CN1386146A - 电镀铜的r-t-b系磁铁及其电镀方法 - Google Patents
电镀铜的r-t-b系磁铁及其电镀方法 Download PDFInfo
- Publication number
- CN1386146A CN1386146A CN01801937A CN01801937A CN1386146A CN 1386146 A CN1386146 A CN 1386146A CN 01801937 A CN01801937 A CN 01801937A CN 01801937 A CN01801937 A CN 01801937A CN 1386146 A CN1386146 A CN 1386146A
- Authority
- CN
- China
- Prior art keywords
- tunicle
- based magnet
- coppering
- electro
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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Images
Classifications
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- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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- Y10T428/12903—Cu-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Environmental & Geological Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
- Hard Magnetic Materials (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
项目 | 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | ||
第一电镀层 | 电镀铜 | 硫酸铜(g/L) | 20 | 20 | 20 | 60 | 60 |
EDTA·2Na(g/L) | 30 | 30 | 30 | 150 | 150 | ||
pH | 10.6 | 10.6 | 10.6 | 12.5 | 12.5 | ||
液温(℃) | 70 | 70 | 70 | 50 | 50 | ||
电流密度(A/dm2) | 1.5 | 1.5 | 1.5 | 0.3 | 0.3 | ||
第二电镀层 | 电镀镍 | 硫酸镍(g/L) | 350 | - | - | 290 | - |
氯化镍(g/L) | 20 | - | - | 45 | - | ||
硼酸(g/L) | 10 | - | - | 40 | - | ||
pH | 2.5 | - | - | 4.0 | - | ||
液温(℃) | 35 | - | - | 50 | - | ||
电流密度(A/dm2) | 0.1 | - | - | 0.5 | - | ||
非电镀镍(ニボジユ-ル) | - | 8μm | - | - | 8μm | ||
非电镀镍(Top Nicoron F153) | - | - | 8μm | - | - | ||
I(200)/I(111) | 0.29 | 0.28 | 0.21 | 0.33 | 0.36 | ||
维氏硬度 | 310 | 309 | 316 | 296 | 290 | ||
针眼数(个/cm2) | 0 | 0 | 0 | 0 | 0 | ||
与R-T-B系磁铁基材的粘着力(N/cm) | 1.96 | 1.90 | 1.88 | 2.16 | 1.98 | ||
跟随性 | 良好 | 良好 | 良好 | 良好 | 良好 | ||
热减磁率(%) | 0 | 0 | 0 | 0 | 0 | ||
毒物成分 | 无 | 无 | 无 | 无 | 无 |
项目 | 实施例6 | 实施例7 | 实施例8 | 实施例9 | ||
第一电镀层 | 电镀铜 | 硫酸铜(g/L) | 60 | 150 | 150 | 150 |
EDTA·2Na(g/L) | 150 | 250 | 250 | 250 | ||
pH | 12.5 | 13.5 | 13.5 | 13.5 | ||
液温(℃) | 50 | 10 | 10 | 10 | ||
电流密度(A/dm2) | 0.3 | 0.1 | 0.1 | 0.1 | ||
第二电镀层 | 电镀镍 | 硫酸镍(g/L) | - | 150 | - | - |
氯化镍(g/L) | - | 150 | - | - | ||
硼酸(g/L) | - | 70 | - | - | ||
pH | - | 5.0 | - | - | ||
液温(℃) | - | 60 | - | - | ||
电流密度(A/dm2) | - | 1.5 | - | - | ||
非电镀镍(ニボジユ-ル) | - | - | 8μm | - | ||
非电镀镍(Top Nicoron F153) | 8μm | - | - | 8μm | ||
I(200)/I(111) | 0.34 | 0.39 | 0.38 | 0.38 | ||
维氏硬度 | 296 | 274 | 282 | 280 | ||
针眼数(个/cm2) | 0 | 0 | 0 | 0 | ||
与R-T-B系磁铁基材的粘着力(N/cm) | 2.10 | 1.76 | 1.80 | 1.82 | ||
跟随性 | 良好 | 良好 | 良好 | 良好 | ||
热减磁率(%) | 0 | 0 | 0 | 0 | ||
毒物成分 | 无 | 无 | 无 | 无 |
比较例1 | 比较例2 | 比较例3 | 比较例4 | 比较例5 | |
第一电镀层 | 酸性硫酸铜 | 焦磷酸铜 | 硼氟化铜 | 氰化铜 | 非电镀铜 |
第二电镀层 | 电镀镍(瓦特浴) | 电镀镍(瓦特浴) | 电镀镍(瓦特浴) | 电镀镍(瓦特浴) | 电镀镍(瓦特浴) |
I(200)/I(111) | 0.66 | 0.63 | - | 0.71 | 0.65 |
维氏硬度 | - | - | - | 251 | 242 |
针孔数(个/cm2) | 39 | 19 | 40 | 0 | 0 |
与磁铁基材的粘着力(N/cm) | 0.20 | 0.39 | 0.34 | 1.47 | 0.49 |
跟随性 | 不良 | 不良 | 不良 | 不良 | 不良 |
热减磁率(%) | 13.5 | 8.0 | 7.5 | 0 | 0 |
毒物成分 | 无 | 无 | 无 | 有(氰) | 无 |
Claims (13)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
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JP2000206810 | 2000-07-07 | ||
JP206810/2000 | 2000-07-07 | ||
JP206810/00 | 2000-07-07 | ||
JP2001065821 | 2001-03-09 | ||
JP65821/2001 | 2001-03-09 | ||
JP65821/01 | 2001-03-09 |
Publications (2)
Publication Number | Publication Date |
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CN1386146A true CN1386146A (zh) | 2002-12-18 |
