CN1322580C - 胶粘带 - Google Patents
胶粘带 Download PDFInfo
- Publication number
- CN1322580C CN1322580C CNB028164075A CN02816407A CN1322580C CN 1322580 C CN1322580 C CN 1322580C CN B028164075 A CNB028164075 A CN B028164075A CN 02816407 A CN02816407 A CN 02816407A CN 1322580 C CN1322580 C CN 1322580C
- Authority
- CN
- China
- Prior art keywords
- adhesive
- epoxy resin
- compound
- energy irradiation
- adhesive tape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002390 adhesive tape Substances 0.000 title claims abstract description 30
- 239000000853 adhesive Substances 0.000 claims abstract description 85
- 230000001070 adhesive effect Effects 0.000 claims abstract description 85
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 69
- 239000003822 epoxy resin Substances 0.000 claims abstract description 68
- 150000001875 compounds Chemical class 0.000 claims abstract description 54
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 17
- 238000006116 polymerization reaction Methods 0.000 claims description 46
- HECLRDQVFMWTQS-UHFFFAOYSA-N Dicyclopentadiene Chemical group C1C2C3CC=CC3C1C=C2 HECLRDQVFMWTQS-UHFFFAOYSA-N 0.000 claims description 39
- 239000004593 Epoxy Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 15
- 238000007725 thermal activation Methods 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 239000012790 adhesive layer Substances 0.000 abstract 3
- 230000005855 radiation Effects 0.000 abstract 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 abstract 1
- 230000001464 adherent effect Effects 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 21
- -1 siloxanes Chemical class 0.000 description 19
- 239000000203 mixture Substances 0.000 description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000005520 cutting process Methods 0.000 description 10
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 9
- 239000005056 polyisocyanate Substances 0.000 description 9
- 229920001228 polyisocyanate Polymers 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 150000002924 oxiranes Chemical class 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000012948 isocyanate Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- 239000004821 Contact adhesive Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 3
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 150000002466 imines Chemical group 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- APZPSKFMSWZPKL-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)CO APZPSKFMSWZPKL-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- MWKAGZWJHCTVJY-UHFFFAOYSA-N 3-hydroxyoctadecan-2-one Chemical compound CCCCCCCCCCCCCCCC(O)C(C)=O MWKAGZWJHCTVJY-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- GHUXAYLZEGLXDA-UHFFFAOYSA-N 8-azido-5-ethyl-6-phenylphenanthridin-5-ium-3-amine;bromide Chemical compound [Br-].C12=CC(N=[N+]=[N-])=CC=C2C2=CC=C(N)C=C2[N+](CC)=C1C1=CC=CC=C1 GHUXAYLZEGLXDA-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- 229920012485 Plasticized Polyvinyl chloride Polymers 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 238000001994 activation Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- CSNNWDJQKGMZPO-UHFFFAOYSA-N benzoic acid;2-hydroxy-1,2-diphenylethanone Chemical compound OC(=O)C1=CC=CC=C1.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 CSNNWDJQKGMZPO-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- ZNAAXKXXDQLJIX-UHFFFAOYSA-N bis(2-cyclohexyl-3-hydroxyphenyl)methanone Chemical compound C1CCCCC1C=1C(O)=CC=CC=1C(=O)C1=CC=CC(O)=C1C1CCCCC1 ZNAAXKXXDQLJIX-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000000640 hydroxylating effect Effects 0.000 description 1
