CN1328332C - 光催化性涂布剂、光催化性复合材料及其制造方法以及自净化性水性涂料组合物和自净化性构件 - Google Patents
光催化性涂布剂、光催化性复合材料及其制造方法以及自净化性水性涂料组合物和自净化性构件 Download PDFInfo
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- CN1328332C CN1328332C CNB038124440A CN03812444A CN1328332C CN 1328332 C CN1328332 C CN 1328332C CN B038124440 A CNB038124440 A CN B038124440A CN 03812444 A CN03812444 A CN 03812444A CN 1328332 C CN1328332 C CN 1328332C
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- 238000000465 moulding Methods 0.000 description 1
- PYUYQYBDJFMFTH-WMMMYUQOSA-N naphthol red Chemical compound CCOC1=CC=CC=C1NC(=O)C(C1=O)=CC2=CC=CC=C2\C1=N\NC1=CC=C(C(N)=O)C=C1 PYUYQYBDJFMFTH-WMMMYUQOSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- VQTGUFBGYOIUFS-UHFFFAOYSA-N nitrosylsulfuric acid Chemical compound OS(=O)(=O)ON=O VQTGUFBGYOIUFS-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 description 1
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- TWSRVQVEYJNFKQ-UHFFFAOYSA-N pentyl propanoate Chemical compound CCCCCOC(=O)CC TWSRVQVEYJNFKQ-UHFFFAOYSA-N 0.000 description 1
- 239000002957 persistent organic pollutant Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- HXHCOXPZCUFAJI-UHFFFAOYSA-N prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1 HXHCOXPZCUFAJI-UHFFFAOYSA-N 0.000 description 1
- 229940116423 propylene glycol diacetate Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229910003450 rhodium oxide Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- VVNRQZDDMYBBJY-UHFFFAOYSA-M sodium 1-[(1-sulfonaphthalen-2-yl)diazenyl]naphthalen-2-olate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(N=NC3=C4C=CC=CC4=CC=C3O)=CC=C21 VVNRQZDDMYBBJY-UHFFFAOYSA-M 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Images
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
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- B01J37/02—Impregnation, coating or precipitation
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Abstract
Description
商品名 | 制造商 | 固形分(%) | 平均粒径(nm) | |
光催化剂氧化物 | パルチタン5610 | 日本パ一カライジング(株) | 4 | 50 |
TKS-203 | テイカ(株) | 20 | 30 | |
STS~21 | 石原産業(株) | 38.3 | 30 | |
二氧化硅原料 | シリカド一ル80B | 日本化学工業(株) | 30 | 10 |
スノ一テックス50 | 日産化学工業(株) | 50 | 20 | |
スノ一テックス ZL | 日産化学工業(株) | 40 | 100 | |
