KR100789218B1 - 광개시화 반응 - Google Patents

광개시화 반응 Download PDF

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Publication number
KR100789218B1
KR100789218B1 KR1020037001625A KR20037001625A KR100789218B1 KR 100789218 B1 KR100789218 B1 KR 100789218B1 KR 1020037001625 A KR1020037001625 A KR 1020037001625A KR 20037001625 A KR20037001625 A KR 20037001625A KR 100789218 B1 KR100789218 B1 KR 100789218B1
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KR
South Korea
Prior art keywords
photoinitiator
phenyl
substrate
actinic radiation
reaction
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Expired - Fee Related
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KR1020037001625A
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English (en)
Korean (ko)
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KR20030040383A (ko
Inventor
브래들리그랜트
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린트필드 리미티드
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Application filed by 린트필드 리미티드 filed Critical 린트필드 리미티드
Publication of KR20030040383A publication Critical patent/KR20030040383A/ko
Application granted granted Critical
Publication of KR100789218B1 publication Critical patent/KR100789218B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020037001625A 2000-08-04 2001-08-03 광개시화 반응 Expired - Fee Related KR100789218B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0019251.8 2000-08-04
GBGB0019251.8A GB0019251D0 (en) 2000-08-04 2000-08-04 Photoinitiated reactions
PCT/GB2001/003497 WO2002012350A2 (en) 2000-08-04 2001-08-03 Photoinitiated reactions

Publications (2)

Publication Number Publication Date
KR20030040383A KR20030040383A (ko) 2003-05-22
KR100789218B1 true KR100789218B1 (ko) 2007-12-31

Family

ID=9897051

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020037001625A Expired - Fee Related KR100789218B1 (ko) 2000-08-04 2001-08-03 광개시화 반응

Country Status (14)

Country Link
US (2) US7183333B2 (https=)
EP (2) EP1772774B1 (https=)
JP (1) JP5486141B2 (https=)
KR (1) KR100789218B1 (https=)
CN (1) CN1468390A (https=)
AT (1) ATE343158T1 (https=)
AU (1) AU2001276496A1 (https=)
CA (1) CA2455220C (https=)
DE (1) DE60123965T2 (https=)
ES (1) ES2272510T3 (https=)
GB (1) GB0019251D0 (https=)
MY (1) MY136915A (https=)
TW (1) TW575587B (https=)
WO (1) WO2002012350A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250055718A (ko) * 2023-10-18 2025-04-25 한화토탈에너지스 주식회사 에틸렌 비닐아세테이트 공중합체의 제조 방법

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US20100030183A1 (en) 2004-03-19 2010-02-04 Toner John L Method of treating vascular disease at a bifurcated vessel using a coated balloon
US7727544B2 (en) 2004-05-07 2010-06-01 The Regents Of The University Of California Treatment of myopia
US7559862B2 (en) * 2005-05-12 2009-07-14 Waboba Ab Ball suitable for water games
JP4993700B2 (ja) * 2007-03-09 2012-08-08 国立大学法人 香川大学 保護膜およびその製造方法
US7931091B2 (en) * 2007-10-03 2011-04-26 Schlumberger Technology Corporation Open-hole wellbore lining
KR100984910B1 (ko) * 2007-12-26 2010-10-01 채차식 확개형 불꽃장식 조명구
US20100003617A1 (en) * 2008-07-02 2010-01-07 Sony Corporation Optical information recording medium
JP4632101B2 (ja) * 2008-07-02 2011-02-16 ソニー株式会社 光情報記録媒体
US8394464B2 (en) * 2009-03-31 2013-03-12 Schlumberger Technology Corporation Lining of wellbore tubing
GB2476976A (en) * 2010-01-18 2011-07-20 Lintfield Ltd Protected aryl ketones and their use as photoinitiators
GB2477139A (en) * 2010-01-25 2011-07-27 Datalase Ltd Inkless printing apparatus
KR200458166Y1 (ko) * 2010-03-24 2012-01-25 김송수 회전식 절첩 파라솔
US8475975B2 (en) * 2011-06-21 2013-07-02 General Electric Company Method of recording data in an optical data storage medium and an optical data storage medium
JP6425479B2 (ja) * 2014-09-18 2018-11-21 キヤノン株式会社 印刷制御装置、印刷制御方法、及びプログラム
DE102015114094A1 (de) * 2015-08-25 2017-03-02 Alanod Gmbh & Co. Kg Reflektierendes Verbundmaterial mit lackiertem Aluminium-Träger und mit einer Silber-Reflexionsschicht und Verfahren zu dessen Herstellung
US10968197B2 (en) 2016-10-20 2021-04-06 3M Innovative Properties Company Photoinitiators with protected carbonyl group
KR102912926B1 (ko) 2018-07-19 2026-01-14 린트필드 리미티드 티오크산톤 유도체 및 이를 포함하는 조성물 및 상기 조성물을 포함하는 패턴 형성 방법｛Thioxanthone derivatives, composition comprising the same and pattern forming method comprising said composition｝
GB202000736D0 (en) 2020-01-17 2020-03-04 Lintfield Ltd Modified thioxanthone photoinitators