- 150000004693 imidazolium salts Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006264 polyurethane film Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- IUCJMVBFZDHPDX-UHFFFAOYSA-N tretamine Chemical compound C1CN1C1=NC(N2CC2)=NC(N2CC2)=N1 IUCJMVBFZDHPDX-UHFFFAOYSA-N 0.000 description 1
- 229950001353 tretamine Drugs 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3218—Carbocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
- C08G59/4021—Ureas; Thioureas; Guanidines; Dicyandiamides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/101—Esters; Ether-esters of monocarboxylic acids
- C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/35—Heat-activated
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
- C08L2666/04—Macromolecular compounds according to groups C08L7/00 - C08L49/00, or C08L55/00 - C08L57/00; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2463/00—Presence of epoxy resin
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2852—Adhesive compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2852—Adhesive compositions
- Y10T428/287—Adhesive compositions including epoxy group or epoxy polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2852—Adhesive compositions
- Y10T428/2878—Adhesive compositions including addition polymer from unsaturated monomer
- Y10T428/2891—Adhesive compositions including addition polymer from unsaturated monomer including addition polymer from alpha-beta unsaturated carboxylic acid [e.g., acrylic acid, methacrylic acid, etc.] Or derivative thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Die Bonding (AREA)
- Epoxy Resins (AREA)
Abstract
本文所述的是一种胶粘带,它包括基片以及其上叠加的粘合剂层,所述粘合剂层包含粘着组分(A)、环氧树脂(B)、热活化的潜在环氧树脂固化剂(C)、可能量辐照聚合的化合物(D)以及光聚合引发剂(E),其中,所述环氧树脂(B)与可能量辐照聚合的化合物(D)中的任一种或两种,其分子中具有二环戊二烯骨架。所提供的胶粘带具有粘合剂层,它可以减少粘合剂固化产物的吸水率,并且可以降低其在热压粘结时的弹性模量。
Description
发明领域
本发明涉及一种新型的压敏胶粘带。更具体的是,本发明涉及一种压敏胶粘带,它尤其适用于切割硅片工艺等,以及将切割所获得的芯片粘合到引线框上。
发明背景
将半导体硅片或砷化镓晶片制成大直径形式。切割该晶片,分成(切割成)小的单元片(IC片),并转移到随后的装配步骤中。尤其在这一工艺中,切割、清洗、干燥、膨胀并拾取所述粘着到压敏胶粘带上的半导体晶片,并将其转移到随后的粘合步骤中。
上述从半导体晶片切割步骤到拾取步骤中使用的压敏胶粘带具有足够大的粘合强度,在切割到干燥步骤中固定所述晶片,但在拾取步骤中不会使粘合剂附着到晶片上。
在所述芯片粘合步骤中,使用芯片粘合用粘合剂,如环氧粘合剂将已经拾取的芯片粘合到引线框上。这样制得半导体器件。但是,当IC片极小时,施加适量的粘合剂是很难的,存在粘合剂从IC片溢流的问题。另一方面,当IC片很大时,则存在如下问题:不能达到令人满意的粘合强度,这是因为例如粘合剂量不够。而且,施涂这种芯片粘合用粘合剂很费力。因此,要求能使所述工艺简化的一种改进。
为了解决上述问题,提出了各种晶片粘结用的压敏胶粘带,它具有晶片固定功能和芯片粘合功能(例如可见,日本特许公开公报No.2(1990)-32181)。
日本特许公开公报No.2(1990)32181揭示了一种包含基片以及其上叠加的粘合剂层的压敏胶粘带,所述粘合剂层由包含(甲基)丙烯酸酯共聚物、通用环氧树脂、通用的可光聚合的低分子量化合物、热活化的潜在环氧树脂固化剂以及光聚合引发剂的组合物制得。在切割晶片时,这种粘合剂层具有固定晶片的功能。在完成切割之后,当暴露在能量辐照下时,所述粘合剂层固化,从而降低粘合剂层和基材之间的粘合强度。因此,在拾取IC片时,所述压敏粘合剂层可以和IC片一起脱离基材。将所述具有压敏粘合剂层的IC片安装到引线框上,并加热。因此,所述粘合剂层中包含的环氧树脂提供粘合强度,由此将IC片粘合到引线框上。
上述公报中揭示了用于晶片粘结的胶粘带能够进行所谓的直接芯片粘合,能够省去施涂芯片粘合用粘合剂的步骤。即在通过能量辐照固化和热固化进行芯片粘合中,胶粘带粘合剂层中的所有组分都固化,使晶片和引线框以极大的强度相互粘合。
之后,通常通过回流步骤进行引线粘合。
近年来,已经研制了不含铅的焊料用于回流步骤中,为的是克服环境问题。所述不含铅的焊料的熔化温度高于所述包含铅的常规焊料,从而不可避免地使回流温度变高。但是,当回流温度高时,即使粘合剂层中包含少量水也会蒸发并膨胀,从而导致出现封装破裂。
而且,在芯片粘合时,要求所述粘合剂层完全按照粘附表面的外形。尤其是为了提高热压粘结时的性质,要求在高温下进行热压粘结时粘合剂层的弹性模量低。但是,上述常规粘合剂不能满足这一点。因此,仍旧要求改进压敏粘合剂。
本发明目的
鉴于上述已有技术作出本发明。本发明的目的是提供具有粘合剂层的胶粘带,该粘合剂层能降低粘合剂固化产物的吸水率,并且能降低其在热压粘结时的弹性模量。
发明概述