乳液 | ルミフロンFE3000ルミフロンFE4300 | 旭硝子(株)旭硝子(株) | 5050 | 150150 |
ルミフロンLE100 | 旭硝子(株) | 50 | - | |
ボンコ一トSA-5080 | 大日本インキ化学工業(株) | 50 | 160 | |
颜料 | MF 5160 | 大日精化工業(株) | 60 | - |
テイスモ一N | 大塚化学(株) | 100 | - | |
HT-300 | 大塚化学(株) | 100 | - | |
ミクロエ一スP3 | 日本タルク(株) | 100 | - | |
成膜助剂 | テキサノ一ル | イ一ストマン·コダツク(株) | 100 | - |
CS·12 | チツソ(株) | 100 | - |
膜厚(μm) | 有无裂纹 | 附着性 | 杯突 | 光泽 | 耐碱性 | 耐沸水性 | 冷热循环 | 初期亲水性(°) | 紫外线照射后亲水性(°) | |
实施例1 | 34 | 未发生 | 良好 | 10mm以上 | 35 | 良好 | 良好 | 良好 | 2.6 | |
实施例2 | 29 | 未发生 | 良好 | 10mm以上 | 64 | 良好 | 良好 | 良好 | 6.5 | |
实施例3 | 48 | 未发生 | 良好 | 10mm以上 | 27 | 良好 | 良好 | 良好 | 1.9 | |
实施例4 | 35 | 未发生 | 良好 | 8mm | 15 | 良好 | 良好 | 良好 | 40 | 15 |
实施例5 | 20 | 未发生 | 良好 | 8mm | 15 | 良好 | 良好 | 良好 | 38 | 9.2 |
实施例6 | 30 | 未发生 | 良好 | 8mm | 12 | 良好 | 良好 | 良好 | 49 | 7.1 |
比较例1 | 23 | 未发生 | 良好 | 10mm | 21 | 良好 | 良好 | 良好 | 82 | |
比较例2 | 5 | 在涂层整体上发生裂纹 | 发生剥离 | 1mm | 11 | 发生剥离 | 发生剥离 | 发生剥离 | 11 | |
比较例3 | 3.5 | 未发生 | 良好 | 8mm | 49 | 良好 | 良好 | 良好 | 79 |
试样 | 暴露前 | 经过一个月 | 经过二个月 | |||
外观 | 接触角 | 外观 | 接触角 | 外观 | 接触角 | |
实施例1 | 良好 | 21° | 良好 | 2.5° | 良好 | 3.3° |
实施例2 | 良好 | 25° | 良好 | 6.5° | 良好 | 5.1° |
实施例3 | 良好 | 13° | 良好 | 1.9° | 良好 | 1.5° |
实施例4 | 良好 | 43° | 良好 | 30° | 良好 | 18° |
实施例5 | 良好 | 38° | 良好 | 29° | 良好 | 12° |
实施例6 | 良好 | 45° | 良好 | 10° | 良好 | 6.1° |
比较例1 | 良好 | 85° | 良好 | 82° | 发生由污染引起的白化 | 77° |
比较例2 | 良好 | 19° | 良好 | 11° | 发生膜剥离 | 9.0° |
比较例3 | 良好 | 78° | 良好 | 79° | 发生由污染引起的白化 | 71° |
硅氧烷乳液 | 胶体二氧化硅 | 氟树脂乳液 | 光催化剂二氧化钛 | 颜料(白) | 钛酸钾须晶 | 滑石 | 丙烯酸氨基甲酸酯乳液 | 固形分浓度(%) | |
实施例7 | 25 | 4.5 | 87.5 | 33 | 39.8 | ||||
实施例8 | 20 | 0.5 | 40 | 89.5 | 98.1 | ||||
实施例9 | 15 | 15 | 4.5 | 32.7 | 16 | 16.8 | 40.0 | ||
实施例10 | 15 | 15 | 15 | 4.5 | 90 | 20.5 | 40.0 | ||
实施例11 | 21 | 14 | 4.5 | 43 | 17.5 | 40.0 | |||
实施例12 | 10 | 25 | 0.5 | 47.5 | 17.0 | 40.0 | |||
实施例18 | 30 | 31 | 1.0 | 23 | 5 | 10 | 40.0 | ||
实施例14 | 16 | 14 | 4.5 | 38 | 17.5 | 10 | 40.0 | ||
实施例15 | 15.5 | 80 | 4.5 | 40.0 | |||||
比较例4 | 45 | 10 | 45 | 40.0 | |||||
比较例5 | 10 | 45 | 45 | 40.0 |
涂装后裂纹 | 涂装后胶带附着性 | 耐候性 | 耐碱性 | 亲水性 | ||||
裂纹 | 粉化 | 外观 | 胶带试验 | 杀菌灯 | 室外暴露 | |||
实施例7 | ○ | ○ | ○ | ○ | ○ | ○ | 6日 | 155日 |
实施例8 | ○ | ○ | ○ | ○ | ○ | ○ | 4日 | 123日 |
实施例9 | ○ | ○ | ○ | ○ | ○ | ○ | 4日 | 90日 |
实施例10 | ○ | ○ | ○ | ○ | ○ | ○ | 1日 | 45日 |
