468390 A CN1468390 A CN 1468390A CN A018169201 A CNA018169201 A CN A018169201A CN 01816920 A CN01816920 A CN 01816920A CN 1468390 A CN1468390 A CN 1468390A
Authority
CN
China
Prior art keywords
phenyl
substrate
photoinitiator
actinic radiation
crosslinked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA018169201A
Other languages
English (en)
Chinese (zh)
Inventor
���ء����߸�
格兰特·布拉德利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintfield Ltd
Original Assignee
Lintfield Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintfield Ltd filed Critical Lintfield Ltd
Publication of CN1468390A publication Critical patent/CN1468390A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CNA018169201A 2000-08-04 2001-08-03 光引发反应 Pending CN1468390A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0019251.8 2000-08-04
GBGB0019251.8A GB0019251D0 (en) 2000-08-04 2000-08-04 Photoinitiated reactions

Publications (1)

Publication Number Publication Date
CN1468390A true CN1468390A (zh) 2004-01-14

Family

ID=9897051

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA018169201A Pending CN1468390A (zh) 2000-08-04 2001-08-03 光引发反应

Country Status (14)

Country Link
US (2) US7183333B2 (https=)
EP (2) EP1772774B1 (https=)
JP (1) JP5486141B2 (https=)
KR (1) KR100789218B1 (https=)
CN (1) CN1468390A (https=)
AT (1) ATE343158T1 (https=)
AU (1) AU2001276496A1 (https=)
CA (1) CA2455220C (https=)
DE (1) DE60123965T2 (https=)
ES (1) ES2272510T3 (https=)
GB (1) GB0019251D0 (https=)
MY (1) MY136915A (https=)
TW (1) TW575587B (https=)
WO (1) WO2002012350A2 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102803304A (zh) * 2010-01-18 2012-11-28 林特弗德有限公司 光引发反应
CN107924004A (zh) * 2015-08-25 2018-04-17 阿兰诺德股份有限两合公司 具有涂漆的铝衬底和银反射层的反射性复合材料及其制造方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100030183A1 (en) 2004-03-19 2010-02-04 Toner John L Method of treating vascular disease at a bifurcated vessel using a coated balloon
US7727544B2 (en) 2004-05-07 2010-06-01 The Regents Of The University Of California Treatment of myopia
US7559862B2 (en) * 2005-05-12 2009-07-14 Waboba Ab Ball suitable for water games
JP4993700B2 (ja) * 2007-03-09 2012-08-08 国立大学法人 香川大学 保護膜およびその製造方法
US7931091B2 (en) * 2007-10-03 2011-04-26 Schlumberger Technology Corporation Open-hole wellbore lining
KR100984910B1 (ko) * 2007-12-26 2010-10-01 채차식 확개형 불꽃장식 조명구
US20100003617A1 (en) * 2008-07-02 2010-01-07 Sony Corporation Optical information recording medium
JP4632101B2 (ja) * 2008-07-02 2011-02-16 ソニー株式会社 光情報記録媒体
US8394464B2 (en) * 2009-03-31 2013-03-12 Schlumberger Technology Corporation Lining of wellbore tubing
GB2477139A (en) * 2010-01-25 2011-07-27 Datalase Ltd Inkless printing apparatus
KR200458166Y1 (ko) * 2010-03-24 2012-01-25 김송수 회전식 절첩 파라솔
US8475975B2 (en) * 2011-06-21 2013-07-02 General Electric Company Method of recording data in an optical data storage medium and an optical data storage medium
JP6425479B2 (ja) * 2014-09-18 2018-11-21 キヤノン株式会社 印刷制御装置、印刷制御方法、及びプログラム
US10968197B2 (en) 2016-10-20 2021-04-06 3M Innovative Properties Company Photoinitiators with protected carbonyl group