本发明的胶粘带包含基片以及其上叠加的粘合剂层,所述粘合剂层包含粘着组分(A)、环氧树脂(B)、热活化的潜在环氧树脂固化剂(C)、可能量辐照聚合的化合物(D)以及光聚合引发剂(E),
其中,所述环氧树脂(B)与可能量辐照聚合的化合物(D)中的任一种或两种,其分子中具有二环戊二烯骨架。
在本发明中,优选所述环氧树脂(B)具有二环戊二烯骨架,由如下通式表示:
其中,n是0-10的整数。
也优选所述可能量辐照聚合的化合物(D)具有二环戊二烯骨架,由如下通式表示:
式中,R是氢原子或者甲基。
本发明提供具有粘合剂层的胶粘带,它能降低粘合剂固化产物的吸水率,由此避免回流时出现的封装破裂,并且能降低其在热压粘结时的弹性模量,由此确保其很好按照粘附表面的外形。
发明详述
如上所述,本发明的胶粘带包含基片以及其上叠加的粘合剂层,所述粘合剂层包含粘着组分(A)、环氧树脂(B)、热活化的潜在环氧树脂固化剂(C)、可能量辐照聚合的化合物(D)以及光聚合引发剂(E),
其中,所述环氧树脂(B)与可能量辐照聚合的化合物(D)中的任一种或两种,其分子中具有二环戊二烯骨架。
首先,详细说明制备所述粘合剂层的各组分。
虽然可以使用丙烯酸、聚酯、氨基甲酸酯、硅氧烷和天然橡胶压敏粘合剂和其它各种通用压敏粘合剂作为粘着组分(A),但是本发明尤其优选丙烯酸压敏粘合剂。
至于所述丙烯酸压敏粘合剂,可提及例如由来自(甲基)丙烯酸酯单体和(甲基)丙烯酸衍生物的结构单元构成的(甲基)丙烯酸酯共聚物。至于所述(甲基)丙烯酸酯单体,可以使用(甲基)丙烯酸环烷基酯、(甲基)丙烯酸苄酯以及具有1-18个碳原子的烷基的(甲基)丙烯酸烷基酯。其中,尤其优选使用具有1-18个碳原子的烷基的(甲基)丙烯酸烷基酯,如丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸丙酯、甲基丙烯酸丙酯、丙烯酸丁酯或者甲基丙烯酸丁酯。至于(甲基)丙烯酸衍生物,可提及例如,具有缩水甘油基的(甲基)丙烯酸缩水甘油酯或者具有羟基的丙烯酸羟乙酯。
(甲基)丙烯酸酯共聚物中来自(甲基)丙烯酸缩水甘油酯的结构单元的含量通常为0-80摩尔%,较好是5-50摩尔%。将缩水甘油基引入(甲基)丙烯酸酯共聚物提高了(甲基)丙烯酸酯共聚物和环氧树脂(B)的相容性,提高了固化产物的Tg,并提高热稳定性。将羟基化单体如丙烯酸羟乙酯引入(甲基)丙烯酸酯共聚物中便于控制对粘合体的粘附和压敏粘合剂性质。
丙烯酸压敏粘合剂的分子量较好为100,000或更大,更好是150,000-1,000,000。丙烯酸压敏粘合剂的玻璃化转变温度通常为20℃或以下,较好为-70℃到0℃。所述丙烯酸压敏粘合剂在室温(23℃)下具有粘性。
用于环氧树脂(B)中所使用的,具有二环戊二烯骨架的环氧树脂,其分子中各自具有二环戊二烯骨架和反应性环氧基。在室温下,所述环氧树脂通常为固体,其软化温度较好是约40-90℃,更好是45-80℃,最好是50-70℃。这种具有二环戊二烯骨架的环氧树脂的分子量较好是430-3000,更好是700-2500,最好是1000-2000。所述具有二环戊二烯骨架的环氧树脂的环氧当量较好为150-1000克/当量,更好是200-800克/当量,最好是210-400克/当量。
这些具有二环戊二烯骨架的环氧树脂(B)中,尤其优选使用具有如下通式的环氧树脂:
式中,n是0-10的整数。n较好是0-7,更好是0-5的整数。
其中n值在0-10范围内各不相同的环氧树脂的混合物可以作为具有二环戊二烯骨架的环氧树脂。例如,对于这种环氧树脂混合物,可以提及环氧树脂XD-1000-L和XD-1000-2L(商品名,由Nippon Kayaku Co.,Ltd.制造)。
这些具有二环戊二烯骨架的环氧树脂可以单独使用或者混合使用。
至于所述环氧树脂(B),当使用具有二环戊二烯骨架的环氧树脂,且它没有混合下述其它通用环氧树脂时,以100重量份上述粘着组分(A)计,较好加入5-1000重量份、更好是50-800重量份,最好是100-600重量份的环氧树脂。
而且,至于环氧树脂(B),可以使用混合其它通用环氧树脂的环氧树脂。至于所述通用环氧树脂,优选使用分子量约为300-2000的环氧树脂。尤其优选使用分子量为300-500的普通液态环氧树脂和分子量为400-2000的普通固态环氧树脂的掺合物。这种通用环氧树脂的环氧当量通常为50-5000克/当量。至于这种通用环氧树脂,可提及例如酚类如双酚A、双酚F、间苯二酚、苯基酚醛清漆树脂和甲酚-线性酚醛树脂的缩水甘油醚;醇如丁二醇、聚乙二醇和聚丙二醇的缩水甘油醚;羧酸如邻苯二甲酸、间苯二甲酸和四氢邻苯二甲酸的缩水甘油醚;用缩水甘油基取代连接到苯胺异氰脲酸酯的氮原子上的活性氢而获得的缩水甘油基或者烷基缩水甘油基环氧树脂;以及通过例如氧化分子内碳碳双键由此包含环氧基而形成所谓脂环族环氧化物,如乙烯基环己烷二环氧化物、3,4-环氧基环己基甲基-3,4-二环己烷羧酸酯和2-(3-,4-环氧基)环己基-5,5-螺(3,4-环氧基)环己烷-间-二噁烷。
其中,双酚缩水甘油基环氧树脂较好用作通用环氧树脂。这些通用环氧树脂可以单独使用或混合使用。
在本发明中,下述可能量辐照聚合的化合物(D)和环氧树脂(B)中至少任一种的分子中必须具有二环戊二烯骨架。
至于环氧树脂(B),当不使用具有二环戊二烯骨架的环氧树脂,并使用其它通用环氧树脂(不具有二环戊二烯骨架)时(当使用具有二环戊二烯骨架的可能量辐照聚合的化合物(D)时),以100重量份的上述粘着组分(A)计,所述其它通用环氧树脂的加入量较好为5-1000重量份,更好是50-800重量份,最好是100-600重量份。
当和其它通用环氧树脂一起混合使用所述具有二环戊二烯骨架的环氧树脂时,以100重量份的上述粘着组分(A)计,所加入的环氧树脂(B)的总量较好是5-1000重量份,更好是50-800重量份,最好是100-600重量份。在这种混合物中,具有二环戊二烯骨架的环氧树脂和其它通用环氧树脂的比例较好是1∶99-99∶1,更好是5∶95-50∶50,最好是10∶90-40∶60。
所述热活化的潜在环氧树脂固化剂(C)是在室温下不会和环氧树脂(B)反应,但是当加热到一定温度或以上时被活化而和环氧树脂(B)反应的固化剂。
所述热活化的潜在环氧树脂固化剂(C)的活化可以通过各种方法来完成,例如,通过加热诱导的化学反应形成活性种(阴离子和阳离子)的方法;在室温附近将所述热活化的潜在环氧树脂固化剂(C)稳定分散到环氧树脂(B)中,然后在高温下溶解到环氧树脂(B)中,由此引发固化反应的方法;将固化剂包在分子筛中,并在高温下浸出,由此引发固化反应的方法;以及使用微胶囊的方法。
所述热活化的潜在环氧树脂固化剂(C)可以单独使用或者混合使用。尤其是宜使用双氰胺、咪唑化合物以及它们的混合物作为热活化的潜在环氧树脂固化剂(C)。
以100重量份的具有二环戊二烯骨架的环氧树脂和其它通用环氧树脂的总量计,所述热活化的潜在环氧树脂固化剂(C)的用量通常为0.1-20重量份,较好是0.5-15重量份,最好是1-10重量份。
具有二环戊二烯骨架的可能量辐照聚合的化合物可用作可能量辐照聚合的反应物(D),其分子中具有二环戊二烯骨架和一个或多个,较好是20-10个可能量辐照聚合的基团。所述可能量辐照聚合的化合物(D)的分子量通常约为150-840,较好是250-500。
至于具有二环戊二烯骨架的可能量辐照聚合的化合物,优选使用具有如下通式的可聚合的化合物:
其中R是氢原子或者甲基,较好是氢原子。
至于所述具有二环戊二烯骨架的可能量辐照聚合的化合物(D),可提及例如R-684(商品名,由Nippon Kayaku Co.Ltd.制备)。
所述各自具有二环戊二烯骨架的可能量辐照聚合的化合物(D)可以单独使用或者混合使用。
至于可能量辐照聚合的化合物(D),当使用具有二环戊二烯骨架的可能量辐照聚合的化合物,而不使用下述其它通用的可能量辐照聚合的化合物时,以100重量份上述粘着组分(A)计,较好加入0.1-500重量份、更好是10-200重量份、最好是20-100重量份所述可能量辐照聚合的化合物(D)。
此外,至于可能量辐照聚合的化合物(D),所述具有二环戊二烯骨架的可能量辐照聚合的化合物可以和其它通用的可能量辐照聚合的化合物一起混合使用。通用的可能量辐照聚合的化合物,其分子中至少具有一个可聚合双键。其分子量通常为100-0000,较好是300-10000。例如,日本特许公开公报No.60(1985)-196956和60(1985)-223139中所述的低分子量化合物广泛用作上述通用的可能量辐照聚合的化合物。其例子包括丙烯酸酯化合物如三羟甲基丙烷三丙烯酸酯、四羟甲基甲烷四丙烯酸酯、季戊四醇三丙烯酸酯、双季戊四醇单羟基五丙烯酸酯、双季戊四醇六丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯和聚乙二醇二丙烯酸酯。
此外,可以使用具有官能团如羟基或者羧基的低聚物丙烯酸酯化合物,如酯低聚物丙烯酸酯、氨基甲酸酯丙烯酸酯低聚物、环氧改性的丙烯酸酯、聚酯丙烯酸酯、聚醚丙烯酸酯以及衣康酸低聚物。
至于可能量辐照聚合的化合物(D),当不使用具有二环戊二烯骨架的可能量辐照聚合的化合物,仅使用其它通用的可能量辐照聚合的化合物(不具有二环戊二烯骨架)时(当使用具有二环戊二烯骨架的环氧树脂(B)时),以100重量份上述粘着组分(A)计,较好加入0.1-500重量份、更好是10-200重量份、最好是20-100重量份的其它通用的可能量辐照聚合的化合物。
当所述具有二环戊二烯骨架的可能量辐照聚合的化合物和其它通用的可能量辐照聚合的化合物一起混合使用时,以100重量份上述粘着组分(A)计,所加入的可能量辐照聚合的化合物(D)的总量较好是0.1-500重量份,更好是10-200重量份,最好是20-100重量份。在这一混合物中,所述具有二环戊二烯骨架的可能量辐照聚合的化合物和其它通用的可能量辐照聚合的化合物的比例较好是1∶99-99∶1,更好是20∶80-70∶30,最好是40∶60-50∶50。
在用光辐照时,所述包含上述具有二环戊二烯骨架的可能量辐照聚合的化合物和/或其它通用的可能量辐照聚合的化合物的粘合剂固化。至于所述光,可以使用例如紫外光。
将所述光聚合引发剂(E)混合到上述粘合剂中,不仅可以减少聚合与固化的时间,还可以减少辐照剂量。
所述光聚合引发剂(E)可以选择例如二苯甲酮、乙酰苯、苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻异丙醚、苯偶姻异丁醚、苯偶姻苯甲酸、甲基苯偶姻苯甲酸甲酯、苯偶姻二甲基缩酮、2,4-二乙基噻吨酮、羟基环己基苯基甲酮、苄基二苯基硫醚、硫化四甲基秋兰姆、偶氮二异丁腈、苯偶酰、联苄基、联乙酰和β-氯蒽醌。
以100重量份的具有二环戊二烯骨架的可能量辐照聚合的化合物和其它通用的可能量辐照聚合的化合物的总量计,通常加入0.5-15重量份、较好是1.0-10重量份、更好是1.5-6重量份的上述光聚合引发剂(E)。
本发明胶粘带的粘合剂层包含上述粘着组分(A)、环氧树脂(B)、热活化的潜在环氧树脂固化剂(C)、可能量辐照聚合的化合物(D)以及光聚合引发剂(E)作为基本组分。
包含上述组分的粘合剂层具有如下性质:通过能量辐照固化,也可以通过加热固化。因此,所述胶粘带可以用作切割时固定晶片用的粘合剂,并且可以用作装配过程中将芯片热压粘合到引线框上的粘合剂。虽然这种热压粘合通常通过在80-150℃下加热来进行,但是本发明的粘合剂层在这一温度下的弹性模量低,可以使胶粘带完全按照粘附表面的外形,由此可以将芯片牢固粘合到引线框上。
最后,通过热固化提供具有高耐冲击性的固化产品。此外,所述固化产品具有优良的剪切强度和剥离强度的综合性能,即使暴露在恶劣的湿热环境中也能保持令人满意的粘合性能。而且,粘合剂层固化产物的吸水率很低,可以降低在回流步骤中出现封装破裂。
为了在芯片粘合后提供导电性能,所述压敏粘合剂层可以填充导电填料,如金、银、铜、镍、铝、不锈钢、碳、陶瓷或者通过用银镀镍和铝等制得的材料。此外,为了提供导热性能,所述压敏粘合剂层可以填充导热填料,如金、银、铜、镍、铝、不锈钢、硅、锗或其它金属材料或它们的合金。以100重量份所述粘合剂组分(即组分A+B+C+D+E)计,可以加入约10-400重量份的这些添加剂。
在暴露在能量辐照前,这种粘合剂层中可以加入有机多异氰酸酯化合物、有机多亚胺化合物等,用于调整其初始粘合强度和内聚强度。
所述有机多异氰酸酯化合物可以选自例如芳族多异氰酸酯化合物、脂族多异氰酸酯化合物、脂环族多异氰酸酯化合物、这些多异氰酸酯化合物的三聚体以及通过使这些多异氰酸酯化合物和多元醇化合物反应而制得的异氰酸酯封端的氨基甲酸酯预聚物。所述有机多异氰酸酯化合物的具体例子包括2,4-甲苯二异氰酸酯、2,6-甲苯二异氰酸酯、1,3-苯二亚甲基二异氰酸酯、1,4-苯二亚甲基二异氰酸酯、二苯基甲烷-4,4’-二异氰酸酯、二苯基甲烷-2,4’-二异氰酸酯、3-甲基二苯基甲烷二异氰酸酯、六亚甲基二异氰酸酯、异佛尔酮二异氰酸酯、二环己基甲烷-4,4’-二异氰酸酯、二环己基甲烷-2,4’-二异氰酸酯和赖氨酸异氰酸酯。
上述有机多亚胺化合物的具体例子包括N,N’-二苯基甲烷-4,4’-二(1-氮丙啶羧基酰胺)、三羟甲基丙烷-三-β-吖丙啶基丙酸酯、四羟甲基甲烷-三-β-吖丙啶基丙酸酯和N,N’-甲苯-2,4-二(1-氮丙啶羧基酰氨基)三亚乙基蜜胺。
以100重量份粘着组分(A)计,优选加入0-10重量份、尤其是0.1-5重量份,更好是0.5-2重量份的这些有机异氰酸酯化合物或者有机多亚胺化合物。
而且,可以往上述粘合剂层中加入抗静电试剂。加入抗静电试剂可以抑制在膨胀或拾取步骤中产生静电,提高芯片的可靠性。合适的抗静电试剂例子包括通常已知的活化剂,如阴离子、阳离子、非离子及两性活化剂。以所述粘合剂层的重量计,优选使用0-50重量%,尤其是0-30重量%的抗静电试剂。
例如,当使用紫外光作为能量辐照时,使用透明薄膜作为本发明胶粘带的基片。合适透明薄膜的例子包括聚乙烯薄膜、聚丙烯薄膜、聚丁烯薄膜、聚丁二烯薄膜、聚甲基戊烯薄膜、聚氯乙烯薄膜、氯乙烯共聚物薄膜、聚对苯二甲酸乙二酯薄膜、聚氨酯薄膜、乙烯/乙酸乙烯酯薄膜、离聚物树脂薄膜、乙烯/(甲基)丙烯酸共聚物薄膜、乙烯/(甲基)丙烯酸酯共聚物薄膜、聚苯乙烯薄膜和聚碳酸酯薄膜。此外,可以使用由上述薄膜形成的交联的薄膜。而且,可以使用由上述薄膜形成的层压薄膜。另一方面,当使用电子束作为能量辐照,则并不要求所述基片透明。因此,不仅可以使用上述透明薄膜,也可以使用着色制得的不透明薄膜、含氟树脂薄膜等。
所述基片的表面张力较好为40达因/厘米或更少,更好是37达因/厘米或更少,最好是35达因/厘米或更少。在芯片粘合时,这可以容易地将本发明胶粘带的粘合剂层转移到硅片上。上述表面张力低的基片可以通过选择合适的材料来获得。而且,这可以通过使基片表面进行剥离处理如施涂硅氧烷树脂等来获得。
所述基片的厚度通常约为10-300微米,较好是20-200微米,更好是50-150微米。
本发明的胶粘带可以通过常规装置如辊涂器、凹版涂布器、口模式涂布器或者反向涂布器将包含上述组分的粘合剂组合物施涂到基片上,并干燥所述涂层,由此形成粘合剂层来制得。依照其必要性,所述粘合剂组合物在进行涂布操作前可以溶解或分散在溶剂中。
通常,优选由此形成的粘合剂层的厚度为3-100微米,尤其是10-60微米。以如下所述方式使用由此制得的胶粘带。
将本发明的胶粘带粘附到硅片的一个主表面上,通过胶粘带将硅片固定到切割单元上。使用切割装置如切割锯,将所述具有胶粘带的硅片切割成IC片。
将所得粘到IC片上的胶粘带暴露在能量辐照下。至于本发明可用的能量辐照,例如可以是紫外光(中心波长=约365nm)或电子束。当使用紫外光作为能量辐照时,通常将辐照强度设定在20-500mW/cm2,辐照时间设定在0.1-150秒。而且,例如,在使用电子束辐照时,条件设定可以参考上述使用紫外光进行辐照时使用的条件。此外,在暴露到能量辐照下时,可以进行辅助加热。