实施例11 | ○ | ○ | ○ | ○ | ○ | ○ | 1日 | 20日 |
实施例12 | ○ | ○ | ○ | ○ | ○ | ○ | 4日 | 65日 |
实施例13 | ○ | ○ | ○ | ○ | ○ | ○ | 2日 | 65日 |
实施例14 | ○ | ○ | ○ | ○ | ○ | ○ | 2日 | 65日 |
实施例15 | ○ | ○ | ○ | △ | ○ | △ | 5日 | 165日 |
比较例4 | ○ | ○ | △ | × | ○ | ○ | 1日 | 46日 |
比较例5 | ○ | ○ | × | ×× | ○ | ○ | 1日 | 46日 |
有机涂料涂装板的面涂涂料 | 丙烯酸板 | ||||
氟涂料 | 氨基甲酸酯涂料 | 丙烯酸硅氧烷涂料 | 丙烯酸涂料 | ||
实施例10 | 100/100 | 100/100 | 100/100 | 100/100 | 100/100 |
实施例13 | 100/100 | 100/100 | 100/100 | 100/100 | 100/100 |
试样 | 二氧化钛 | 硅树脂 | 氟树脂 | 滑石 | 须晶 | 颜料 | 二氧化硅 | 催化剂 | 溶剂 | 外观室外暴露 | 外观S WO M |
12s# | 25 | 21 | - | - | 17 | 23 | 14 | 0 | 水 | ○ | ○ |
13s# | 1 | - | 28 | 11 | 5 | 21 | 39 | 0 | 水 | ○ | △ |
14s# | 24.5 | 21 | - | - | 17 | 23 | 14 | 0.5 | IPA | × | × |
试样 | 二氧化钛 | 硅树脂 | 氟树脂 | 滑石 | 须晶 | 颜料 | 二氧化硅 | 溶剂 | 外观室外暴露 |
15s# | 25 | 21 | - | - | 17 | 23 | 14 | 水 | ○ |
16s# | 1 | - | 23 | 11 | 5 | 21 | 39 | 水 | ○ |
17s# | 30 | 25 | - | - | 0 | 28 | 17 | 水 | × |
试样 | 二氧化钛 | 硅树脂 | 须晶 | 颜料 | 二氧化硅 | 溶剂 | 外观 |
18s# | 25 | 21 | 17 | 23 | 14 | 水 | ○ |
19s# | 25 | 24 | 5 | 28 | 18 | 水 | △ |
试样 | 二氧化钛 | 硅树脂 | 须晶 | 颜料 | 二氧化硅 | 溶剂 | 遮蔽 |
20s# | 25 | 21 | 17 | 23 | 14 | 水 | 良好 |
21s# | 32 | 27 | 21 | 10 | 10 | 水 | 不足够 |
试样 | 二氧化钛 | 硅氧烷 | 氟树脂 | 滑石 | 须晶 | 颜料 | 二氧化硅 | 溶剂 | 室外暴露至20° | 杀菌灯照射至20° |
22s# | 25 | 25 | - | - | 15 | 25 | 10 | 水 | 45日 | 2日 |
23s# | 20 | 27 | - | - | 16 | 26 | 11 | 水 | 60日 | 2日 |
24s# | 1 | - | 15 | 10 | 10 | 25 | 39 | 水 | 60日 | 3日 |
试样 | 二氧化钛 | 硅氧烷 | 氟树脂 | 滑石 | 须晶 | 颜料 | 二氧化硅 | 溶剂 | 外观 |
25s# | 25 | 25 | - | - | 15 | 25 | 10 | 水 | 胶带试验○ |
26s# | 1 | - | 24 | 10 | 5 | 21 | 39 | 水 | 胶带试验○ |
27s# | 29 | 10 | - | - | 20 | 26 | 15 | 水 | 胶带试验△ |
试样 | 二氧化钛 | 硅氧烷 | 云母 | 须晶 | 颜料 | 二氧化硅 | 溶剂 | 外观 |
28s# | 30 | 25 | - | 15 | 20 | 10 | 水 | ○ |
29s# | 30 | 25 | 15*1 | 0 | 20 | 10 | 水 | ○ |
30s# | 30 | 25 | 15*2 | 0 | 20 | 10 | 水 | △ |
涂料固形分浓度 | |||||
5%(35#) | 10%(31#) | 20%(32#) | 30%(33#) | 40%(34#) | |
平均膜厚(μm) | 3.5 | 11.1 | 24.7 | 33.3 | 45.6 |
粘度(cps) | 不到20 | 不到20 | 30 | 150 | 500 |
有机涂装板的面涂涂料种类 | 丙烯酸板 | ||||
氟涂料 | 氨基甲酸酯涂料 | 丙烯酸硅氧烷涂料 | 丙烯酸涂料 | ||
涂料组合物13# | 100/100 | 100/100 | 100/100 | 100/100 | 100/100 |
Claims (7)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002157654A JP2003342526A (ja) | 2002-05-30 | 2002-05-30 | 自己浄化性水性塗料組成物、及び自己浄化性部材 |