CN1193115C CN1193115C (zh) | 2005-03-16 |
Family
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Application Number | Title | Priority Date | Filing Date |
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CNB018019374A Expired - Lifetime CN1193115C (zh) | 2000-07-07 | 2001-07-04 | 电镀铜的r-t-b系磁铁及其电镀方法和电镀铜液 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6866765B2 (zh) |
EP (1) | EP1300489B1 (zh) |
KR (1) | KR100720015B1 (zh) |
CN (1) | CN1193115C (zh) |
WO (1) | WO2002004714A1 (zh) |
Cited By (4)
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CN100588752C (zh) * | 2004-08-10 | 2010-02-10 | 日立金属株式会社 | 在其表面上具有镀铜膜的稀土金属基永磁体的生产方法 |
CN101405435B (zh) * | 2006-02-07 | 2010-11-03 | 日立金属株式会社 | 表面具有镀铜覆膜的稀土类永久磁铁的制造方法 |
CN102027552B (zh) * | 2008-05-14 | 2013-01-09 | 日立金属株式会社 | 稀土类永久磁铁 |
CN104499014A (zh) * | 2014-12-15 | 2015-04-08 | 钢铁研究总院 | 钕铁硼电镀锌铁的弱酸性氯化物体系添加剂及其制备使用 |
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US7902062B2 (en) * | 2002-11-23 | 2011-03-08 | Infineon Technologies Ag | Electrodepositing a metal in integrated circuit applications |
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Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4469569A (en) * | 1983-01-03 | 1984-09-04 | Omi International Corporation | Cyanide-free copper plating process |
JPS6054406A (ja) | 1983-09-03 | 1985-03-28 | Sumitomo Special Metals Co Ltd | 耐酸化性のすぐれた永久磁石 |
JPH059776A (ja) * | 1991-07-01 | 1993-01-19 | Fujitsu Ltd | プリント配線板のめつき方法 |
US5348639A (en) * | 1991-08-06 | 1994-09-20 | Hitachi Magnetics Corporation | Surface treatment for iron-based permanent magnet including rare-earth element |
US5314756A (en) * | 1991-11-27 | 1994-05-24 | Hitachi Metals, Ltd. | Permanent magnet of rare-earth-element/transition-metal system having improved corrosion resistance and manufacturing method thereof |
JP2678701B2 (ja) | 1992-02-19 | 1997-11-17 | 石原薬品 株式会社 | 電気銅めっき液 |
JPH07176443A (ja) * | 1993-12-20 | 1995-07-14 | Daido Steel Co Ltd | 異方性希土類磁石の製造方法 |
JP3377605B2 (ja) | 1994-06-22 | 2003-02-17 | 日本ニュークローム株式会社 | 耐食性磁性合金 |
CN1205626C (zh) * | 1997-10-30 | 2005-06-08 | 株式会社新王磁材 | 具有高耐蚀性的R-Fe-B基粘结磁体及其制造工艺 |
JP2000133541A (ja) | 1998-10-23 | 2000-05-12 | Sumitomo Special Metals Co Ltd | 高耐食性R−Fe−B系ボンド磁石の製造方法 |
-
2001
- 2001-07-04 KR KR1020027002972A patent/KR100720015B1/ko active IP Right Grant
- 2001-07-04 EP EP01947811.4A patent/EP1300489B1/en not_active Expired - Lifetime
- 2001-07-04 CN CNB018019374A patent/CN1193115C/zh not_active Expired - Lifetime
- 2001-07-04 WO PCT/JP2001/005798 patent/WO2002004714A1/ja active Application Filing
- 2001-07-04 US US10/070,389 patent/US6866765B2/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100588752C (zh) * | 2004-08-10 | 2010-02-10 | 日立金属株式会社 | 在其表面上具有镀铜膜的稀土金属基永磁体的生产方法 |
CN101405435B (zh) * | 2006-02-07 | 2010-11-03 | 日立金属株式会社 | 表面具有镀铜覆膜的稀土类永久磁铁的制造方法 |
CN102027552B (zh) * | 2008-05-14 | 2013-01-09 | 日立金属株式会社 | 稀土类永久磁铁 |
CN104499014A (zh) * | 2014-12-15 | 2015-04-08 | 钢铁研究总院 | 钕铁硼电镀锌铁的弱酸性氯化物体系添加剂及其制备使用 |
Also Published As
Publication number | Publication date |
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KR20020029944A (ko) | 2002-04-20 |
US6866765B2 (en) | 2005-03-15 |
EP1300489B1 (en) | 2017-06-07 |
US20030052013A1 (en) | 2003-03-20 |
EP1300489A1 (en) | 2003-04-09 |
WO2002004714A1 (en) | 2002-01-17 |
EP1300489A4 (en) | 2006-10-04 |
KR100720015B1 (ko) | 2007-05-18 |
CN1193115C (zh) | 2005-03-16 |
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