暴露在能量辐照下可以使基片和所述粘到IC片的一个主表面上的粘合剂层分离。在切割操作前可以暴露在能量辐照下。
将所得的粘有粘合剂层的IC片装配到引线框上,并加热,使粘合剂层的环氧树脂(B)固化。由此,所述IC片和引线框相互粘结。所述加热温度通常约为80-300℃,较好是80-250℃,更好是80-170℃。加热时间通常是1-120分钟,较好是5-60分钟。由于加热的结果,所述可热固化的粘合剂组分固化,由此在IC片和引线框之间形成强粘合。而且,包含上述具体组分的粘合剂层在热压粘合时的弹性模量低,使得所述粘合剂层能完全按照所述粘着表面的外形,使所述粘着物和IC片能以满意的强度相互粘结。这时,所述粘合剂层中所含可能量辐照聚合的化合物(D)固化之后,粘合剂层所表现出的弹性模量(在150℃时)较好是1.0×101至8.0×103Pa,更好是3.0×101至5.0×103Pa,最好是1.0×102至1.0×103Pa。
此外,环氧树脂(B)固化之后,所述固化成品的吸水系数极低,即使在回流时置于高温下,所述固化成品也不会出现水的蒸发,这样就可以减少出现封装破裂。因此,所述固化成品的吸水系数(置于85℃的85%RH环境中168小时后测得)较好为2.3%或以下,更好是2.0%或以下,最好是1.9%或以下。
除了上述用途,本发明的胶粘带可以用于粘结半导体化合物、玻璃、陶瓷和金属等。
发明效果
借助上述本发明,提供一种具有粘合剂层的胶粘带,该粘合剂层最终形成吸水率低的粘合剂固化产物,由此可以防止在回流时出现封装破裂,同时它可以降低热压粘结时的弹性模量,由此使之能很好地按照粘着表面的外形。
实施例
参考以下实施例进一步说明本发明,所述实施例决不是用于限制本发明。
在以下实施例和对比例中,按照以下方式测量“吸水系数”、“弹性模量”和“剥离强度”。
“吸水系数”
将胶粘带片相互堆叠,形成厚度为1.0±0.2mm的层压片,并切成大小50mm×50mm。用紫外光照射所述层压片的两个主表面,并在160℃下加热1小时,由此进行热固化。将由此制得的样品静置在85℃85%相对湿度的环境中168小时。由样品的任何增重来计算吸水系数。
“弹性模量”
对于实施例和对比例中各粘合剂,制备一种不含任何热活化的潜在环氧树脂固化剂(C)的粘合剂。用200mJ/cm2紫外光照射其样品的两个主表面。对于所得的样品,按照扭距剪切方法,使用RDA II(由Rheometric Scientific F.E.Ltd.制造)在1Hz下测量其在150℃下的弹性模量。
“剥离模量”
将各胶粘带粘结到350微米厚硅片的#2000抛光表面上,用230mJ/cm2光量的紫外光照射,并切割成大小10mm×10mm。之后,将通过分离基片和粘合剂层而获得的具有粘合剂的各硅片在150℃下热压粘结到150微米厚大小为10mm×50mm的铜片上,时间1秒,再使其静置在160℃下的恒温箱中1小时,由此进行粘合剂层的热固化。这样就制得用于测量剥离强度的样品。
将样品的硅片侧粘结固定,以90°角剥离所述铜片,测量所述剥离强度(mN/10mm)。剥离速度为50毫米/分钟。
在以下实施例和对比例中,使用以下材料作为粘着组分(A)、环氧树脂(B)、热活化的潜在环氧树脂固化剂(C)、可能量辐照聚合的化合物(D)以及光聚合引发剂(E)。
(A)附着组分
重均分子量为900,000,玻璃化转变温度为-28℃的共聚物,它通过共聚55重量份丙烯酸丁酯、10重量份甲基丙烯酸甲酯、20重量份甲基丙烯酸缩水甘油酯和15重量份丙烯酸2-羟乙酯制得。
(B)环氧树脂
(B1):液态双酚A环氧树脂(环氧当量:180-200,软化点:无,分子量:约420)
(B2):固态双酚A环氧树脂(环氧当量:800-900,软化点:93℃,分子量:约1700)
(B3):具有二环戊二烯骨架的环氧树脂(商品名:XD-1000-L,由Nipponkayaku Co.Ltd.制备,环氧当量:240-250,软化点:66℃,n=0.6-0.7)
(B4):具有二环戊二烯骨架的环氧树脂(商品名:XD-1000-2L,由Nipponkayaku Co.Lt d.制备,环氧当量:240-250,软化点:57℃,n=0.3-0.4)
(B5):固态间-甲酚酚醛清漆环氧树脂(环氧当量:210-230,软化点:92℃,分子量:约1650)
(C)热活化的潜在环氧树脂固化剂(环氧树脂硬化剂)
(C1):双氰胺(商品名:Hardener 3636AS,由Asahi Denka Kogyo K.K.制备)
(C2):2-苯基-4,5-二羟基甲基咪唑(商品名:Curezol 2PHZ,由ShikokuChemicals Corporation制备)
(D)可能量辐照聚合的化合物
(D1):具有二环戊二烯骨架的可能量辐照聚合的化合物(商品名:KayaradR684,由Nippon kayaku Co.Ltd.制备,分子量:304)
(D2):双季戊四醇六丙烯酸酯(分子量578)。
(E)光聚合引发剂
1-羟基环己基苯基酮
(F)其它
交联剂:芳族多异氰酸酯(甲苯二异氰酸酯的三羟甲基丙烷加合物)
实施例1
混合表1所述比例的组分,制得粘合剂组合物。将这种粘合剂组合物施涂到90微米厚的层压薄膜基片的乙烯/甲基丙烯酸共聚物层的一面上,所述层压薄膜由增塑PVC层和乙烯/甲基丙烯酸共聚物层(表面张力:35达因/厘米)组成,在所述基片上形成20微米的粘合剂层。由此制得胶粘带。
以上述方式测量所得胶粘带的“吸水系数”、“弹性模量”和“剥离强度”。结果列于表1中。
实施例2-4和对比例1
除了如表1所示改变加入组分的比例外,重复实施例1中的相同操作。结果列于表1中。
表1
粘合剂层的组成(重量份) | 吸水系数(%) | 弹性模量(150℃)(Pa) | 剥离强度(mN/10mm) | ||||||||||||
粘着组分(A) | 环氧树脂 | 环氧固化剂 | 可能量辐照聚合的化合物 | 光聚合引发剂(E) | 交联剂(F) | ||||||||||
B1 | B2 | B3 | B4 | B5 | C1 | C2 | D1 | D2 | |||||||
实施例1 | 20 | 20 | 40 | 20 | 1 | 1 | 10 | 0.3 | 0.3 | 1.89 | 5.21×102 | 7000 | |||
实施例2 | 20 | 20 | 40 | 20 | 1 | 1 | 10 | 0.3 | 0.3 | 1.87 | 3.14×102 | 6500 | |||
实施例3 | 20 | 20 | 40 | 20 | 1 | 1 | 10 | 0.3 | 0.3 | 2.09 | 6.03×102 | 7800 | |||
实施例4 | 20 | 20 | 40 | 20 | 1 | 1 | 10 | 0.3 | 0.3 | 2.24 | 1.10×103 | 7500 | |||
对比例1 | 20 | 20 | 40 | 20 | 1 | 1 | 10 | 0.3 | 0.3 | 2.59 | 8.85×103 | 8000 |
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001250134A JP4869517B2 (ja) | 2001-08-21 | 2001-08-21 | 粘接着テープ |
JP250134/2001 | 2001-08-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1545729A CN1545729A (zh) | 2004-11-10 |
CN1322580C true CN1322580C (zh) | 2007-06-20 |
Family