JP157656/2002 | 2002-05-30 | ||
JP2002157655 | 2002-05-30 | ||
JP2002157656 | 2002-05-30 | ||
JP157655/2002 | 2002-05-30 | ||
JP157654/2002 | 2002-05-30 | ||
PCT/JP2003/006854 WO2003102091A1 (fr) | 2002-05-30 | 2003-05-30 | Materiau de revetement photocatalytique, materiau composite catalytique et procede de production correspondant. compositions de revetement aqueuses autonettoyantes et element autonettoyant |
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CN1656183A CN1656183A (zh) | 2005-08-17 |
CN1328332C true CN1328332C (zh) | 2007-07-25 |
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US (2) | US7572486B2 (zh) |
EP (2) | EP2316895B8 (zh) |
KR (2) | KR101082721B1 (zh) |
CN (1) | CN1328332C (zh) |
AU (1) | AU2003241999A1 (zh) |
DK (1) | DK2316895T3 (zh) |
ES (1) | ES2425840T3 (zh) |
HK (1) | HK1079231A1 (zh) |
WO (1) | WO2003102091A1 (zh) |
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KR100701802B1 (ko) * | 2005-09-09 | 2007-03-30 | 대주전자재료 주식회사 | 친수성 광촉매로 코팅된 애자 |
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- 2003-05-30 WO PCT/JP2003/006854 patent/WO2003102091A1/ja active Application Filing
- 2003-05-30 CN CNB038124440A patent/CN1328332C/zh not_active Expired - Fee Related
- 2003-05-30 DK DK10011545.0T patent/DK2316895T3/da active
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- 2003-05-30 ES ES10011545T patent/ES2425840T3/es not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
DK2316895T3 (da) | 2013-08-26 |
EP1512728A4 (en) | 2005-08-10 |
EP1512728B1 (en) | 2014-01-01 |
CN1656183A (zh) | 2005-08-17 |
EP2316895B1 (en) | 2013-05-29 |
KR100986860B1 (ko) | 2010-10-08 |
KR101082721B1 (ko) | 2011-11-15 |
EP2316895B8 (en) | 2013-10-30 |
AU2003241999A8 (en) | 2003-12-19 |
US7572486B2 (en) | 2009-08-11 |
US20050277543A1 (en) | 2005-12-15 |
US8524325B2 (en) | 2013-09-03 |
KR20100063809A (ko) | 2010-06-11 |
EP2316895A1 (en) | 2011-05-04 |
KR20050013560A (ko) | 2005-02-04 |
EP1512728A1 (en) | 2005-03-09 |
ES2425840T3 (es) | 2013-10-17 |
HK1079231A1 (en) | 2006-03-31 |
AU2003241999A1 (en) | 2003-12-19 |
US20090226620A1 (en) | 2009-09-10 |
WO2003102091A1 (fr) | 2003-12-11 |
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