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US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4072694A (en) * 1975-09-15 1978-02-07 Lee Pharmaceuticals Dioxolane derivatives and use as photoinitiators
EP0108037B1 (de) * 1982-10-01 1989-06-07 Ciba-Geigy Ag Propiophenonderivate als Photoinitiatoren für die Photopolymerisation
JPS6225179A (ja) * 1985-07-25 1987-02-03 Sanyo Kokusaku Pulp Co Ltd 紫外線硬化樹脂組成物
KR910000199B1 (ko) * 1986-04-15 1991-01-23 시바-가이기 코오포레이숀 액체 광개시제 혼합물
US4923941A (en) * 1987-10-28 1990-05-08 American Cyanamid Company Carboxy-functional polymers and their use as detergent additives
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
JP3798504B2 (ja) * 1997-04-21 2006-07-19 富士写真フイルム株式会社 ネガ型画像記録材料
EP0887706A1 (en) 1997-06-25 1998-12-30 Wako Pure Chemical Industries, Ltd Resist composition containing specific cross-linking agent
JPH11269235A (ja) * 1998-03-20 1999-10-05 Nippon Shokubai Co Ltd アセタール基含有重合体およびその製法
JP2000105945A (ja) * 1998-09-28 2000-04-11 Taiyo Yuden Co Ltd 光情報記録媒体
TWI234567B (en) * 1998-11-27 2005-06-21 Hyundai Electronics Ind Cross-linker for photoresist, and photoresist composition comprising the same
US6479039B1 (en) * 1999-07-13 2002-11-12 Woodward Laboratories, Inc. Antimicrobial artificial nail composition and methods for preparing and using same
DE69911020T2 (de) * 1999-10-06 2004-07-08 Dainippon Ink And Chemicals, Inc. 4-Methylen-1,3-dioxolane mit funktionellen Gruppen
ES2233255T3 (es) * 2000-08-25 2005-06-16 Dainippon Ink And Chemicals, Inc. 4-metilen-1,3-dioxolano como agentes reticulantes.

Non-Patent Citations (3)

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Title
J. Am. Chem. Soc. 109, pp.3779-3780(1987)
J. Photochem. Photobiol. A: Chem. 100, pp.109-118(1996)
J. Photochem. Photobiol. A: Chem. 100, pp.185-193(1997)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250055718A (ko) * 2023-10-18 2025-04-25 한화토탈에너지스 주식회사 에틸렌 비닐아세테이트 공중합체의 제조 방법
KR102850494B1 (ko) 2023-10-18 2025-08-26 한화토탈에너지스 주식회사 에틸렌 비닐아세테이트 공중합체의 제조 방법

Also Published As

Publication number Publication date
EP1307783B1 (en) 2006-10-18
EP1772774A2 (en) 2007-04-11
TW575587B (en) 2004-02-11
US20040014833A1 (en) 2004-01-22
JP5486141B2 (ja) 2014-05-07
MY136915A (en) 2008-11-28
DE60123965T2 (de) 2007-06-14
WO2002012350A3 (en) 2002-08-22
CN1468390A (zh) 2004-01-14
US20070185225A1 (en) 2007-08-09
CA2455220C (en) 2011-01-11
EP1772774A3 (en) 2009-08-19
GB0019251D0 (en) 2000-09-27
EP1772774B1 (en) 2012-06-13
ES2272510T3 (es) 2007-05-01
EP1307783A2 (en) 2003-05-07
CA2455220A1 (en) 2002-02-14
ATE343158T1 (de) 2006-11-15
KR20030040383A (ko) 2003-05-22
DE60123965D1 (de) 2006-11-30
WO2002012350A2 (en) 2002-02-14
HK1055800A1 (en) 2004-01-21
AU2001276496A1 (en) 2002-02-18
US8030368B2 (en) 2011-10-04
US7183333B2 (en) 2007-02-27
JP2004506070A (ja) 2004-02-26

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