ID=19079017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028164075A Expired - Fee Related CN1322580C (zh) | 2001-08-21 | 2002-08-08 | 胶粘带 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7135224B2 (zh) |
EP (1) | EP1419527B1 (zh) |
JP (1) | JP4869517B2 (zh) |
KR (1) | KR100755175B1 (zh) |
CN (1) | CN1322580C (zh) |
DE (1) | DE60224543T2 (zh) |
MY (1) | MY134364A (zh) |
TW (1) | TWI299354B (zh) |
WO (1) | WO2003017363A1 (zh) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4565804B2 (ja) | 2002-06-03 | 2010-10-20 | スリーエム イノベイティブ プロパティズ カンパニー | 被研削基材を含む積層体、その製造方法並びに積層体を用いた極薄基材の製造方法及びそのための装置 |
US7534498B2 (en) | 2002-06-03 | 2009-05-19 | 3M Innovative Properties Company | Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body |
KR100534406B1 (ko) * | 2002-08-03 | 2005-12-08 | 김영길 | 정전기에 의한 쇼크를 방지할 수 있는 스티커를 부착한 차량용 도어 |
JP4107417B2 (ja) | 2002-10-15 | 2008-06-25 | 日東電工株式会社 | チップ状ワークの固定方法 |
KR100583713B1 (ko) * | 2003-01-22 | 2006-05-25 | 간사이 페인트 가부시키가이샤 | 광파이버용 피복조성물 및 피복 광파이버 |
JP4025223B2 (ja) * | 2003-03-17 | 2007-12-19 | 住友ベークライト株式会社 | ダイボンディング用フィルム状接着剤並びにそれを用いた半導体装置の製造方法及び半導体装置 |
JP4004047B2 (ja) * | 2003-03-25 | 2007-11-07 | 住友ベークライト株式会社 | ダイシングシート機能付きダイアタッチフィルム並びにそれを用いた半導体装置の製造方法及び半導体装置 |
JP3710457B2 (ja) * | 2003-05-22 | 2005-10-26 | 住友ベークライト株式会社 | ダイシングシート機能付きダイアタッチフィルム、それを用いた半導体装置の製造方法及び半導体装置 |
JP4283596B2 (ja) * | 2003-05-29 | 2009-06-24 | 日東電工株式会社 | チップ状ワークの固定方法 |
KR100850772B1 (ko) | 2003-07-08 | 2008-08-06 | 린텍 코포레이션 | 다이싱·다이 본딩용 점접착 시트 및 반도체 장치의 제조방법 |
JP2005150235A (ja) * | 2003-11-12 | 2005-06-09 | Three M Innovative Properties Co | 半導体表面保護シート及び方法 |
JP4405246B2 (ja) | 2003-11-27 | 2010-01-27 | スリーエム イノベイティブ プロパティズ カンパニー | 半導体チップの製造方法 |
US20050119359A1 (en) * | 2003-12-02 | 2005-06-02 | Shelby Marcus D. | Void-containing polyester shrink film |
JP4443962B2 (ja) * | 2004-03-17 | 2010-03-31 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP4027332B2 (ja) * | 2004-03-19 | 2007-12-26 | リンテック株式会社 | 半導体用粘接着シートおよび半導体装置の製造方法 |
US20060252234A1 (en) * | 2004-07-07 | 2006-11-09 | Lintec Corporation | Hardenable pressure sensitive adhesive sheet for dicing/die-bonding and method for manufacturing semiconductor device |
US20070004813A1 (en) * | 2004-09-16 | 2007-01-04 | Eastman Chemical Company | Compositions for the preparation of void-containing articles |
US20060121219A1 (en) * | 2004-12-07 | 2006-06-08 | Eastman Chemical Co. | Void-containing polyester shrink film with improved density retention |
JP2006054437A (ja) * | 2005-07-08 | 2006-02-23 | Sumitomo Bakelite Co Ltd | ダイシングシート機能付きダイアタッチフィルム、それを用いた半導体装置の製造方法及び半導体装置 |
TWI448527B (zh) * | 2005-11-08 | 2014-08-11 | Toyo Ink Mfg Co | 硬化性電磁波遮蔽性黏著性薄膜,其製造方法,及其使用方法,暨電磁波遮蔽物之製造方法及電磁波遮蔽物 |
US20080063871A1 (en) * | 2006-09-11 | 2008-03-13 | Jung Ki S | Adhesive film composition for semiconductor assembly, associated dicing die bonding film and semiconductor package |
KR100909169B1 (ko) * | 2006-09-11 | 2009-07-23 | 제일모직주식회사 | 선 경화형 반도체 조립용 접착 필름 조성물 |
EP2063460A4 (en) * | 2006-09-12 | 2011-08-03 | Nitto Denko Corp | Dicing / CHIP BOND FILM |
JP2007043198A (ja) * | 2006-10-20 | 2007-02-15 | Sumitomo Bakelite Co Ltd | ダイボンディング用フィルム状接着剤並びにそれを用いた半導体装置の製造方法及び半導体装 |
JP4356730B2 (ja) * | 2006-10-20 | 2009-11-04 | 住友ベークライト株式会社 | ダイボンディング用フィルム状接着剤並びにそれを用いた半導体装置の製造方法及び半導体装置 |
EP2087021B1 (de) * | 2006-10-27 | 2011-12-28 | Basf Se | Strahlungshärtbare mischung, enthaltend niedermolekulare, ethylenisch ungesättigte verbindungen mit nicht-aromatischen ringsystemen |