KR102912926B1 (ko) 2018-07-19 2026-01-14 린트필드 리미티드 티오크산톤 유도체 및 이를 포함하는 조성물 및 상기 조성물을 포함하는 패턴 형성 방법｛Thioxanthone derivatives, composition comprising the same and pattern forming method comprising said composition｝
GB202000736D0 (en) 2020-01-17 2020-03-04 Lintfield Ltd Modified thioxanthone photoinitators
KR102850494B1 (ko) * 2023-10-18 2025-08-26 한화토탈에너지스 주식회사 에틸렌 비닐아세테이트 공중합체의 제조 방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4072694A (en) * 1975-09-15 1978-02-07 Lee Pharmaceuticals Dioxolane derivatives and use as photoinitiators
EP0108037B1 (de) * 1982-10-01 1989-06-07 Ciba-Geigy Ag Propiophenonderivate als Photoinitiatoren für die Photopolymerisation
JPS6225179A (ja) * 1985-07-25 1987-02-03 Sanyo Kokusaku Pulp Co Ltd 紫外線硬化樹脂組成物
KR910000199B1 (ko) * 1986-04-15 1991-01-23 시바-가이기 코오포레이숀 액체 광개시제 혼합물
US4923941A (en) * 1987-10-28 1990-05-08 American Cyanamid Company Carboxy-functional polymers and their use as detergent additives
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
JP3798504B2 (ja) * 1997-04-21 2006-07-19 富士写真フイルム株式会社 ネガ型画像記録材料
EP0887706A1 (en) 1997-06-25 1998-12-30 Wako Pure Chemical Industries, Ltd Resist composition containing specific cross-linking agent
JPH11269235A (ja) * 1998-03-20 1999-10-05 Nippon Shokubai Co Ltd アセタール基含有重合体およびその製法
JP2000105945A (ja) * 1998-09-28 2000-04-11 Taiyo Yuden Co Ltd 光情報記録媒体
TWI234567B (en) * 1998-11-27 2005-06-21 Hyundai Electronics Ind Cross-linker for photoresist, and photoresist composition comprising the same
US6479039B1 (en) * 1999-07-13 2002-11-12 Woodward Laboratories, Inc. Antimicrobial artificial nail composition and methods for preparing and using same
DE69911020T2 (de) * 1999-10-06 2004-07-08 Dainippon Ink And Chemicals, Inc. 4-Methylen-1,3-dioxolane mit funktionellen Gruppen
ES2233255T3 (es) * 2000-08-25 2005-06-16 Dainippon Ink And Chemicals, Inc. 4-metilen-1,3-dioxolano como agentes reticulantes.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102803304A (zh) * 2010-01-18 2012-11-28 林特弗德有限公司 光引发反应
CN102803304B (zh) * 2010-01-18 2015-08-05 林特弗德有限公司 光引发反应
CN107924004A (zh) * 2015-08-25 2018-04-17 阿兰诺德股份有限两合公司 具有涂漆的铝衬底和银反射层的反射性复合材料及其制造方法
CN107924004B (zh) * 2015-08-25 2021-02-12 阿兰诺德股份有限两合公司 具有涂漆的铝衬底和银反射层的反射性复合材料及其制造方法

Also Published As

Publication number Publication date
EP1307783B1 (en) 2006-10-18
EP1772774A2 (en) 2007-04-11
TW575587B (en) 2004-02-11
US20040014833A1 (en) 2004-01-22
JP5486141B2 (ja) 2014-05-07
MY136915A (en) 2008-11-28
DE60123965T2 (de) 2007-06-14
WO2002012350A3 (en) 2002-08-22
US20070185225A1 (en) 2007-08-09
CA2455220C (en) 2011-01-11
EP1772774A3 (en) 2009-08-19
GB0019251D0 (en) 2000-09-27
EP1772774B1 (en) 2012-06-13
ES2272510T3 (es) 2007-05-01
EP1307783A2 (en) 2003-05-07
CA2455220A1 (en) 2002-02-14
ATE343158T1 (de) 2006-11-15
KR20030040383A (ko) 2003-05-22
DE60123965D1 (de) 2006-11-30
WO2002012350A2 (en) 2002-02-14
HK1055800A1 (en) 2004-01-21
AU2001276496A1 (en) 2002-02-18
US8030368B2 (en) 2011-10-04
US7183333B2 (en) 2007-02-27
JP2004506070A (ja) 2004-02-26
KR100789218B1 (ko) 2007-12-31

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication