CN115916420A - 旋涂装置 - Google Patents

旋涂装置 Download PDF

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Publication number
CN115916420A
CN115916420A CN202080102432.7A CN202080102432A CN115916420A CN 115916420 A CN115916420 A CN 115916420A CN 202080102432 A CN202080102432 A CN 202080102432A CN 115916420 A CN115916420 A CN 115916420A
Authority
CN
China
Prior art keywords
spin coating
film
thickness
film thickness
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080102432.7A
Other languages
English (en)
Chinese (zh)
Inventor
山田友茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Corp
Original Assignee
Mitsubishi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Corp filed Critical Mitsubishi Corp
Publication of CN115916420A publication Critical patent/CN115916420A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1005—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material already applied to the surface, e.g. coating thickness, weight or pattern
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
CN202080102432.7A 2020-06-26 2020-06-26 旋涂装置 Pending CN115916420A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/025336 WO2021260943A1 (ja) 2020-06-26 2020-06-26 スピンコーティング装置

Publications (1)

Publication Number Publication Date
CN115916420A true CN115916420A (zh) 2023-04-04

Family

ID=79282127

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080102432.7A Pending CN115916420A (zh) 2020-06-26 2020-06-26 旋涂装置

Country Status (6)

Country Link
US (1) US20230266669A1 (https=)
EP (1) EP4173725A4 (https=)
JP (1) JPWO2021260943A1 (https=)
KR (1) KR20230025525A (https=)
CN (1) CN115916420A (https=)
WO (1) WO2021260943A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117637545B (zh) * 2023-11-30 2024-08-23 重庆大学 一种实验室用半自动化钙钛矿太阳能电池制备方法及其制备系统

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02142113A (ja) * 1988-11-22 1990-05-31 Kawasaki Steel Corp レジスト塗布装置
JPH02229577A (ja) * 1989-03-02 1990-09-12 Mitsubishi Electric Corp 塗布装置
JPH08236430A (ja) * 1995-02-27 1996-09-13 Risotetsuku Japan Kk 膜厚制御方法および装置
JP2000005687A (ja) * 1998-04-20 2000-01-11 Tokyo Electron Ltd 塗布膜形成装置及びその方法並びにパタ―ン形成方法
CN1680045A (zh) * 2004-01-26 2005-10-12 新Sti科技株式会社 单张涂膜形成装置及单张涂膜形成方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01278021A (ja) * 1988-04-29 1989-11-08 Nec Corp レジストの塗布装置
JPH0265225A (ja) * 1988-08-31 1990-03-05 General Signal Japan Kk フォトレジストの塗布方法
JPH02233176A (ja) * 1989-03-06 1990-09-14 Mitsubishi Electric Corp 塗布装置
JPH10328614A (ja) * 1997-05-30 1998-12-15 Mitsubishi Chem Corp 着色レジストの塗布方法
JP2006030070A (ja) * 2004-07-20 2006-02-02 Opto One Kk 膜厚検査装置
JP2006231262A (ja) 2005-02-28 2006-09-07 Fuji Photo Film Co Ltd スピンコート製膜法
JP4748192B2 (ja) 2008-08-07 2011-08-17 東京エレクトロン株式会社 塗布装置、塗布方法、塗布、現像装置及び記憶媒体
JP2012256780A (ja) 2011-06-10 2012-12-27 Fuji Electric Co Ltd スピンコート法によるレジスト塗布方法
JP5796555B2 (ja) 2012-07-13 2015-10-21 トヨタ自動車株式会社 スピンコート装置
JP6454121B2 (ja) 2014-10-07 2019-01-16 積水化学工業株式会社 スピンコート用シャーレ
JP2018202318A (ja) 2017-06-02 2018-12-27 キヤノン株式会社 スピンコータ装置、スピンコート方法、ドライフィルムレジストの製造方法および液体吐出ヘッドの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02142113A (ja) * 1988-11-22 1990-05-31 Kawasaki Steel Corp レジスト塗布装置
JPH02229577A (ja) * 1989-03-02 1990-09-12 Mitsubishi Electric Corp 塗布装置
JPH08236430A (ja) * 1995-02-27 1996-09-13 Risotetsuku Japan Kk 膜厚制御方法および装置
JP2000005687A (ja) * 1998-04-20 2000-01-11 Tokyo Electron Ltd 塗布膜形成装置及びその方法並びにパタ―ン形成方法
CN1680045A (zh) * 2004-01-26 2005-10-12 新Sti科技株式会社 单张涂膜形成装置及单张涂膜形成方法

Also Published As

Publication number Publication date
JPWO2021260943A1 (https=) 2021-12-30
KR20230025525A (ko) 2023-02-21
US20230266669A1 (en) 2023-08-24
EP4173725A4 (en) 2024-04-24
EP4173725A1 (en) 2023-05-03
WO2021260943A1 (ja) 2021-12-30

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