TW200842174A (en) * | 2006-12-27 | 2008-11-01 | Cheil Ind Inc | Composition for pressure sensitive adhesive film, pressure sensitive adhesive film, and dicing die bonding film including the same |
JP4778472B2 (ja) * | 2007-05-08 | 2011-09-21 | 日東電工株式会社 | 粘着型光学フィルムおよび画像表示装置 |
WO2009001492A1 (ja) * | 2007-06-22 | 2008-12-31 | Sumitomo Bakelite Co., Ltd. | 接着フィルムおよびこれを用いた半導体装置 |
CN102876277B (zh) * | 2007-10-05 | 2014-12-10 | 日立化成株式会社 | 粘接剂组合物和使用该组合物的电路连接膜,以及电路部件的连接方法和电路连接体 |
JP4717051B2 (ja) * | 2007-11-08 | 2011-07-06 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP4893640B2 (ja) * | 2008-01-22 | 2012-03-07 | 住友ベークライト株式会社 | 半導体用接着フィルム及びこれを用いた半導体装置 |
WO2009113296A1 (ja) * | 2008-03-14 | 2009-09-17 | 住友ベークライト株式会社 | 半導体素子接着フィルム形成用樹脂ワニス、半導体素子接着フィルム、および半導体装置 |
KR101075192B1 (ko) | 2009-03-03 | 2011-10-21 | 도레이첨단소재 주식회사 | 전자부품 제조용 점착테이프 |
JP2010229218A (ja) * | 2009-03-26 | 2010-10-14 | Dic Corp | 硬化性樹脂組成物、その硬化物、及び電子部品用樹脂材料 |
KR101038741B1 (ko) * | 2010-04-07 | 2011-06-03 | 한국전기연구원 | 팬텀을 이용하여 구조좌표를 측정하기 위한 x―선 유방암진단 시스템 및 그 방법 |
JP5686436B2 (ja) * | 2011-03-31 | 2015-03-18 | リンテック株式会社 | 粘着剤組成物及び粘着シート |
JP5644896B2 (ja) | 2012-07-04 | 2014-12-24 | 大日本印刷株式会社 | 粘接着層及び粘接着シート |
US10329393B2 (en) | 2012-12-12 | 2019-06-25 | Eastman Chemical Company | Copolysters plasticized with polymeric plasticizer for shrink film applications |
TWI486419B (zh) * | 2012-12-27 | 2015-06-01 | Hon Hai Prec Ind Co Ltd | 膠帶 |
JP5678976B2 (ja) * | 2013-03-07 | 2015-03-04 | Dic株式会社 | 硬化性樹脂組成物、その硬化物、及び電子部品用樹脂材料 |
KR102031657B1 (ko) * | 2013-03-11 | 2019-10-14 | 동우 화인켐 주식회사 | 광학용 점착제 조성물 및 이를 함유한 점착필름 |
KR102356171B1 (ko) | 2014-03-24 | 2022-01-26 | 린텍 가부시키가이샤 | 보호막 형성 필름, 보호막 형성용 시트, 워크 또는 가공물의 제조 방법, 검사 방법, 양품으로 판단된 워크 및 양품으로 판단된 가공물 |
JP6488554B2 (ja) | 2014-04-23 | 2019-03-27 | 大日本印刷株式会社 | コンクリートの剥落防止工事の作業時間短縮化方法 |
DE102016207548A1 (de) * | 2016-05-02 | 2017-11-02 | Tesa Se | Härtbare Klebemasse und darauf basierende Reaktivklebebänder |
DE102016207540A1 (de) * | 2016-05-02 | 2017-11-02 | Tesa Se | Wasserdampfsperrende Klebemasse mit hochfunktionalisiertem Poly(meth)acrylat |
KR20190028719A (ko) * | 2016-06-28 | 2019-03-19 | 훈츠만 어드밴스트 머티리얼스 라이센싱 (스위처랜드) 게엠베하 | 발전기 및 모터용의, 에폭시 수지계 전기 절연 시스템 |
KR102324899B1 (ko) * | 2016-06-29 | 2021-11-10 | 미츠비시 가스 가가쿠 가부시키가이샤 | 수지 조성물, 수지 시트, 다층 프린트 배선판 및 반도체 장치 |
JP6332764B2 (ja) * | 2016-11-17 | 2018-05-30 | 大日本印刷株式会社 | 接着剤組成物およびそれを用いた接着シート |
JP6865614B2 (ja) * | 2017-03-28 | 2021-04-28 | 株式会社Adeka | 硬化性組成物 |
CN110194941B (zh) * | 2019-05-29 | 2024-09-17 | 厦门艾贝森电子有限公司 | 一种尺寸稳定潜伏型可加热固化环氧胶膜及制备方法 |
JPWO2022181564A1 (zh) * | 2021-02-24 | 2022-09-01 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2200021A1 (de) * | 1972-01-03 | 1973-07-26 | Henkel & Cie Gmbh | Acrylsaeureester von oh-gruppenhaltigen tricyclischen decanolen |
JPS55145726A (en) * | 1979-04-28 | 1980-11-13 | Hitachi Chem Co Ltd | Epoxy ester resin composition |
WO2000047666A1 (en) * | 1999-02-15 | 2000-08-17 | Dsm N.V. | Resin composition and cured product |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4612209A (en) * | 1983-12-27 | 1986-09-16 | Ciba-Geigy Corporation | Process for the preparation of heat-curable adhesive films |
JPH0616524B2 (ja) | 1984-03-12 | 1994-03-02 | 日東電工株式会社 | 半導体ウエハ固定用接着薄板 |
JPS60223139A (ja) | 1984-04-18 | 1985-11-07 | Nitto Electric Ind Co Ltd | 半導体ウエハ固定用接着薄板 |
JPH0715087B2 (ja) | 1988-07-21 | 1995-02-22 | リンテック株式会社 | 粘接着テープおよびその使用方法 |
TW340967B (en) | 1996-02-19 | 1998-09-21 | Toray Industries | An adhesive sheet for a semiconductor to connect with a substrate, and adhesive sticking tape for tab, an adhesive sticking tape for wire bonding connection, a substrate for connecting with a semiconductor and a semiconductor device |
-
2001
- 2001-08-21 JP JP2001250134A patent/JP4869517B2/ja not_active Expired - Fee Related
-
2002
- 2002-08-08 DE DE60224543T patent/DE60224543T2/de not_active Expired - Fee Related
- 2002-08-08 CN CNB028164075A patent/CN1322580C/zh not_active Expired - Fee Related
- 2002-08-08 US US10/487,531 patent/US7135224B2/en not_active Expired - Lifetime
- 2002-08-08 EP EP02755877A patent/EP1419527B1/en not_active Expired - Lifetime
- 2002-08-08 WO PCT/JP2002/008127 patent/WO2003017363A1/en active IP Right Grant
- 2002-08-08 KR KR1020047002477A patent/KR100755175B1/ko active IP Right Grant
- 2002-08-14 MY MYPI20023008A patent/MY134364A/en unknown
- 2002-08-20 TW TW091118754A patent/TWI299354B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2200021A1 (de) * | 1972-01-03 | 1973-07-26 | Henkel & Cie Gmbh | Acrylsaeureester von oh-gruppenhaltigen tricyclischen decanolen |
JPS55145726A (en) * | 1979-04-28 | 1980-11-13 | Hitachi Chem Co Ltd | Epoxy ester resin composition |
WO2000047666A1 (en) * | 1999-02-15 | 2000-08-17 | Dsm N.V. | Resin composition and cured product |
Also Published As
Publication number | Publication date |
---|---|
US7135224B2 (en) | 2006-11-14 |
DE60224543D1 (de) | 2008-02-21 |
KR100755175B1 (ko) | 2007-09-03 |
JP4869517B2 (ja) | 2012-02-08 |
DE60224543T2 (de) | 2009-01-29 |
WO2003017363A1 (en) | 2003-02-27 |
EP1419527B1 (en) | 2008-01-09 |
EP1419527A1 (en) | 2004-05-19 |
MY134364A (en) | 2007-12-31 |
KR20040030979A (ko) | 2004-04-09 |
TWI299354B (zh) | 2008-08-01 |
JP2003055623A (ja) | 2003-02-26 |
US20040232563A1 (en) | 2004-11-25 |
CN1545729A (zh) | 2004-11-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1322580C (zh) | 胶粘带 | |
US6277481B1 (en) | Adhesive composition and adhesive sheet | |
JP3483161B2 (ja) | 粘接着テープおよびその使用方法 | |
JP3739488B2 (ja) | 粘接着テープおよびその使用方法 | |
JP3506519B2 (ja) | 粘接着テープおよびその使用方法 | |
KR20060043767A (ko) | 반도체용 점접착(粘接着) 시트 및 반도체 장치의 제조 방법 | |
TW200904924A (en) | Adhesive composition, adhesive sheet and production process for semiconductor device | |
JP2009030043A (ja) | 粘接着剤組成物、粘接着シートおよび半導体装置の製造方法 | |
KR101483308B1 (ko) | 점접착제 조성물, 점접착 시트 및 반도체장치의 제조방법 | |
JP2011512430A (ja) | 特に電子部品およびフレキシブルプリント基板を貼り合わせるための熱接着性かつ熱硬化性の接着フィルム | |
JP2003055632A (ja) | 粘接着テープ | |
JP4067308B2 (ja) | ウエハダイシング・接着用シートおよび半導体装置の製造方法 | |
JPH09100450A (ja) | 粘接着テープおよびその使用方法 | |
JP5237647B2 (ja) | 粘接着剤組成物、粘接着シートおよび半導体装置の製造方法 | |
TWI758479B (zh) | 膜狀透明接著劑以及紅外線感測器模組 | |
JP6262717B2 (ja) | 保護膜付チップの製造方法 | |
JP2012216625A (ja) | 保護膜形成用シートおよび半導体チップの製造方法 | |
JP5224710B2 (ja) | 半導体装置の製造方法に用いられる接着剤 | |
TWI761317B (zh) | 熱固化性樹脂膜、第一保護膜形成用片以及第一保護膜的形成方法 | |
JPH10168400A (ja) | シート状粘着体並びにその製造方法 | |
WO2022210087A1 (ja) | フィルム状接着剤、ダイシングダイボンディングシート、半導体装置の製造方法、フィルム状接着剤の使用、ダイシングダイボンディングシートの使用、及び、半導体ウエハのリワーク方法 | |
TW202100629A (zh) | 熱硬化性樹脂膜、第1保護膜形成用片、套件、以及附第1保護膜之工件加工物之製造方法 | |
CN115136294A (zh) | 背面保护膜形成用复合体、第一层叠体的制造方法、第三层叠体的制造方法及带背面保护膜的半导体装置的制造方法 | |
JP2003013031A (ja) | 熱反応性接着剤組成物および熱反応性接着フィルム |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070620 |